摘要:
The present invention relates to a method for the low-temperature production of radial electronic junction semiconductor nanostructures on a substrate (2), including the steps of: a) forming metal aggregates (2) on said substrate (2), said metal aggregates being capable of electronically doping a first semiconductor material; b) growing, in the vapor phase, doped semiconductor nanowires (1) in the presence of one or more non-dopant precursor gases of said first semiconductor material, the substrate (2) being heated to a temperature at which said metal aggregates are in the liquid phase, the growth of the doped semiconductor nanowires (1) in the vapor phase being catalyzed by said metal aggregates (3); c) rendering the residual metal aggregates (3) inactive; and d) the chemical vapor deposition, in the presence of one or more precursor gases and a dopant gas, of at least one thin film of a second semiconductor material so as to form at least one radial electronic junction nanostructure between said nanowire and said at least one doped thin film. The invention also relates to a solar cell including a plurality of radial electronic junction nanostructures produced according to the invention.
摘要:
The invention relates to a method for making semiconductor nanowires (5) on a substrate (1) including a metal oxide layer (2), said method including the following steps: (a) exposing the metal oxide layer (2) to a hydrogen plasma (11) capable of triggering a reduction of the layer (2) and of generating metal nanodrops (3) having a radius (Rm) at the surface of the metal oxide layer (2); (b) plasma-depositing a thin layer (4) of a semiconductor material on the metal oxide layer (2), said thin layer (4) having a thickness (H3) suitable for covering the metal nanodrops (3); (c) and thermal annealing at a temperature T sufficient for activating a side growth of nanowires (5) by catalysis of the material deposited as a thin layer (4) from the metal nanodrops (3). The invention also relates to the nanowires (5) obtained by the method of the invention, and to nanometric transistors including a semiconductor nanowire (5), e.g. a silicon nanowire (SiNW) for forming a semiconductor link between the source (16), the drain (17), and the gate (18).