AROMATIC SULFONIUM SALT COMPOUND, PHOTOACID GENERATOR, RESIST COMPOSITION, CATIONIC POLYMERIZATION INITIATOR, AND CATIONICALLY POLYMERIZABLE COMPOSITION
    10.
    发明公开
    AROMATIC SULFONIUM SALT COMPOUND, PHOTOACID GENERATOR, RESIST COMPOSITION, CATIONIC POLYMERIZATION INITIATOR, AND CATIONICALLY POLYMERIZABLE COMPOSITION 审中-公开
    芳香族硫磺盐化合物,光致产酸剂,抗蚀剂组合物,阳离子聚合引发剂和阳离子可聚合组合物

    公开(公告)号:EP3272744A1

    公开(公告)日:2018-01-24

    申请号:EP15885452.1

    申请日:2015-03-18

    申请人: Adeka Corporation

    摘要: Provided are: an aromatic sulfonium salt compound which exhibits low corrosion to a substrate and excellent photolithographic characteristics and is thus useful as a photoacid generator and as a cationic polymerization agent; and a photoacid generator, a resist composition, a cationic polymerization initiator and a cationically polymerizable agent composition, which include the aromatic sulfonium salt compound. The aromatic sulfonium salt compound is represented by the following Formula (I):

    (wherein, R 1 to R 10 each independently represent a hydrogen atom, a halogen atom, a hydroxyl group, a nitro group, a cyano group, an alkyl group having 1 to 18 carbon atoms which is optionally substituted, or the like; R 11 to R 15 each independently represent a hydrogen atom, an alkoxy group having 1 to 18 carbon atoms which is optionally substituted, or the like; at least one of R 11 to R 15 is not a hydrogen atom; and X 1 - represents a monovalent organic sulfonate anion).

    摘要翻译: 本发明提供一种芳香族锍盐化合物,其对基材显示出低的腐蚀性和优异的光刻特性,因此可用作光酸产生剂和阳离子聚合剂; 以及包含芳香族锍盐化合物的光酸产生剂,抗蚀剂组合物,阳离子聚合引发剂和阳离子聚合剂组合物。 所述芳族锍盐化合物由下式(I)表示:其中,R 1至R 10各自独立地表示氢原子,卤素原子,羟基,硝基,氰基,具有1至10个碳原子的烷基 任选被取代的18个碳原子等; R 11至R 15各自独立地表示氢原子,任选被取代的具有1至18个碳原子的烷氧基等; R 11至R 15中的至少一个不是 氢原子;并且X1-表示一价有机磺酸根阴离子)。