公开(公告)号：EP3175015A2

公开(公告)日：2017-06-07

申请号：EP15747208.5

申请日：2015-07-31

申请人： Oxford University Innovation Limited

发明人： BABENKO, Vitaliy ,  GROBERT, Nicole

IPC分类号： C23C16/01 ,  C23C16/04 ,  C23C16/26 ,  C01B32/182 ,  C22C1/08

CPC分类号： B22F7/002 ,  B01J21/18 ,  B01J23/72 ,  B01J23/755 ,  B01J27/24 ,  B01J35/0006 ,  B01J37/0225 ,  B01J37/08 ,  B22F1/0014 ,  B22F1/0018 ,  B22F3/11 ,  B22F3/1109 ,  B22F3/1137 ,  B22F3/1146 ,  B22F3/24 ,  B22F3/26 ,  B22F2003/242 ,  B22F2003/244 ,  B22F2003/248 ,  B22F2301/10 ,  B22F2301/15 ,  B22F2302/45 ,  B22F2304/05 ,  B22F2304/10 ,  B22F2304/15 ,  B22F2998/10 ,  B22F2999/00 ,  C01B21/064 ,  C01B32/186 ,  C01B32/194 ,  C22C1/08 ,  C23C16/01 ,  C23C16/045 ,  C23C16/26 ,  C23C16/342 ,  C23C16/56 ,  C23F1/10 ,  H01B1/04 ,  H01B1/06 ,  H01B13/34 ,  H01G11/30 ,  H01G11/36 ,  H01G11/86 ,  H01M4/0428 ,  H01M4/0471 ,  H01M4/133 ,  H01M4/136 ,  H01M4/1393 ,  H01M4/1397 ,  H01M4/583 ,  H01M10/0525 ,  H01M2004/021 ,  B22F3/1035

摘要： According to the present invention, there are provided processes for preparing a porous composite material comprising a metal and a two-dimensional nanomaterial. In one aspect, the processes comprise the steps of: providing a powder comprising metal particles; heating the powder such that the metal particles fuse to form a porous scaffold; and forming a two-dimensional nanomaterial on a surface of the porous scaffold by chemical vapour deposition (CVD). Also provided are materials obtainable by the present processes, and products comprising said materials.

摘要翻译： 根据本发明，提供了制备包含金属和二维纳米材料的多孔复合材料的方法。 在一个方面，该方法包括以下步骤：提供包含金属颗粒的粉末; 加热粉末使得金属颗粒熔合以形成多孔支架; 以及通过化学气相沉积（CVD）在多孔支架的表面上形成二维纳米材料。 还提供了通过本发明方法可获得的材料和包含所述材料的产品。

公开(公告)号：EP0536362B1

公开(公告)日：1996-07-03

申请号：EP92908839.1

申请日：1992-04-21

申请人： Forschungszentrum Karlsruhe GmbH

发明人： STARK, Walter, Dr. ,  RUPRECHT, Robert, Dr.

IPC分类号： C23F1/44

CPC分类号： C23F1/10 ,  C23F1/20 ,  C23F1/26 ,  C23F1/28 ,  C23F1/36 ,  C23F1/44

摘要： An etching solution for removing a metallic layer from a substrate contains a hydrogenated compound that dissolves the metal itself while evolving hydrogen and a nitro-substituted organic compound. The solution is characterized by the fact that the selected nitro-substituted organic compound is a compound having an easily hydrogenizable nitro group.

公开(公告)号：EP2763808B1

公开(公告)日：2018-08-22

申请号：EP12778067.4

申请日：2012-10-05

申请人： Element Six Abrasives S.A.

发明人： DAVEL, Jacobus Stephanus

IPC分类号： B22F7/06 ,  C04B37/00 ,  C04B41/00 ,  C23F1/10

CPC分类号： B22F7/06 ,  C04B37/00 ,  C04B41/00 ,  C23F1/10 ,  C23F1/40

摘要： A method of processing a composite body comprising a super-hard structure and refractory metal material exposed proximate a boundary of the composite body, the refractory metal material comprising refractory metal. The method includes providing a basic corrosive agent, heating the corrosive agent to at least its melting point, contacting the composite body with the corrosive agent in the molten state and treating the composite body with the corrosive agent for a period of time to remove refractory metal material from the composite body.

