COATING COMPOSITION, OPTICAL MEMBER, AND ILLUMINATOR

    公开(公告)号:EP3572475A1

    公开(公告)日:2019-11-27

    申请号:EP18742312.4

    申请日:2018-01-12

    Inventor: SHIGENO, Hiroki

    Abstract: A coating composition contains: a fluororesin that imparts water repellency and includes a hydroxyl group; and a hydrophilic material that imparts hydrophilicity and includes a hydroxyl group. Moreover, the coating composition contains a bonding material that has a plurality of functional groups to be bonded to hydroxyl groups and bonds the fluororesin and the hydrophilic material to each other. An optical member 10 includes the coating film 2, which is obtained from the coating composition, on at least a part of a surface thereof. An illuminator 100 includes: a light-guiding plate 10A composed of the optical member; and a light source 20 that emits light to be made incident onto the light-guiding plate.

    COMPOSITION FOR FORMING ANTI-REFLECTION COATING
    9.
    发明公开
    COMPOSITION FOR FORMING ANTI-REFLECTION COATING 审中-公开
    组合物用于形成抗反射涂层

    公开(公告)号:EP1484645A4

    公开(公告)日:2008-12-17

    申请号:EP03705153

    申请日:2003-02-14

    CPC classification number: G03F7/091 Y10S430/108

    Abstract: A composition for forming an anti-reflection coating usable in a lithography process for manufacturing a semiconductor device, which comprises a polymer compound containing a halogen atom; a method for adjusting the damping coefficient of the anti-reflection coating which comprises changing the content of the halogen atom in the polymer compound; and an anti-reflection coating prepared from the composition. The polymer compound preferably has a halogen atom introduced into the main chain thereof and/or a side chain connected with the main chain. The anti-reflection coating can be used in a lithography process using an irradiation light of F2-excimer laser (wave length: 157 nm), exhibits high effect of preventing the reflection of the light, and does not cause the intermixing with a resist layer.

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