摘要:
Procédé de porosification d'une couche de (AI,ln,Ga)N fortement dopé comprenant les étapes suivantes : a) fournir une structure (100) comprenant successivement : - une couche support (114), - une première couche (111) de GaN non dopé, disposée sur la couche support (114), - une couche additionnelle (113) de GaN fortement dopé (113), disposée sur la première couche (111) de GaN non dopé, - une deuxième couche (112) de GaN dopé, disposée sur la couche additionnelle (113) de GaN fortement dopé, - une troisième couche (123) de (AI,ln,Ga)N fortement dopé,
b) relier électriquement la structure (100) et une contre-électrode à un générateur de tension ou de courant, c) plonger la structure (100) et la contre-électrode dans une solution électrolytique, d) appliquer une tension ou un courant entre la structure (100) et la contre-électrode de manière à porosifier la troisième couche (123) de (AI,ln,Ga)N fortement dopé.
摘要:
When a semiconductor light emitting device or a semiconductor device is manufactured by growing nitride III-V compound semiconductor layers, which will form a light emitting device structure or a device structure, on a nitride III-V compound semiconductor substrate composed of a first region in form of a crystal having a first average dislocation density and a plurality of second regions having a second average dislocation density higher than the first average dislocation density and periodically aligned in the first region, device regions are defined on the nitride III-V compound semiconductor substrate such that the device regions do not substantially include second regions, emission regions or active regions of devices finally obtained do not include second regions.
摘要:
The present invention relates to a GaN crystal having a carrier concentration of from 5 x 10 17 to 2 × 10 19 atoms/cm 3 which is obtainable by nitride crystal growth in the presence of a solvent in a supercritical state and/or a subcritical state in the reactor, using a nitride crystal starting material that has a bulk density of from 0.7 to 4.5 g/cm 3 and has an oxygen concentration in the crystal of from 10 to 500 ppm and an acidic mineralizing agent.
摘要翻译:本发明涉及具有5×1017到2×1019个原子的载流子浓度/ GaN晶体立方厘米其是由在反应器中的超临界状态和/或亚临界状态的溶剂的存在下氮化物晶体生长获得的 使用体积密度为0.7〜4.5g / cm 3且结晶中的氧浓度为10〜500ppm的氮化物结晶原料和酸性矿化剂。
摘要:
A core-shell nanowire device includes an eave region having a structural discontinuity from the p-plane in the upper tip portion of the shell to the m-plane in the lower portion of the shell. The eave region has at least 5 atomic percent higher indium content than the p-plane and m-plane portions of the shell.
摘要:
Provided is a light-emitting element which is capable of improving the external quantum efficiency by controlling a dopant concentration of an interface between a light-emitting layer and another semiconductor layer. A nitride-based semiconductor light-emitting element includes: a first semiconductor layer 20 of a first conductivity type; a second semiconductor layer 50 of a second conductivity type; a carrier block layer 40 provided in the second semiconductor layer 50 on a side closer to the first semiconductor layer 20 and containing an impurity of the second conductivity type; a light-emitting layer 30 provided between the first semiconductor layer 20 and the carrier block layer 40; and a spacer layer 35 which is provided between the carrier block layer 40 and the light-emitting layer 30 and makes the concentration of the impurity of the second conductivity type in the vicinity of the interface with the light-emitting layer 30 be at a predetermined concentration or less.
摘要:
A core-shell nanowire device includes an eave region having a structural discontinuity from the p-plane in the upper tip portion of the shell to the m-plane in the lower portion of the shell. The eave region has at least 5 atomic percent higher indium content than the p-plane and m-plane portions of the shell.