RADIATION CURABLE COMPOSITIONS COMPRISING INERT RESINS
    4.
    发明公开
    RADIATION CURABLE COMPOSITIONS COMPRISING INERT RESINS 有权
    芝麻酱ZUSAMMENSETZUNGEN MIT INERTEN HARZEN

    公开(公告)号:EP3119842A1

    公开(公告)日:2017-01-25

    申请号:EP15710173.4

    申请日:2015-03-16

    IPC分类号: C09D11/10

    摘要: The present invention provides for a radiation curable composition comprising at least one ethylenically unsaturated compound (A), and at least one inert copolymer (B) that is obtained by an addition reaction of: (b) from 3 to 50% by weight of at least one monofunctional glycidyl ether (b1) and/or at least one monofunctional glycidyl ester (b2) of aliphatic saturated monocarboxylic acids during the free radical polymerization of: (b') from 50 to 97% by weight of at least two ethylenically unsaturated copolymerizable monomers of which at least one contains at least one -COOH group (b'1), wherein the quantity of -COOH groups in component (b'1) is at least equimolar to the quantity of epoxy groups in component (b), and wherein the amount of solvents in the radiation curable composition of the invention is below 10% by weight. The present invention further relates to their making and their use in coating compositions, adhesives, inks and varnishes.

    摘要翻译: 本发明提供一种包含至少一种烯属不饱和化合物(A)和至少一种惰性共聚物(B)的可辐射固化组合物,所述惰性共聚物(B)通过以下加成反应获得:(b)3-50重量% 在自由基聚合期间:(b')50至97重量%的至少两个烯属不饱和可共聚合的至少一种单官能缩水甘油醚(b1)和/或至少一种单官能缩水甘油酯(b2) 其中至少一个含有至少一个-COOH基团(b'1)的单体,其中组分(b'1)中-COOH基团的量与组分(b)中的环氧基团的量至少等摩尔,和 其中本发明的可辐射固化组合物中的溶剂的量低于10重量%。 本发明还涉及它们的制备及其在涂料组合物,粘合剂,油墨和清漆中的用途。

    Positive-type resist composition, microlens and planarization film formed therefrom
    6.
    发明公开
    Positive-type resist composition, microlens and planarization film formed therefrom 有权
    正光刻胶组合; 结构教育过程; 微透镜和平坦化膜物; 固态图像装置,液晶显示装置及LED显示装置

    公开(公告)号:EP2749946A1

    公开(公告)日:2014-07-02

    申请号:EP14161720.9

    申请日:2009-07-07

    摘要: There is provided a positive resist composition excellent in transparency, heat resistance, and refractive index particularly for forming a microlens and for forming a planarization film; and a microlens and a planarization film formed from the positive resist composition. A positive resist composition comprising a component (A): an alkali-soluble polymer comprising a unit structure having a biphenyl structure; a component (B): a compound having an organic group to be photolyzed to generate an alkali-soluble group; and a component (C): a solvent. The positive resist composition wherein the alkali-soluble polymer as the component (A) is a polymer comprising a unit structure of Formula (2) and a unit structure of Formula (3), where when the total number of unit structures constituting the polymer (A) is assumed to be 1.0, the ratio n2 of the unit structure of Formula (2) constituting the polymer (A) and the ratio n3 of the unit structure of Formula (3) constituing the polymer (A) satisfy 0.2≤n2≤1≤0.8, 0.1≤n3≤1≤0.7 and 0.3≤n2+n3≤1≤1.0.

    摘要翻译: 本发明提供一种正型抗蚀剂具有优异的透明性,耐热性,和折射率的组合物特别是用于形成微透镜和形成平坦化膜 - ; 以及微透镜和平坦化膜形成为从正型抗蚀剂组合物。 一种正型抗蚀组合物,含有(A)成分:碱可溶性聚合物,其包含具有联苯结构的结构单元; 成分(B):具有有机基团的化合物进行光分解而产生碱溶性基团; 和组分(C):溶剂。 的正型抗蚀剂组合物worin的碱溶性聚合物作为组分(A)是包含式结构单元的聚合物(2)和式的单元结构(3),其中,当构成聚合物的结构单元的总数( A)被假定为1.0,式单元结构的比例N2(2)构成聚合物(A)和式单元结构的比例N3(3)constituing聚合物(A)满足0.2‰¤n2 ‰¤1‰¤0.8,0.1‰¤n3‰¤1‰¤0.7和0.3‰¤n2+ N3‰¤1‰¤1.0。