公开(公告)号：EP2664691A4

公开(公告)日：2017-11-15

申请号：EP11851919

申请日：2011-12-16

申请人： HENKEL AG & CO KGAA

发明人： MORI KAZUHIKO ,  TAKAKUWA HIDEKI ,  YOROZU TAKAYUKI

IPC分类号： C23F1/36 ,  C23F3/02 ,  H01G9/045 ,  H01G9/055 ,  H01G11/70

CPC分类号： C23F1/20 ,  C23F1/10 ,  C23F1/36 ,  C23F3/02 ,  H01G9/045 ,  H01G9/055 ,  H01G11/70 ,  H01M4/661 ,  Y02E60/13

摘要： A composition of an etching agent for aluminum or aluminum alloy and a treatment method thereof are provided. The etching agent does not contain a component not suitable for a wastewater treatment, such as boron and fluorine, and has stable etching performance even when performing an etching treatment continuously. The etching agent has excellent aging resistance providing good etching uniformity and corrosion resistance after etching. This etching agent is an etching agent for aluminum or aluminum alloy, including 50 parts by mass of an aminocarboxylic acid, 5 to 300 parts by mass of at least one selected from a hydroxycarboxylic acid, a dicarboxylic acid, a polycarboxylic acid, and salts thereof, and 10 to 800 parts by mass of at least one selected from a hydroxide, a carbonate, and a bicarbonate of an alkali metal, wherein an aqueous solution of the etching agent has a pH of 8 to 10.

公开(公告)号：EP1649322A1

公开(公告)日：2006-04-26

申请号：EP03777970.9

申请日：2003-10-27

申请人： Honeywell International, Inc.

发明人： HUANG, Wei ,  KENNEDY, Joseph ,  KATSANES, Ronald

IPC分类号： G03C1/00 ,  B05D5/12 ,  B32B27/42 ,  C08J3/00

CPC分类号： H01L21/02118 ,  C04B26/12 ,  C04B2111/00482 ,  C08J7/02 ,  C08J2361/00 ,  C23F1/10 ,  C23F1/44 ,  C23F3/00 ,  C23F3/04 ,  H01L21/31051 ,  H01L21/312 ,  Y10T428/31942 ,  C04B2103/0093 ,  C04B2103/40

摘要： A planarization composition is disclosed herein that comprises: a) a structural constituent; and b) a solvent system, wherein the solvent system is compatible with the structural constituent and lowers the lowers at least one of the intermolecular forces or surface forces components of the planarization composition. A film that includes this planarization composition is also disclosed. In addition, another planarization composition is disclosed herein that comprises: a) a cresol-based polymer compound; and b) a solvent system comprising at least one alcohol and at least one ether acetate-based solvent. A film that includes this planarization composition is also disclosed. A layered component is also disclosed herein that comprises: a) a substrate having a surface topography; and b) a planarization composition or a film such as those described herein, wherein the composition is coupled to the substrate. Methods of forming a planarization compositions are also disclosed herein that comprise: a) providing a structural constituent; b) providing a solvent system, wherein the solvent system is compatible with the structural constituent and lowers at least one of the intermolecular forces or surface forces components of the planarization composition; and c) blending the structural constituent and the solvent system to form a planarization composition. Methods of forming a film are also disclosed that comprise: a) providing a planarization composition such as those disclosed herein; and b) evaporating at least part of the solvent system to form a film.

公开(公告)号：EP2927299A2

公开(公告)日：2015-10-07

申请号：EP15159769.7

申请日：2015-03-19

申请人： Panasonic Intellectual Property Management Co., Ltd.

