摘要:
Provided is a submount flip-chip bonded to a semiconductor laser diode chip with stepped first and second electrodes. The submount includes a substrate having first and second surfaces which are separated by a step height corresponding to a height difference between the first and second electrodes; first and second metal layers being formed to the same thickness on the first and second surfaces, respectively; and first and second solder layers being formed to the same thickness on the first and second metal layers, respectively, and being bonded to the first and second electrodes, respectively.
摘要:
Provided is a method of manufacturing a nitride-based semiconductor laser diode that can minimize optical absorption on a cavity mirror plane and improve the surface roughness of the cavity mirror plane. The method includes the steps of: forming on a (0001) GaN (gallium nitride) substrate (2) at least two masks spaced apart by a distance equal to a laser cavity length in stripes that extend along direction; growing an n-GaN layer (20) on the GaN substrate (2) between the masks so that two (1-100) edges of the n-GaN layer (20) are thicker than the remaining regions thereof; sequentially stacking an n-clad layer (24), an active layer (26), and a p-clad layer (28) on the n-GaN layer (20) to form an edge-emitting laser cavity structure in which laser light generated in the active layer passes through a region of the n-clad layer (24) aligned laterally with the active layer (26) and is output; and etching a (1-100) plane of the laser cavity structure to form a cavity mirror plane (30).
摘要:
Provided is a method of manufacturing a nitride-based semiconductor laser diode that can minimize optical absorption on a cavity mirror plane and improve the surface roughness of the cavity mirror plane. The method includes the steps of: forming on a (0001) GaN (gallium nitride) substrate (2) at least two masks spaced apart by a distance equal to a laser cavity length in stripes that extend along direction; growing an n-GaN layer (20) on the GaN substrate (2) between the masks so that two (1-100) edges of the n-GaN layer (20) are thicker than the remaining regions thereof; sequentially stacking an n-clad layer (24), an active layer (26), and a p-clad layer (28) on the n-GaN layer (20) to form an edge-emitting laser cavity structure in which laser light generated in the active layer passes through a region of the n-clad layer (24) aligned laterally with the active layer (26) and is output; and etching a (1-100) plane of the laser cavity structure to form a cavity mirror plane (30).