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19 条记录 (耗时 0.013 秒)

    Photosensitive compound, resin and composition
    3.
    发明公开
    Photosensitive compound, resin and composition 有权
    Lichtempfindliche Verbindung，Harz und Zusammensetzung

    公开(公告)号：EP1349005A1

    公开(公告)日：2003-10-01

    申请号：EP03006374.7

    申请日：2003-03-20

    申请人： Toyo Gosei Kogyo Co., Ltd.

    发明人： Shibuya, Toru, Toyo Gosei Kogyo Co., Ltd. ,  Kurihara, Masanori, Toyo Gosei Kogyo Co., Ltd. ,  Takeda, Mineko, Toyo Gosei Kogyo Co., Ltd. ,  Yamada, Kazuo, Toyo Gosei Kogyo Co., Ltd.

    IPC分类号： G03F7/008 ,  G03F7/012 ,  C07C247/18 ,  C08F8/00

    CPC分类号： G03F7/012 ,  C07C247/18 ,  C08F8/30 ,  C08F8/48 ,  G03F7/0007 ,  G03F7/008 ,  C08F16/06

    摘要： The present invention provides a novel photosensitive compound having an azido group suitable for exposure to light of a short wavelength; a photosensitive resin containing the photosensitive compound; and a photosensitive composition containing the photosensitive compound or photosensitive resin. The photosensitive compound containing a photosensitive unit represented by formula (1):
    wherein R is selected from among the following groups,
    X is selected from among the following groups,
    and each of Y and Z represents a hydrogen atom, an alkyl group, an acetal-group-containing alkyl group, an aryl group, an aralkyl group, or a substituent containing a base-forming nitrogen atom, wherein at least one of R and X contains an azido group.

    摘要翻译： 本发明提供了具有适合暴露于短波长的光的叠氮基的新型光敏化合物; 含有感光性化合物的感光性树脂; 和含有感光性化合物或感光性树脂的感光性组合物。 含有式（1）表示的光敏单元的光敏化合物：其中R选自以下基团，CHEM> X选自以下基团，CHEM，Y和Z各自表示 氢原子，烷基，含缩醛基的烷基，芳基，芳烷基或含有形成氮原子的取代基，其中R和X中的至少一个含有叠氮基。

    Improved photoresists and method for making printing plates
    5.
    发明公开
    Improved photoresists and method for making printing plates 失效
    Verbesserte Photoresiste und Verfahren zur Herstellung von Druckplatten

    公开(公告)号：EP0814382A1

    公开(公告)日：1997-12-29

    申请号：EP97109966

    申请日：1997-06-18

    申请人： PRINTING DEV INC

    发明人： HOLMAN BRUCE III ,  ZALOOM JEFFREY G ,  ZHOU PEIGUANG ,  SHARKOZY LARRY ,  MULVEY MERLIN L

    IPC分类号： G03F7/004 ,  B41C1/05 ,  B41C1/055 ,  B41C1/10 ,  C07C247/18 ,  G03F7/00 ,  G03F7/008 ,  G03F7/033 ,  G03F7/039 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38 ,  H05K3/06

    CPC分类号： G03F7/008 ,  B41C1/1008 ,  B41C2210/02 ,  B41C2210/10 ,  B41C2210/24 ,  C07C247/18 ,  Y10S430/145 ,  Y10S430/146

    摘要： Printing plates having a photoresist layer thereon that can be exposed by a computer controller laser have improved sensitivity and do not require a photomask step. We have found photoresists that include a film forming polymer, an organo azide and a photosensitive dye that absorbs light at the frequency of the patterning laser and converts it to heat energy. The heat energy in turn elevates the temperature of the organo azide above its dissociation temperature, destroying the azide in areas exposed to the light source, and solubilizing those regions. A flood exposure with ultraviolet light hardens the unexposed resist, improving its resistance to etch solvents. Thus a flood exposure with ultraviolet light can be performed prior to or after pattern exposure, to harden the resist.

    摘要翻译： 其上具有可由计算机控制器激光器曝光的光致抗蚀剂层的印刷板具有改进的灵敏度，并且不需要光掩模步骤。 我们已经发现光致抗蚀剂包括成膜聚合物，有机叠氮化物和感光染料，其以图案化激光的频率吸收光并将其转化为热能。 热能又将有机叠氮化物的温度升高到其解离温度以上，破坏暴露于光源的区域中的叠氮化物，并溶解这些区域。 用紫外线的泛滥曝光使未曝光的抗蚀剂变硬，从而提高其对蚀刻溶剂的抵抗力。 因此，在图案曝光之前或之后可以进行具有紫外线的泛光曝光，以使抗蚀剂硬化。