PACKAGE, GAS BARRIER LAMINATE, AND PACKAGING BODY

    公开(公告)号:EP3912924A1

    公开(公告)日:2021-11-24

    申请号:EP20741631.4

    申请日:2020-01-09

    Abstract: A package according to the present invention comprises: a packaging body constituted by a sheet that includes a gas barrier laminate and a sealant; and contents that are accommodated in the packaging body and that contain a sulfur-containing amino acid. The gas barrier laminate comprises: a resin substrate; a first layer containing an inorganic oxide; a second layer containing a carboxylic acid polymer; and a third layer containing a polyvalent metal compound and a resin. The resin substrate, the first layer, the second layer, and the third layer are layered in this order from the outside to the inside of the packaging body. The thickness of the third layer is 0.1 µm or more. The sulfur content of the second layer is 1.0 atm% or less.

    GAS BARRIER LAMINATE AND PACKAGE PROVIDED WITH SAME

    公开(公告)号:EP3741560A1

    公开(公告)日:2020-11-25

    申请号:EP19741638.1

    申请日:2019-01-18

    Abstract: A gas barrier laminate according to the present disclosure includes: a resin substrate; a first coating layer containing a carboxylic acid polymer; and a second coating layer containing a polyvalent metal compound and a resin, wherein: the resin substrate, the first coating layer, and the second coating layer are laminated in this order; a ratio of a thickness of the second coating layer to a thickness of the first coating layer is in the range of 1.0 or more and 4.0 or less; and the second coating layer satisfies at least one of the following conditions 1 to 3: (condition 1) a haze of the second coating layer is 8% or less; (condition 2) a surface roughness Ra of the second coating layer is 1/2 or less of the thickness of the second coating layer; and (condition 3) the number of concave portions having a diameter of 1.5 µm or more per unit area on a surface of the second coating layer opposite to the first coating layer is 2/0.01 mm 2 or less.

    FILM TREATMENT METHOD AND FILM PRODUCTION METHOD

    公开(公告)号:EP3647457A1

    公开(公告)日:2020-05-06

    申请号:EP18824625.0

    申请日:2018-06-04

    Abstract: Disclosed is a treatment method performed by a film processing apparatus 1 including: a first discharge electrode unit 3 and a second discharge electrode unit 4 respectively including magnets 3b and 4b that form a magnetic field; and an AC power source 5 capable of alternately switching polarities of the first discharge electrode unit 3 and the second discharge electrode unit 4. In the treatment method, a predetermined surface treatment of a film F is performed by generating a plasma P while alternately switching polarities of the first discharge electrode unit 3 and the second discharge electrode unit 4 by using high-frequency power supplied from the AC power source 5.

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