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    REACTEUR DE DEPOT CHIMIQUE EN PHASE VAPEUR
    2.
    发明公开
    REACTEUR DE DEPOT CHIMIQUE EN PHASE VAPEUR 审中-公开

    公开(公告)号：EP3234233A1

    公开(公告)日：2017-10-25

    申请号：EP15820231.7

    申请日：2015-12-16

    Applicant: Saint-Gobain Isover

    Inventor： BEAUMONT, Bernard ,  POUROUCHOTTAMANE, Manivannane

    IPC: C30B25/14 ,  C30B29/40 ,  C23C16/30 ,  C23C16/44 ,  C23C16/455 ,  B01J4/00 ,  F15D1/08 ,  H01L21/02

    CPC classification number: C30B25/14 ,  B01J4/002 ,  B01J4/005 ,  B01J2204/002 ,  B01J2204/005 ,  C23C16/303 ,  C23C16/4401 ,  C23C16/4404 ,  C23C16/45506 ,  C23C16/45565 ,  C23C16/45574 ,  C23C16/45587 ,  C30B29/403 ,  C30B29/406 ,  F15D1/08

    Abstract: The invention concerns a reactor for chemical vapour deposition from first and second precursor gases, the reactor comprising: -a chamber including top and bottom walls and a side wall linking the top and bottom walls, -a support intended for receiving at least one substrate, mounted inside the chamber, and -at least one system for injecting precursor gases, the system comprising an injection head including at least one nozzle for supplying the first precursor gas (41) in a main direction of axis A-A', the at least one nozzle including: a precursor gas supply conduit (321), and an outlet member (322) generating a substantially annular vortex flow (44) around axis A-A'.

    Abstract translation: 本发明涉及一种用于从第一和第二前体气体进行化学气相沉积的反应器，该反应器包括： - 包括顶壁和底壁以及连接顶壁和底壁的侧壁的腔室， - 旨在用于接收至少一个基底的支撑件， 安装在所述腔室内，以及 - 至少一个用于注入前体气体的系统，所述系统包括注入头，所述注入头包括用于沿轴线A-A'的主方向供应所述第一前体气体（41）的至少一个喷嘴，所述至少一个 一个喷嘴包括：前体气体供应管道（321）以及围绕轴线A-A'产生基本上环形的涡流（44）的出口构件（322）。

    Devices for injection of gaseous streams into a bed of fluidized solids
    4.
    发明公开
    Devices for injection of gaseous streams into a bed of fluidized solids 有权
    用于注入气体的装置流入流化固体床

    公开(公告)号：EP2839874A1

    公开(公告)日：2015-02-25

    申请号：EP14182023.3

    申请日：2010-04-06

    Applicant: Lummus Technology Inc.

    Inventor： Castagnos, Leonce Francis, JR ,  Chan, Ting Yee ,  Pieper, Ronald Eugene ,  Kolb, Norman Paul

    IPC: B01J8/18 ,  F26B3/06

    CPC classification number: B01J19/26 ,  B01J4/002 ,  B01J4/005 ,  B01J8/1818 ,  B01J8/1827 ,  B01J8/44

    Abstract: A gas distribution apparatus (80), comprising: a distribution manifold (82) in fluid communication with a gas source and a plurality of injection nozzles (60) such injection nozzles (60) comprising a tube (62) with a fluid inlet (64), a fluid outlet (66), an inner diameter and an axial length; wherein the fluid inlet (64) of at least one of the plurality of injection nozzles (60) is disposed within the distribution manifold (82) and a fluid outlet; wherein the inlet (64) of the at least one of the injection nozzles (60) comprises an annular orifice (68) surrounding a flow restriction device (70, 70C, 70F); and wherein the fluid outlet (66) is external to an outer circumference (89) of the distribution manifold (82).

    Abstract translation: 气体分配装置（80），包括：分配歧管（82）流体连通的气体源和喷射喷嘴的多个（60）检测注射喷嘴（60）包括管（62）有流体入口（64 ），内径的流体出口（66）和轴向长度; worin喷射喷嘴的多个至少一个（60）在所述分配歧管（82）和流体出口内设置的流体入口（64）; worin喷射喷嘴的至少一个（60）的入口（64）在环形孔（68），包括围绕一个流量限制装置（70，70C，70F）; 和worin流体出口（66）的外部，在所述分配歧管（82）的外周（89）。

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