METHOD TO PROGRAM BITCELLS OF A ROM ARRAY
    2.
    发明公开
    METHOD TO PROGRAM BITCELLS OF A ROM ARRAY 审中-公开
    VERFAHREN ZUR PROGRAMMIERUNG VON BITZELLEN EINER ROM-ANORDNUNG

    公开(公告)号:EP3121818A1

    公开(公告)日:2017-01-25

    申请号:EP15178040.0

    申请日:2015-07-23

    申请人: Synopsys, Inc.

    IPC分类号: G11C17/10 G11C17/12 G11C17/18

    摘要: A method to program bitcells (11, ..., mn) of a ROM array (10) uses different programming cells (0a, ..., 0h, 1a, ..., 1d) for programming the bitcells (11, ..., mn) with a first or second data item. A first bitcell (11) is programmed by means of a selected programming cell, wherein the programming cell is selected in dependence on operating the memory array (10) as a flipped or a non-flipped memory in multi-bank instance. All other bitcells (12, 13) located in the same column (C1) as the first bitcell (11) and subsequent rows (R2, R3) are programmed by selected programming cells, wherein the selection of the programming cells is dependent on operating the memory array (10) as a flipped or a non-flipped memory in multi-bank instance and the programming state of the programming cells used for the previously programmed bitcells in the same column (C1).

    摘要翻译: 用于对ROM阵列(10)的位单元(11,...,mn)进行编程的方法使用不同的编程单元(0a,...,0h,1a,...,1d)来编程位单元(11,..., ..,mn)与第一或第二数据项。 第一位单元(11)通过所选择的编程单元进行编程,其中根据多存储器实例中的翻转存储器或非翻转存储器操作存储器阵列(10)来选择编程单元。 位于与第一位单元(11)和后续行(R2,R3)相同的列(C1)中的所有其它位单元(12,13)由选定的编程单元编程,其中编程单元的选择取决于操作 存储器阵列(10)作为多组实例中的翻转存储器或非翻转存储器,以及用于同一列(C1)中的先前编程的位单元的编程单元的编程状态。

    MEMOIRE A STRUCTURE DU TYPE EEPROM ET A LECTURE SEULE
    4.
    发明公开
    MEMOIRE A STRUCTURE DU TYPE EEPROM ET A LECTURE SEULE 有权
    MEMOIRE结构DU TYPE EEPROM ET LEARURE SEULE

    公开(公告)号:EP2286450A1

    公开(公告)日:2011-02-23

    申请号:EP09757723.3

    申请日:2009-05-12

    发明人: FORNARA, Pascal

    摘要: A non-volatile memory including at least first and second memory cells each including a storage MOS transistor with dual gates and an insulation layer provided between the two gates. The insulation layer of the storage transistor of the second memory cell includes at least one portion that is less insulating than the insulation layer of the storage transistor of the first memory cell.

    摘要翻译: 一种非易失性存储器,至少包括第一和第二存储单元,每个存储单元包括具有双栅极的存储MOS晶体管和设置在两个栅极之间的绝缘层。 第二存储器单元的存储晶体管的绝缘层包括绝缘层比第一存储器单元的存储晶体管的绝缘层更少的至少一个部分。

    METHOD TO PROGRAM BITCELLS OF A ROM ARRAY

    公开(公告)号:EP3121818B1

    公开(公告)日:2018-08-22

    申请号:EP15178040.0

    申请日:2015-07-23

    申请人: Synopsys, Inc.

    摘要: A method to program bitcells (11, ..., mn) of a ROM array (10) uses different programming cells (0a, ..., 0h, 1a, ..., 1d) for programming the bitcells (11, ..., mn) with a first or second data item. A first bitcell (11) is programmed by means of a selected programming cell, wherein the programming cell is selected in dependence on operating the memory array (10) as a flipped or a non-flipped memory in multi-bank instance. All other bitcells (12, 13) located in the same column (C1) as the first bitcell (11) and subsequent rows (R2, R3) are programmed by selected programming cells, wherein the selection of the programming cells is dependent on operating the memory array (10) as a flipped or a non-flipped memory in multi-bank instance and the programming state of the programming cells used for the previously programmed bitcells in the same column (C1).

    Nonvolatile memory producing apparatus and method
    8.
    发明公开
    Nonvolatile memory producing apparatus and method 失效
    对于非易失性存储器中的产生方法和设备

    公开(公告)号:EP0712136A2

    公开(公告)日:1996-05-15

    申请号:EP95117328.5

    申请日:1995-11-03

    IPC分类号: G11C17/14 H01L21/8246

    摘要: A nonvolatile memory producing apparatus has a data computing section 31, an electron patterning section 33 for patterning a wafer 3 by using an electron beam, a control section 32 for controlling +the electron patterning section 33 on the basis of the result from the data computing section 31. The data computing section 31 prepares binary codes for individual IC chips formed on the wafer 3, and generates coordinate regarding the wafer 3 and the IC chips. The data computing section 31 computes direct draw data for each IC chip based on the binary codes, and generates direct pattern data based on the binary codes and the direct draw data. The control section 32 and the electron-beam patterning section 33 cooperate to perform direct electron-beam patterning on the IC chips in accordance with the pattern data.