公开(公告)号：EP1541353A1

公开(公告)日：2005-06-15

申请号：EP03741320.0

申请日：2003-07-10

申请人： Seiko Epson Corporation

发明人： YASOSHIMA, Takashi ,  SHIMADA, Masato ,  MATSUZAWA, Akira

IPC分类号： B41J2/045 ,  B41J2/16

CPC分类号： B41J2/161 ,  B41J2/14233 ,  B41J2/1606 ,  B41J2/1623 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1635 ,  B41J2/1642 ,  B41J2/1646 ,  B41J2002/14241 ,  B41J2002/14419 ,  B41J2002/14491

摘要： Provided is a liquid jet head, a method of manufacturing the same, and a liquid jet apparatus, in which liquid ejecting characteristics can be kept constant for a long period and in which nozzle blockage is prevented. In a liquid jet head including a passage-forming substrate (10) which is made of a single crystal silicon substrate and in which pressure generating chambers (12) communicating with nozzle orifices are formed, and pressure generating elements (300) for causing pressure changes in the pressure generating chambers (12), a protective film (100) which is made of tantalum oxide and has resistance to liquid, is provided at least on the inner wall surfaces of the pressure generating chambers (12).

摘要翻译： 提供一种液体喷射头及其制造方法以及液体喷射装置，其中液体喷射特性可以长期保持恒定，并且防止喷嘴堵塞。 在包括由单晶硅基板制成的通道形成基板（10）的液体喷射头中，其中形成有与喷嘴孔连通的压力产生室（12）和用于引起压力变化的压力产生元件（300） 在压力发生室（12）中，至少在压力发生室（12）的内壁面上设置有由氧化钽制成并具有耐液体性的保护膜（100）。

公开(公告)号：EP3203539A3

公开(公告)日：2017-12-06

申请号：EP17154121.2

申请日：2017-02-01

申请人： Seiko Epson Corporation

发明人： FUKUZAWA, Yuma ,  FUKUDA, Shunya ,  SHIMADA, Masato ,  OTA, Mutsuhiko

IPC分类号： H01L41/253 ,  H01L41/257

CPC分类号： B41J2/1607 ,  B41J2/164 ,  H01L41/0973 ,  H01L41/257 ,  H01L41/297

摘要： A method is provided for manufacturing a piezoelectric device including a piezoelectric element 300 that is disposed above a diaphragm 50 and that has a multilayer structure including a first electrode 60 disposed above the diaphragm, a piezoelectric layer 70 disposed on the first electrode, and a second electrode 80 disposed on the piezoelectric layer. The method includes forming the multilayer structure including the first electrode, the piezoelectric layer, and the second electrode above the diaphragm, forming a voltage application electrode 95 extending outwardly from an end of the second electrode to cover a region located above the piezoelectric layer in an inactive section 320 having no second electrode, applying a voltage between the first electrode and the second electrode, and removing the voltage application electrode 95.

公开(公告)号：EP1116588B1

公开(公告)日：2010-10-06

申请号：EP00951887.9

申请日：2000-08-04

申请人： Seiko Epson Corporation

发明人： SHIMADA, Masato ,  MATSUZAWA, Akira ,  MIYATA, Yoshinao ,  NISHIWAKI, Tsutomu ,  KAMEI, Hiroyuki

IPC分类号： B41J2/14 ,  B41J2/16 ,  B41J2/045

CPC分类号： B41J2/1629 ,  B41J2/14233 ,  B41J2/161 ,  B41J2/1623 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2002/14241 ,  B41J2002/1437 ,  B41J2002/14419 ,  B41J2002/14491

摘要： An ink jet recording head in which the rigidity of a partition wall is enhanced, pressure generating chambers can be arranged at high density, and the crosstalk between the pressure generating chambers can be reduced, a method for generating the ink jet recording head, and an ink jet recorder. An ink jet recording head comprising a channel forming substrate (10) having a silicon layer of single crystal silicon in which a pressure generating chamber (15) communicating with a nozzle opening is defined, and a piezoelectric element (300) provided in a region facing the pressure generating chamber (15) through a diaphragm constituting a part of the pressure generating chamber (15) and generating a pressure variation in the pressure generating chamber (15), wherein the pressure generating chamber (15) has an opening in one face side of the channel forming substrate (10) but not through the channel forming substrate (10). At least the bottom face of the inside of the pressure generating chamber (15) facing the one face side is constituted of an anisotropic etching stop face which is a surface subjected to anisotropic etching stopped in mid course and the piezoelectric element (300) composed of a film formed by film formation and lithography is provided on the one face side of the channel forming substrate (10).

公开(公告)号：EP1116588A1

公开(公告)日：2001-07-18

申请号：EP00951887.9

申请日：2000-08-04

申请人： SEIKO EPSON CORPORATION

发明人： SHIMADA, Masato ,  MATSUZAWA, Akira ,  MIYATA, Yoshinao ,  NISHIWAKI, Tsutomu ,  KAMEI, Hiroyuki

IPC分类号： B41J2/045

CPC分类号： B41J2/1629 ,  B41J2/14233 ,  B41J2/161 ,  B41J2/1623 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2002/14241 ,  B41J2002/1437 ,  B41J2002/14419 ,  B41J2002/14491

摘要： Disclosed are an ink-jet recording head, in which the rigidity of the compartment wall is improved, pressure generating chambers can be arranged in a high density, and cross talk between the pressure generating chambers is reduced, and a manufacturing method of the same and an ink-jet recording apparatus.
In an ink-jet recording head comprising: a passage-forming substrate (10) having a silicon layer consisting of single crystal silicon, in which a pressure generating chamber (15) communicating with a nozzle orifice is defined; and a piezoelectric element (300) for generating a pressure change in the pressure generating chamber, the piezoelectric element being provided on a region facing the pressure generating chamber (15) via a vibration plate constituting a part of the pressure generating chamber (15), the pressure generating chamber (15) is formed so as to open to one surface of the passage-forming substrate (10) and not to penetrate therethrough, at least a bottom surface of inner surfaces of the pressure generating chamber (15), which is facing to the one surface, is constituted of an etching stop surface as a surface in which anisotropic etching stops, and the piezoelectric element (300) is provided on the one surface side of the passage-forming substrate (10) by a film formed by film deposition technology and a lithography method.

