摘要:
The invention relates to an ultraviolet laser processing system (1) comprising: - a structure (100); - a casing (200), removably mounted in the structure, comprising a laser source (202) adapted to produce a laser beam; - a supply unit (400), mounted in the structure, and adapted to provide an electric current and a fluid to the laser source to produce the laser beam; - an optical unit (600), mounted in the structure, adapted to shape the laser beam, the optical unit comprising a circularity correction module (620) designed to provide a variable adjustment of a circularity of the laser beam and/or an astigmatism correction module (630) designed to provide a variable adjustment of an astigmatism of the laser beam; - an electric connector (510) adapted to conduct the electrical current from the supply unit to the laser source; - a fluidic connector (520, 530) adapted to conduct the fluid from the supply unit to the laser source.
摘要:
A laser device (100), configured for generating laser pulses, has a laser resonator (10) with a gain disk medium (11) and a Kerr medium (12). The laser resonator (10) includes a first mode shaping section (13) which is adapted for shaping a circulating electric field coupled into the gain disk medium (11), and a second mode shaping section (14), which is adapted for shaping the circulating electric field coupled into the Kerr medium (12) independently of the electric field shaping in the first mode shaping section (13). Furthermore, a method of generating laser pulses (1) using a laser resonator (10) with a gain disk medium (11) and a Kerr medium (12) is described.
摘要:
The present invention includes an expcssure chamber configured to contain a passivating gas having a selected hydrogen concentration, the exposure chamber further configured to contain at least one NLO crystal for exposure to the passivating gas within the chamber, a passivating gas source fluldicaUy connected to the exposure chamber, the passivating gas source configured to supply passivating gas to an interior portion of the exposure chamber, and a substrate configured to hold the NLO crystal within the chamber,, the substrate further configured to maintain a temperature of the NLO crystal at or near a selected temperature, the selected temperature being below a melting temperature of the NLO crystal.
摘要:
The invention relates to a laser module (100) having a housing (110a) and having at least one laser unit (120) that is disposed in the housing (110a) for generating laser pulses. According to the invention, the laser module (100) has at least one primary sealing region (130a) and at a secondary sealing region (130b) that is disposed at least partially in the primary sealing region (130a) and the laser unit (120) is disposed inside the secondary sealing region (130b).
摘要:
The invention relates to a laser module (100) having a housing (110a) and having at least one laser unit (120) that is disposed in the housing (110a) for generating laser pulses. According to the invention, the laser module (100) has at least one primary sealing region (130a) and at a secondary sealing region (130b) that is disposed at least partially in the primary sealing region (130a) and the laser unit (120) is disposed inside the secondary sealing region (130b).
摘要:
The system contains a purge chamber 12, 112. A substantially optically transparent wall 14, 114 is formed along the purge chamber 12, 112. A laser projector 16, 116 is mounted within the purge chamber 12, 112. The laser projector 16, 116 is positioned to project a laser beam through the substantially optically transparent wall 14, 114. The system may be used to project images onto objects to assist in manufacturing processes.
摘要:
The present invention relates to a cooling device (7) comprising Peltier elements (18) and mainly intended for cooling an optical crystal or a laser crystal (5) which is submitted to a high temperature stress and is used for generating laser beams (2), principally laser pulses. This device can for example be used for cooling the laser crystal of an optical amplifier or oscillator. In order to provide an efficient cooling while avoiding burning the crystal, said crystal (5) is arranged together with the Peltier elements (18) for cooling the same in an encapsulated container (8), the inner volume of which is maintained under vacuum and/or kept dry using a desiccating substance. Said crystal comprises at least one Brewster's window (32, 33) allowing the passage of the laser beams (2), wherein said window is arranged at an angle corresponding to the Brewster angle relative to the optical axis.
摘要:
A solid-state laser device includes an inner container (3), an outer container (4), a cooling medium supply unit (5), and a cover section (6). The inner container (3) in which a laser medium (2A) is accommodated includes an inner light-transmitting unit (20). An outer light-transmitting unit (21) of the outer container (4) is provided at a part that faces the inner light-transmitting unit (20) and is vacuum-insulated from the inner light-transmitting unit (20). The cooling medium supply unit (5) supplies a cooling medium so that the cooling medium comes in contact with a surface other than a light input and output surface (15A) in the laser medium (2A). The cover section (6) partitions a light-passing area (A1) from a cooling medium supply area (A2) to which the cooling medium is supplied.