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    EPI-ILLUMINATION FOURIER PTYCHOGRAPHIC IMAGING FOR THICK SAMPLES
    2.
    发明公开
    EPI-ILLUMINATION FOURIER PTYCHOGRAPHIC IMAGING FOR THICK SAMPLES 审中-公开
    EPI-ILLUMINATION FOURIER用于测量厚度样本的人像摄影

    公开(公告)号：EP3238135A1

    公开(公告)日：2017-11-01

    申请号：EP15874344.3

    申请日：2015-12-22

    申请人： CALIFORNIA INSTITUTE OF TECHNOLOGY

    发明人： HORSTMEYER, Roarke, W. ,  YANG, Changhuei

    IPC分类号： G06K9/00 ,  G21K7/00

    摘要： Certain aspects pertain to epi-illumination Fourier ptychographic imaging systems and methods for high resolution imaging of thick samples.

    摘要翻译： 某些方面涉及落射照明傅立叶成像系统和用于厚样本的高分辨率成像的方法。 这里公开的示例系统包括：可变照明源，其被配置为以多个入射角顺序提供辐射; 第一偏振器系统，其被配置为使来自所述可变照明源的辐射偏振为入射在样本上的第一偏振状态; 收集光学器件，所述收集光学器件被构造成接收从所述样本发出的辐射 第二偏振器系统，其被配置为接收穿过所述收集光学器件的辐射; 辐射检测器，被配置为接收来自第二偏振器系统的辐射; 以及处理器，被配置为从第一强度图像序列和第二强度图像序列确定散射表面强度图像序列。

    X-RAY IRRADIATION DEVICE AND ANALYSIS DEVICE
    3.
    发明公开
    X-RAY IRRADIATION DEVICE AND ANALYSIS DEVICE 有权
    RÖNTGENBESTRAHLUNGSVORRICHUNGUND ANALYSEVORRICHTUNG

    公开(公告)号：EP2542035A4

    公开(公告)日：2017-05-31

    申请号：EP11762263

    申请日：2011-03-30

    申请人： NAT INST FOR MATERIALS SCIENCE ,  ULVAC-PHI INC

    发明人： YAMAZUI HIROMICHI ,  KOBAYASHI KEISUKE ,  IWAI HIDEO ,  KOBATA MASAAKI

    IPC分类号： G01N23/227 ,  G21K1/06 ,  G21K7/00 ,  H01J35/28 ,  H01J35/30

    CPC分类号： G01N23/2273 ,  G01N2223/204 ,  G01N2223/206 ,  G21K1/06 ,  G21K7/00 ,  H01J35/28 ,  H01J35/30 ,  H01J2235/081 ,  H01J2235/086 ,  H01J2235/163

    摘要： [Object] The present invention provides an X-ray irradiation device capable of adjusting the energy of X-rays in a wide range, and an analysis device equipped with the X-ray irradiation device. [Solving Means] An X-ray irradiation device according to an embodiment of the present invention focuses X-rays emitted from an X-ray generation mechanism to a predetermined focal position by a focusing mechanism. The X-ray generation mechanism has a structure which generates a plurality of X-rays having different wavelengths. The focusing mechanism has a structure in which the plurality of X-rays are focused to the same focal position by focusing elements having diffraction characteristics suitable for the wavelengths of the respective X-rays generated by the X-ray generation mechanism.

    摘要翻译： 发明内容本发明提供一种能够在宽范围内调整X射线的能量的X射线照射装置以及具备该X射线照射装置的分析装置。 [解决手段]根据本发明实施例的X射线照射装置通过聚焦机构将从X射线产生机构发射的X射线聚焦到预定焦点位置。 X射线产生机构具有产生具有不同波长的多个X射线的结构。 聚焦机构具有这样的结构，其中通过具有适合于由X射线产生机构产生的各个X射线的波长的衍射特性的聚焦元件将多个X射线聚焦到相同的焦点位置。

    Process for imaging
    7.
    发明授权
    Process for imaging 有权
    一种用于成像方法

    公开(公告)号：EP1987523B1

    公开(公告)日：2015-12-09

    申请号：EP07762817.0

    申请日：2007-01-26

    申请人： THE BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM

    发明人： KELLER, Charles ,  BAHADUR, Ali, N.