发明人： Machida, Hironobu ,  Suzuki, Motohiro ,  Takeguchi, Shinsuke ,  Shii, Kentaro

IPC分类号： C09K5/06 ,  F28D20/02

CPC分类号： F28D20/025 ,  B01D9/0013 ,  B01D9/005 ,  C09K5/063 ,  C23F1/10 ,  F24F5/0017 ,  F28D20/021 ,  F28D20/028 ,  F28F13/185 ,  F28F21/081 ,  F28F21/084 ,  F28F21/085 ,  Y02E60/145 ,  Y02E60/147

摘要： A heat storage apparatus according to the present disclosure includes a heat storage material and a member. The heat storage material forms a clathrate hydrate by cooling. The member has a surface with a plurality of holes. In the case that the lattice constant of the clathrate hydrate is denoted by L and the outside diameter of a cage included in the clathrate hydrate is denoted by D, the plurality of holes are spaced at intervals of 1 L to 10L, and each of the plurality of holes has a hole diameter of 1D to 20D.

摘要翻译： 一种蓄热装置gemäß本公开包括储热材料和构件。 储热材料通过冷却形成的笼形水合物。 所述构件具有孔的多个表面。 在这种情况下所做的笼形水合物的晶格常数设为L，并且包括在笼形水合物的保持架的外径设为D时，空穴的多元性以1L至10L的间隔间隔开，并且每个 孔的多个有1D的孔径至20D。

公开(公告)号：EP2458033B1

公开(公告)日：2013-10-09

申请号：EP11468004.4

申请日：2011-10-04

申请人： Univerza V Mariboru

发明人： Boncina Tonica ,  Zupanic Franc ,  Markoli Bostjan

IPC分类号： C23F1/00 ,  C23F1/10 ,  G01N1/32

CPC分类号： C23F1/00 ,  C23F1/10 ,  G01N1/32

公开(公告)号：EP2542709A1

公开(公告)日：2013-01-09

申请号：EP11750264.1

申请日：2011-02-26

申请人： L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude

发明人： SAKATA, Yoichi

IPC分类号： C23C16/44 ,  H01L21/205 ,  H01L21/304

CPC分类号： C11D11/0047 ,  C11D7/264 ,  C11D7/267 ,  C11D7/32 ,  C11D7/3209 ,  C11D7/5013 ,  C11D7/5022 ,  C23F1/10 ,  C23G5/032 ,  C23G5/036

摘要： Disclosed are cleaning solvents and cleaning methods for metallic compounds deposited on the equipment that supplies organometallic compounds to the manufacturing tool in the photovoltaic industry or the semiconductor industry. The cleaning solvents and the cleaning methods disclosed not only selectively remove the metallic compound without corroding the equipment, but also improve the ordinary cleaning process. Moreover, the cleaning solvents and the cleaning methods disclosed improve maintenance costs for the supply system because the equipment may be cleaned without being detached from the supply system.

公开(公告)号：EP0536362A1

公开(公告)日：1993-04-14

申请号：EP92908839.0

申请日：1992-04-21

申请人： KERNFORSCHUNGSZENTRUM KARLSRUHE GMBH

发明人： STARK, Walter, Dr. ,  RUPRECHT, Robert, Dr.

IPC分类号： C23F1

CPC分类号： C23F1/10 ,  C23F1/20 ,  C23F1/26 ,  C23F1/28 ,  C23F1/36 ,  C23F1/44

摘要： Une solution d'attaque qui sert à enlever une couche métallique déposée sur un substrat contient un composé hydrogéné qui dissout le métal proprement dit tout en dégageant de l'hydrogène et un composé organique à substitution nitro. La solution se caractérise par le fait que l'on sélectionne comme composé organique à substitution nitro un composé dont le groupe nitro est facile à hydrogéner.

公开(公告)号：EP2763808A1

公开(公告)日：2014-08-13

申请号：EP12778067.4

申请日：2012-10-05

申请人： Element Six Abrasives S.A.

发明人： DAVEL, Jacobus Stephanus

IPC分类号： B22F7/06 ,  C04B37/00 ,  C04B41/00 ,  C23F1/10

CPC分类号： B22F7/06 ,  C04B37/00 ,  C04B41/00 ,  C23F1/10 ,  C23F1/40

摘要： A method of processing a composite body comprising a super-hard structure and refractory metal material exposed proximate a boundary of the composite body, the refractory metal material comprising refractory metal. The method includes providing a basic corrosive agent, heating the corrosive agent to at least its melting point, contacting the composite body with the corrosive agent in the molten state and treating the composite body with the corrosive agent for a period of time to remove refractory metal material from the composite body.