DAMASCENE PROCESS FOR CARBON MEMORY ELEMENT WITH MIIM DIODE
    1.
    发明公开
    DAMASCENE PROCESS FOR CARBON MEMORY ELEMENT WITH MIIM DIODE 有权
    大马士革步骤中使用MIIM二极管碳存储元件

    公开(公告)号:EP2342752A1

    公开(公告)日:2011-07-13

    申请号:EP09792789.1

    申请日:2009-09-21

    申请人: Sandisk 3D LLC

    IPC分类号: H01L27/24 H01L45/00

    摘要: Forming a metal-insulator diode and carbon memory element in a single damascene process is disclosed. A trench having a bottom and a sidewall is formed in an insulator. A first diode electrode is formed in the trench during a single damascene process. A first insulating region comprising a first insulating material is formed in the trench during the single damascene process. A second insulating region comprising a second insulating material is formed in the trench during the single damascene process. A second diode electrode is formed in the trench during the single damascene process. The first insulating region and the second insulating region reside between the first diode electrode and the second diode electrode to form a metal-insulator-insulator-metal (MIIM) diode. A region of carbon is formed in the trench during the single damascene process. At least a portion of the carbon is electrically in series with the MIIM diode.