    IPC分类号： G21K7/00 ,  G01N23/083 ,  G01N1/30 ,  G01N23/04 ,  A61B6/00

    CPC分类号： G01N1/30 ,  A61B6/508 ,  G01N23/046 ,  G01N2223/419 ,  G01N2223/612

    摘要： Processes for producing a microCT image for virtual histology using x-ray microscopic computed tomography are described along with processes for rapid and inexpensive high-throughput methods of high resolution imaging for screening an ex vivo embryo for phenotype using computed tomography imaging. Staining of particular components of specimens with one or more staining agents is described which contributes to high quality image generation and identification of anatomical structures as well as localization of molecular targets. Inventive animal and specimen holders are detailed which allow for reduced post-imaging processing of generated images. In particular, animal and specimen holders are provided which include a highly transparent bed or liner which separates the animal or specimen from a less transparent structure. A further animal holder is provided for placing and/or maintaining the animal in a desired position during an imaging procedure or multiple imaging procedures including a bed conforming to the animal's body.

    X-RAY DIFFRACTION MICROSCOPE AND X-RAY DIFFRACTION MEASUREMENT METHOD USING X-RAY DIFFRACTION MICROSCOPE
    9.
    发明公开
    X-RAY DIFFRACTION MICROSCOPE AND X-RAY DIFFRACTION MEASUREMENT METHOD USING X-RAY DIFFRACTION MICROSCOPE 有权
    自行车

    公开(公告)号：EP1672361A1

    公开(公告)日：2006-06-21

    申请号：EP04773156.7

    申请日：2004-09-09

    申请人： National Institute for Materials Science

    发明人： SAKURAI, Kenji ,  MIZUSAWA, Tazuko

    IPC分类号： G01N23/207 ,  G21K7/00

    CPC分类号： G01N23/207 ,  G01N23/20 ,  G21K7/00

    摘要： An X-ray diffraction microscope apparatus (1) has an X-ray generating apparatus (2), a sample stage (3), a collimator (4) serving to suppress angle divergence, a two-dimensional X-ray detector (5) having an energy resolving power, an image processing apparatus, and an image recording and displaying apparatus (6). An angle divergence of diffracted X-rays is suppressed by moving a sample (7) and the two-dimensional X-ray detector (5) as close as possible via the collimator (4). The diffracted X-rays are measured and imaged in a state in which the two-dimensional X-ray detector (5) and the sample stage (3) are at a standstill without being moved. Accordingly, it is possible to provide an X-ray diffraction microscope apparatus which can acquire an image in an extremely short time, and can image a difference of an inhomogeneous sample, a material in which different crystal structures exist in one sample or a sample in which textures having different directions are contained and an X-ray diffraction measuring method using the X-ray diffraction microscope apparatus.

    摘要翻译： X射线衍射显微镜装置（1）具有X射线产生装置（2），样品台（3），用于抑制角度发散的准直器（4），二维X射线检测器（5） 具有能量分辨能力，图像处理装置和图像记录和显示装置（6）。 通过准直器（4）将样品（7）和二维X射线检测器（5）尽可能靠近移动来抑制衍射X射线的角度发散。 在二维X射线检测器（5）和样品台（3）处于静止状态而不被移动的状态下，测量并成像衍射的X射线。 因此，可以提供能够在极短时间内获取图像的X射线衍射显微镜装置，并且可以对不均匀样品，在一个样品或样品中存在不同晶体结构的材料进行成像 包含具有不同方向的纹理和使用X射线衍射显微镜装置的X射线衍射测量方法。

    MULTI-DETECTOR MICROSCOPIC INSPECTION SYSTEM
    10.
    发明公开
    MULTI-DETECTOR MICROSCOPIC INSPECTION SYSTEM 有权
    与多个探测器微观调查制度

    公开(公告)号：EP1481279A2

    公开(公告)日：2004-12-01

    申请号：EP03715985.2

    申请日：2003-02-05

    申请人： KLA-Tencor Technologies Corporation

    发明人： LANGE, Steven, R.

    IPC分类号： G02B27/12 ,  G02B21/06 ,  G02B15/14 ,  G02B5/08 ,  G21K7/00

    CPC分类号： G02B17/086 ,  G02B17/0808 ,  G02B17/0856 ,  G02B17/0892 ,  G02B21/0016 ,  G02B21/025 ,  G02B21/04 ,  G02B21/18 ,  G02B21/367

    摘要： Techniques for utilizing a microscope inspection system (100) capable of inspecting specimens (112) at high throughput rates are described. The inspection system achieves the higher throughput rates by utilizing more than one detector array (116) and a large field of view to scan the surface of the semiconductor wafers. The microscope inspection system also has high magnification capabilities, a high numerical aperture, and a large field of view. By using more than one detector array, more surface area of a wafer can be inspected during each scanning swath across the semiconductor wafers. The microscope inspection system is configured to have a larger field of view so that the multiple detector arrays can be properly utilized. Additionally, special arrangements of reflective and/or refractive surfaces are used in order to fit the detector arrays within the physical constraints of the inspection system.