利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

88 条记录 (耗时 0.023 秒)

    Deposition rate is high arc evaporation source, the arc evaporation source film production method and the film forming apparatus using the
    12.
    发明专利
    Deposition rate is high arc evaporation source, the arc evaporation source film production method and the film forming apparatus using the 有权

    公开(公告)号：JP5318052B2

    公开(公告)日：2013-10-16

    申请号：JP2010201946

    申请日：2010-09-09

    申请人： 株式会社神戸製鋼所

    发明人： 信一 谷藤 ,  兼司 山本 ,  誉 野村 ,  好徳 黒川 ,  直行 後藤

    IPC分类号： C23C14/24

    CPC分类号： B23K9/00 ,  C23C14/325 ,  H01J37/32055 ,  H01J37/3402

    摘要： Disclosed is an arc evaporation source having fast film-forming speed. The disclosed arc evaporation source (1) is provided with: at least one circumference magnet (3) which surrounds the circumference of a target (2), and which is arranged so that the magnetization direction of the magnet runs along the direction orthogonal to the surface of the target (2); a non-ring shaped first permanent magnet (4A) which is arranged on the rear surface side of the target (2), has polarity in the same direction as the polarity of the circumference magnet (3), and is arranged so that the magnetization direction thereof runs along the direction orthogonal to the surface of the target (2); a non-ring shaped second permanent magnet (4B) which is arranged either on the rear surface side of the first permanent magnet (4A) or between the first permanent magnet (4A) and the target (2), so as to leave a gap from the first permanent magnet (4A), and which has polarity in the same direction as the polarity of the circumference magnet (3), and is arranged so that the magnetization direction thereof runs along the direction orthogonal to the surface of the target (2); and a magnetic body (5) which is arranged between the first permanent magnet (4A) and the second permanent magnet (4B).