公开(公告)号：EP1053872A4

公开(公告)日：2001-12-12

申请号：EP99973272

申请日：1999-12-06

申请人： SEIKO EPSON CORP

发明人： FUJII MASAHIRO ,  ISHIKAWA HIROYUKI ,  MATSUNO YASUSHI

IPC分类号： B41J2/045 ,  B41J2/055 ,  B41J2/14

CPC分类号： B41J2/04578 ,  B41J2/04588 ,  B41J2/055 ,  B41J2/14314

摘要： An ink-jet head for ejecting an ink droplet from an ink nozzle by the charging/discharging between a counter electrode and vibrating plates. The counter electrode comprises a main electrode (10) and an auxiliary electrode (101), which is provided on the ink-nozzle's side in common with the vibrating plates (51). Auxiliary charging between the auxiliary electrode (101) and the vibrating plates (51) is effected to vibrate a meniscus in the ink nozzle (11) without ejecting a useless droplet. Consequently, the ink is prevented from forming a film on the meniscus, and an increase of the viscosity of the ink due to evaporation of the ink solvent is prevented by diffusing the ink in the ink passage.

公开(公告)号：EP0985534A4

公开(公告)日：2001-03-28

申请号：EP98919579

申请日：1998-05-13

申请人： SEIKO EPSON CORP

发明人： MAKIGAKI TOMOHIRO ,  TAKEKOSHI TARO ,  FUJII MASAHIRO ,  KITAHARA KOJI ,  FUJITA SEIICHI

IPC分类号： B41J2/16 ,  B81B1/00

CPC分类号： B41J2/1629 ,  B41J2/16 ,  B41J2/162 ,  B41J2/1628 ,  B41J2/1635 ,  B41J2002/043 ,  B41J2002/14387 ,  B41J2002/14411

摘要： A cross-sectionally stepped nozzle (21) having a nozzle portion (21a) of a smaller cross-sectional area provided at a front part with respect to the jetting direction and a nozzle portion (21b) of a larger cross-sectional area provided at a rear part with respect thereto is formed by etching a silicon wafer (200) on which a nozzle plate (2) is to be formed. A method of forming the nozzle (21) comprises forming a resist film (210) on a surface (200a) of a silicon wafer (200), subjecting this resist film (210) to patterning by half etching and patterning by full etching, subjecting the resultant product to anisotropic dry etching by ICP discharge to form a groove in a full etched portion, removing the resist film on the half etched portion by etching, and subjecting the same portion to anisotropic dry etching again by ICP discharge. Consequently, a nozzle having a stepped cross-sectional shape and a large effect in aligning the direction of a pressure, which is applied from the side of a cavity to the nozzle, parallel to the axis of the nozzle can be formed simply and efficiently on a single-crystal silicon substrate.

公开(公告)号：EP1092676A4

公开(公告)日：2002-06-05

申请号：EP00913017

申请日：2000-03-31

申请人： SEIKO EPSON CORP

发明人： SATO EIICHI ,  FUJII MASAHIRO ,  KOEDA HIROSHI

IPC分类号： B41J2/045 ,  B41J2/14 ,  B81B1/00 ,  G02F1/13 ,  G02F1/1345 ,  H01R31/06 ,  H05K3/32 ,  H05K3/36

CPC分类号： H05K3/361 ,  B41J2/14233 ,  B41J2/14274 ,  B41J2/14314 ,  B41J2002/14491 ,  G02F1/13452 ,  H01R12/62 ,  H01R12/7076 ,  H01R31/06 ,  H05K3/323 ,  H05K2201/09036

摘要： A narrow-pitch connector adaptable even to a fine electrode pitch, an electrostatic actuator; a piezoelectric actuator, a micromachine and a liquid crystal panel, the three including the narrow pitch connector; an ink-jet head using the electrostatic actuator or the piezoelectric actuator; and an ink-jet printer and an electronic apparatus in which the ink-jet head is mounted. The narrow-pitch connector (20) comprises a plurality of first terminal electrodes (30), a plurality of second terminal electrodes (32), both formed on a substrate (22), and wiring (24) for electrically connecting the first terminal electrodes (30) to the second terminal electrodes (32). The wiring (24) has a function of converting the pitch between the first terminal electrodes (30) to the pitch between the second terminal electrodes (32). Grooves (32A) are formed between the first terminal electrodes (30).

公开(公告)号：EP0985533A4

公开(公告)日：2001-03-21

申请号：EP99909216

申请日：1999-03-17

申请人： SEIKO EPSON CORP

发明人： FUJII MASAHIRO ,  MARUYAMA HIROYUKI ,  SATO KAZUHIKO ,  KITAHARA KOJI ,  MAKIGAKI TOMOHIRO ,  NOJIMA SHIGEO ,  TAKEKOSHI TARO

IPC分类号： B41J2/14 ,  B41J2/16 ,  B41J2/045 ,  B41J2/055

CPC分类号： B41J2/1626 ,  B41J2/14314 ,  B41J2/16 ,  B41J2/1623 ,  B41J2/164 ,  B41J2/1642 ,  B41J2/1646 ,  B41J2002/14387 ,  B41J2002/14411 ,  B41J2202/03 ,  Y10T29/42

摘要： An electrostatic ink jet head (1) using an electrostatic actuator and its manufacturing method, comprising pressure chambers (6) communicating with ink nozzles (21) and an atmospheric pressure chamber (12) open to the atmosphere, wherein diaphragms (5) are formed on the bottom surfaces of the pressure chambers (6), a voltage is applied between the diaphragms (5) and electrodes (43) to vibrate the diaphragms (5) electrostatically so as to inject ink droplets, vibration chambers (41) communicate with a pressure compensating chamber (49), a displacement plate (16) which is displaceable toward the outside of the bottom surface of the pressure compensating chamber (49) according to a variation in atmospheric pressure is formed on the bottom surface of the pressure compensating chamber (49), the volume of the pressure compensating chamber (49) is increased or decreased according to the displacement of the displacement plate (16) so that the inside pressure of each vibration chamber (41) communicating with the pressure compensating chamber (49) is regulated to the atmospheric pressure, whereby the vibration characteristics of the diaphragms (5) can be kept constant even if the atmospheric pressure is varied so as to maintain an appropriate ink-droplet injecting operation.

公开(公告)号：EP0679514A4

公开(公告)日：1996-03-06

申请号：EP94903033

申请日：1993-12-21

申请人： SEIKO EPSON CORP

发明人： KAMISUKI SHINICHI ,  ATOBE MITSURO ,  KOEDA HIROSHI ,  YOTSUYA SHINICHI ,  FUJII MASAHIRO ,  KOBAYASHI NAOKI

IPC分类号： B41J2/045 ,  B41J2/16 ,  B41J2/05

CPC分类号： B41J2/04541 ,  B41J2/04578 ,  B41J2/16 ,  B41J2/1623 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1642 ,  B41J2/1646 ,  B41J2002/14379 ,  B41J2202/03

摘要： An ink jet head which comprises a thin vibration plate on a semiconductor substrate such as of silicon, and an electrode opposed to the vibration plate, wherein ink is emitted by deformation of the vibration plate when static charge is applied to the vibration plate and the electrode. A single- or multi-layered metallic film in ohmic contact with the semiconductor substrate is formed as a common electrode. A group III or V element is introduced in a high concentration to the portion of the semiconductor substrate, where the common electrode is formed. Since the supply and removal of the charge to and from the vibration plate can be made at a high speed, high-frequency vibration is achieved to carry out high speed printing.