A METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES AND CORRESPONDING SEMICONDUCTOR DEVICE

    公开(公告)号:EP3832701A1

    公开(公告)日:2021-06-09

    申请号:EP20210546.6

    申请日:2020-11-30

    Abstract: A method of manufacturing semiconductor devices (10) comprises:
    - providing a plastic material substrate (100) having at least one die mounting location (102) for a semiconductor die (104),
    - forming metallic traces (108a, 108b) on selected areas of the plastic material substrate (100), wherein the metallic traces (108a, 108b) provide electrically-conductive paths for coupling to the semiconductor die (104),
    - attaching the semiconductor die (104) onto the at least one die mounting location (102),
    - bonding the semiconductor die (104) attached onto the at least one die mounting location (102) to selected ones of the metallic traces (108a, 108b) formed on the plastic material substrate (100),
    - molding package material (110) onto the semiconductor die (104) attached onto the at least one die mounting location (102).

    METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES AND CORRESPONDING SEMICONDUCTOR DEVICE

    公开(公告)号:EP4181177A1

    公开(公告)日:2023-05-17

    申请号:EP22204387.9

    申请日:2022-10-28

    Abstract: A semiconductor device (10) comprises a semiconductor die (14) arranged on a substrate such as a leadframe (12A, 12B) and an encapsulation of laser direct structuring, LDS material (16; 161, 162) molded onto the semiconductor die (14).
    A through mold via or TMV (182) extending through the encapsulation of LDS material (16; 161, 162) comprises:
    an enlarged collar section (182A) that extends through a first portion (161) of the encapsulation (16) from an outer surface (1613) to an intermediate plane (1612) of the encapsulation (16), the enlarged collar section (182A) having a cross-sectional area at the intermediate plane (1612) of the encapsulation (16), and
    a frusto-conical section (182B) that extends through a second portion (162) of the encapsulation (16; 161, 162) from a first end having a first diameter at the intermediate plane (1612) to a second end having a second diameter away from the intermediate plane (1612) of the encapsulation (16; 161, 162).
    The first end of the frusto-conical section (182B) has an area smaller than the cross-sectional area of the enlarged collar section (182A) at the intermediate plane (1612) and the second diameter of the frusto-conical section (182B) is smaller than the first diameter of the frusto-conical section (182B). The through mold via (182) can thus have an aspect ratio which is not limited to 1:1.

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