公开(公告)号：EP3346337A1

公开(公告)日：2018-07-11

申请号：EP17207286.0

申请日：2017-12-14

申请人： Tokyo Electron Limited

发明人： Nagahara, Seiji ,  Tomono, Masaru ,  Fukunaga, Nobutaka ,  Shiraishi, Gousuke

IPC分类号： G03F7/20 ,  H01L21/67

CPC分类号： G03F7/7055 ,  G03F7/16 ,  G03F7/201 ,  G03F7/2022 ,  G03F7/30 ,  G03F7/7005 ,  G03F7/70133 ,  G03F7/70558 ,  H01L21/027 ,  H01L21/67115 ,  H01L21/6715

摘要： A technology capable of easily adjusting an illuminance distribution pattern in the irradiation region in the lengthwise direction to a target illuminance distribution pattern with high accuracy when optical processing is performed on a substrate by forming a strip-shaped irradiation region with a plurality of light-emitting blocks is provided. An illuminance distribution response amount as the change amount of the illuminance distribution pattern, associating the position in the irradiation region in the lengthwise direction with the change amount of the illuminance with respect to the change in the drive current, has previously been acquired and stored in a storage unit for each light-emitting block (42). There is provided an arithmetic processing unit that determines (estimates) a current command value of each of the light-emitting blocks based on a present current command value of each of the light-emitting blocks (42) and the change amount of the illuminance distribution pattern of each light-emitting block in order to bring a present illuminance distribution pattern in the irradiation region in a lengthwise direction close to a target illuminance distribution pattern.

公开(公告)号：EP3346337B1

公开(公告)日：2019-09-04

申请号：EP17207286.0

申请日：2017-12-14

申请人： Tokyo Electron Limited

发明人： Nagahara, Seiji ,  Tomono, Masaru ,  Fukunaga, Nobutaka ,  Shiraishi, Gousuke

IPC分类号： G03F7/20 ,  H01L21/67

公开(公告)号：EP3355117A1

公开(公告)日：2018-08-01

申请号：EP17205648.3

申请日：2017-12-06

申请人： Tokyo Electron Limited

发明人： Moriya, Teruhiko ,  Tomono, Masaru ,  Shimada, Ryo ,  Hayakawa, Makoto ,  Nagahara, Seiji

IPC分类号： G03F7/20 ,  H01L21/67

CPC分类号： G03F7/70533 ,  G03F7/7055 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70808 ,  H01L21/67115 ,  H01L21/6776

摘要： An optical processing apparatus includes: a housing (40); a stage; and a light irradiation unit (400) configured to cause a light source unit to emit light so as to form a strip-like irradiation area extending over an area wider than a width of a substrate (W) in a right and left direction. The stage and the light irradiation unit are moved by a moving mechanism relatively to each other in a back and forth direction. Light emitted from the light irradiation unit is deviated by a light-path changing unit (45) from a relative movement area of a substrate. When a substrate is relatively moved below the light irradiation unit without the intention of being subjected to a light irradiation process, a control unit outputs a control signal such that an irradiation area is not formed on a surface of the substrate by the light-path changing unit, while the light source unit emitting light.

公开(公告)号：EP3324240A1

公开(公告)日：2018-05-23

申请号：EP17202294.9

申请日：2017-11-17

申请人： Tokyo Electron Limited

发明人： Moriya, Teruhiko ,  Tomono, Masaru ,  Shimada, Ryo ,  Hayakawa, Makoto ,  Nagahara, Seiji

IPC分类号： G03F7/20

CPC分类号： G03F7/70208 ,  G03F7/70133 ,  G03F7/70391 ,  G03F7/70516 ,  G03F7/7055 ,  G03F7/70558 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/7085

摘要： An exposure apparatus includes a stage (33) on which a substrate (W) is placed, a plurality of light irradiation units (46) configured to emit light independently of each other to different positions in a right and left direction on a surface of the substrate, so as to form a strip-like irradiation area (30) extending from one end of the surface of the substrate to the other end of the substrate, a stage moving mechanism (36) configured to move the stage in a back and forth direction relative to the irradiation area, such that the whole surface of the substrate is exposed, and a light receiving unit (51, etc.) configured move in the irradiation area between one end and the other end of the irradiation area in order to detect an illuminance distribution of the irradiation area in a longitudinal direction of the Irradiation area.

公开(公告)号：EP3324239A1

公开(公告)日：2018-05-23

申请号：EP17202291.5

申请日：2017-11-17

申请人： Tokyo Electron Limited

发明人： Nagahara, Seiji ,  Tomono, Masaru ,  Fukunaga, Nobutaka ,  Shiraishi, Gousuke ,  Minekawa, Yukie

IPC分类号： G03F7/20

CPC分类号： G03F7/70725 ,  G03F7/2022 ,  G03F7/70558 ,  G03F7/70775 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/67718

摘要： An exposure apparatus includes: a stage on which a substrate is placed; a plurality of light irradiation units (47) configured to emit light independently of each other to different positions in a right and left direction on a surface of the substrate, so as to form a strip-like irradiation area (30) extending from one end of the surface of the substrate to the other end of the substrate; a rotation mechanism (34) configured to rotate the substrate placed on the stage relative to the irradiation area; a stage moving mechanism (36) configured to move the stage relative to the irradiation area in a back and forth direction; and a control unit (10) configured to output control signals that make said exposure apparatus perform a first step that rotates the substrate relative to the irradiation area having a first illuminance distribution such that the whole surface of the substrate is exposed, and a second step that moves the substrate in the back and forth direction relative to the irradiation area having a second illuminance distribution while rotation of the substrate is being stopped, such that the whole surface of the substrate is exposed.