摘要:
The present invention is directed to a process for producing a glass passivated semiconductor device and to the device so produced. The process comprises forming at least one region having a second type of conductivity in a large area body of semiconductor material having a first type of conductivity, forming grooves (40, 42) through top and bottom surfaces (12, 14) of the large area body whereby a plurality of smaller area bodies are defined. The grooves (40, 42) are filled with a glass paste which is solidified in situ and the smaller bodies are cut from the larger body with a laser scribe. Each smaller body cut from the larger body includes the glass filled groove which defined it originally. Electrodes are then affixed to each of the smaller bodies thereby providing a semiconductor device.
摘要:
The preferred embodiment of the invention comprises a glass sealed thyristor (10) and a method for simultaneously constructing a plurality of thyristors on a common semiconductor wafer (46). The thyristor utilizes a body of semiconductor material with the cathode and base regions (20, 24) extending to one major surface (14) and the anode region (22) extending to the second major surface (16). A groove (36) is etched in the first surface of the body of semiconductor material to expose the PN junction formed at the interface of the cathode emitter and cathode emitter base regions. A second groove (40) is etched in the second major surface to expose the PN junction formed at the interface of the anode emitter region and the anode emitter base region. Ring shaped glass members (42). are fused to the body of semiconductor material to form seals providing environmental protection for the PN junctions exposed by etching the grooves in the major surfaces of the body of semiconductor material. A plurality of thyristors can be simultaneously constructed on a common semiconductor wafer.