摘要翻译： 公开了一种喷墨记录头，其中室壁的刚性得到改善，压力发生室可以高密度地布置，并且压力发生室之间的串扰减少，并且其制造方法和 喷墨记录装置。 一种喷墨记录头，包括：具有由单晶硅组成的硅层的通道形成基板，其中限定与喷嘴孔连通的压力产生室; 以及用于在压力发生室产生压力变化的压电元件（300），所述压电元件经由构成所述压力发生室（15）的一部分的振动板设置在面对所述压力发生室（15）的区域上， 压力发生室15形成为在通路形成基板（10）的一个表面开口，而不是贯穿其中，至少压力发生室（15）的内表面的底面 由一个蚀刻停止面作为各向异性蚀刻停止的表面构成，并且压电元件（300）由通道形成基板（10）的一个表面侧上由薄膜形成的薄膜 薄膜沉积技术和光刻方法。

公开(公告)号：EP3203539A2

公开(公告)日：2017-08-09

申请号：EP17154121.2

申请日：2017-02-01

申请人： Seiko Epson Corporation

发明人： FUKUZAWA, Yuma ,  FUKUDA, Shunya ,  SHIMADA, Masato ,  OTA, Mutsuhiko

IPC分类号： H01L41/253 ,  H01L41/257

CPC分类号： B41J2/1607 ,  B41J2/164 ,  H01L41/0973 ,  H01L41/257 ,  H01L41/297

摘要： A method is provided for manufacturing a piezoelectric device including a piezoelectric element 300 that is disposed above a diaphragm 50 and that has a multilayer structure including a first electrode 60 disposed above the diaphragm, a piezoelectric layer 70 disposed on the first electrode, and a second electrode 80 disposed on the piezoelectric layer. The method includes forming the multilayer structure including the first electrode, the piezoelectric layer, and the second electrode above the diaphragm, forming a voltage application electrode 95 extending outwardly from an end of the second electrode to cover a region located above the piezoelectric layer in an inactive section 320 having no second electrode, applying a voltage between the first electrode and the second electrode, and removing the voltage application electrode 95.

摘要翻译： 提供了一种用于制造压电器件的方法，该压电器件包括设置在隔膜50上方的压电元件300，并且该压电器件具有多层结构，该多层结构包括布置在隔膜上方的第一电极60，布置在第一电极上的压电层70以及第二 设置在压电层上的电极80。 该方法包括在隔膜上方形成包括第一电极，压电层和第二电极的多层结构，形成从第二电极的端部向外延伸以覆盖位于压电层上方的区域的电压施加电极95， 不具有第二电极的无源部分320，在第一电极和第二电极之间施加电压，并且移除电压施加电极95。

公开(公告)号：EP0747976B1

公开(公告)日：2000-06-07

申请号：EP95942281.7

申请日：1995-12-27

申请人： SEIKO EPSON CORPORATION

发明人： SHIMADA, Masato

IPC分类号： H01L41/187 ,  H01L41/09

CPC分类号： B41J2/1629 ,  B41J2/161 ,  B41J2/1631 ,  B41J2/1646 ,  B41J2002/14387 ,  B41J2202/03 ,  H01L41/094 ,  H01L41/0973 ,  H01L41/1876 ,  H01L41/316

公开(公告)号：EP0747976A1

公开(公告)日：1996-12-11

申请号：EP95942281.7

申请日：1995-12-27

申请人： SEIKO EPSON CORPORATION

发明人： SHIMADA, Masato

IPC分类号： H01L41/08

CPC分类号： B41J2/1629 ,  B41J2/161 ,  B41J2/1631 ,  B41J2/1646 ,  B41J2002/14387 ,  B41J2202/03 ,  H01L41/094 ,  H01L41/0973 ,  H01L41/1876 ,  H01L41/316

摘要： A piezoelectric thin-film device is disclosed which comprises: a piezoelectric film of a polycrystalline material; and two electrodes, the piezoelectric film being sandwiched between the two electrodes, wherein the piezoelectric film comprises a three-component PZT containing 5% by mole or more of a third component and having a thickness of not more than 5µm, and the deviation of Pb content of the piezoelectric film in the thicknesswise direction thereof is within ±5%. The piezoelectric thin-film device has good properties, and the use of the piezoelectric
thin-film device realizes miniaturization and increase in resolution of a head for ink jet recording. Further, the piezoelectric device has an additional advantage that an ink can be ejected at a high pressure and, further, driving at a high frequency is possible.

摘要翻译： 的压电薄膜器件游离缺失光盘，它包括：多晶材料的压电-的膜; 和两个电极，被薄膜夹在两个电极之间的压电，worin的压电薄膜包括一个三组分PZT包含由第三成分的摩尔以上5％且厚度不超过5微米，并且所述偏离 压电的Pb含量的薄膜在厚度方向上是在±5％。 所述压电薄膜器件具有良好的性能，以及使用该压电薄膜器件的VC + +实现小型化和增加的头部用于喷墨记录的分辨率。 此外，压电装置具有额外的优点，在没有墨能够以高压力喷射，此外，驱动以高频是可能的。