摘要:
The present invention provides a gas-permeable membrane comprising a partial structure represented by formula (I) or formula (II), wherein R 1 and R 2 each independently represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkenyloxy group having 2 to 6 carbon atoms, an aryl group or an aryloxy group, M 1 , M 2 and M 3 each independently represents a metal atom, ml represents an integer, n1, n2 and n3 each independently represents an integer of 1 to 3, * represents a bonding hand, a composition for forming the gas-permeable membrane and a production process of the gas-permeable membrane.
摘要:
There are provided a coating material which improves an etching resistance of a pattern in an etching process using a pattern formed on a substrate as a mask. The material is a pattern coating material for an etching process using a pattern formed on a substrate as a mask, including a metal compound (W) which can produce a hydroxyl group on hydrolysis.
摘要:
The composite layer material (10) is made up of at least two laminated layers. One of outermost layers is a support film (2) that is removable from another layer and has a self-supporting property.
摘要:
To provide a membrane filter including a thin film having a nanometer order thickness as a base, which is easy to increase the size and also has enough strength for use as a filter. The membrane filter is formed by laminating a thin film having a thickness of 1 to 1,000 nm with a support film which is a porous film having a thickness of 1 to 1,000 µm, which is made of a photosensitive composition or a cured product of the photosensitive composition, and has a plurality of hole portions penetrating in the thickness direction.