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    Positive-type resist composition, microlens and planarization film formed therefrom
    2.
    发明公开
    Positive-type resist composition, microlens and planarization film formed therefrom 有权
    正光刻胶组合; 结构教育过程; 微透镜和平坦化膜物; 固态图像装置，液晶显示装置及LED显示装置

    公开(公告)号：EP2749946A1

    公开(公告)日：2014-07-02

    申请号：EP14161720.9

    申请日：2009-07-07

    申请人： Nissan Chemical Industries, Ltd.

    发明人： Yukawa, Shojiro ,  Kishioka, Takahiro ,  Sakaguchi, Takahiro ,  Soda, Hiroyuki

    IPC分类号： G03F7/023 ,  G03F7/09 ,  G03F7/40 ,  G02B3/00

    CPC分类号： G03F7/0233 ,  C08F2/48 ,  C08F212/32 ,  C09D125/08 ,  G02B3/0012 ,  G03F7/094 ,  G03F7/40 ,  C08F220/06 ,  C08F212/08 ,  C08F212/14

    摘要： There is provided a positive resist composition excellent in transparency, heat resistance, and refractive index particularly for forming a microlens and for forming a planarization film; and a microlens and a planarization film formed from the positive resist composition. A positive resist composition comprising a component (A): an alkali-soluble polymer comprising a unit structure having a biphenyl structure; a component (B): a compound having an organic group to be photolyzed to generate an alkali-soluble group; and a component (C): a solvent. The positive resist composition wherein the alkali-soluble polymer as the component (A) is a polymer comprising a unit structure of Formula (2) and a unit structure of Formula (3), where when the total number of unit structures constituting the polymer (A) is assumed to be 1.0, the ratio n2 of the unit structure of Formula (2) constituting the polymer (A) and the ratio n3 of the unit structure of Formula (3) constituing the polymer (A) satisfy 0.2≤n2≤1≤0.8, 0.1≤n3≤1≤0.7 and 0.3≤n2+n3≤1≤1.0.

    摘要翻译： 本发明提供一种正型抗蚀剂具有优异的透明性，耐热性，和折射率的组合物特别是用于形成微透镜和形成平坦化膜 - ; 以及微透镜和平坦化膜形成为从正型抗蚀剂组合物。 一种正型抗蚀组合物，含有（A）成分：碱可溶性聚合物，其包含具有联苯结构的结构单元; 成分（B）：具有有机基团的化合物进行光分解而产生碱溶性基团; 和组分（C）：溶剂。 的正型抗蚀剂组合物worin的碱溶性聚合物作为组分（A）是包含式结构单元的聚合物（2）和式的单元结构（3），其中，当构成聚合物的结构单元的总数（ A）被假定为1.0，式单元结构的比例N2（2）构成聚合物（A）和式单元结构的比例N3（3）constituing聚合物（A）满足0.2‰¤n2 ‰¤1‰¤0.8，0.1‰¤n3‰¤1‰¤0.7和0.3‰¤n2+ N3‰¤1‰¤1.0。

    Photosensitive resin and process for producing microlens
    3.
    发明公开
    Photosensitive resin and process for producing microlens 有权
    光敏树脂及其制备方法的微透镜

    公开(公告)号：EP2674815A1

    公开(公告)日：2013-12-18

    申请号：EP13183697.5

    申请日：2008-05-14

    申请人： Nissan Chemical Industries, Ltd.

    发明人： Negi, Takayuki ,  Sakaguchi, Takahiro ,  Kishioka, Takahiro

    IPC分类号： G03F7/023 ,  G02B3/00 ,  G03F7/004 ,  G03F7/00

    CPC分类号： G03F7/0233 ,  G02B3/00 ,  G03F7/0005 ,  G03F7/38

    摘要： A material for a microlens having heat resistance, high resolution and high light-extraction efficiency is provided. A positive resist composition comprises an alkali-soluble polymer (A) containing a unit structure having an aromatic fused ring or a derivative thereof, and a compound (B) having an organic group which undergoes photodecomposition to yield an alkali-soluble group. The positive resist composition has coating film properties of a refractive index at a wavelength of 633 nm of 1.6 or more and a transmittance at wavelengths of 400 to 730 nm of 80% or more. A pattern forming method comprises applying the positive resist composition, drying the composition, exposing the composition to light, and developing the composition.