Abstract:
PROBLEM TO BE SOLVED: To allow for an easy and quick selection of an inspection recipe suitable for sampling from among many inspection recipes. SOLUTION: A computational unit 14 displays many inspection recipes on the GUI 16. The inspection recipe includes a setting value used for controlling a charged particle column irradiating a charged particle beam to a sample and many characteristics values. For display, many inspection recipes are arranged on the coordinate system specified by many axes having characteristics values (charge robustness, defect detection speed, defect detection accuracy and others) which have the mutual trade-off relationship. COPYRIGHT: (C)2007,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a charged particle beam device allowing accurate condition setting to be easily carried out in a short time. SOLUTION: This charge particle beam device used for detecting a generation signal generated from a sample and including secondary electrons to obtain an image is provided with: an input means for inputting a current value and a voltage value to be applied to a charged particle optical system through which a charged particle beam flows; a storage means for storing the shape, position and properties of the charged particle optical system and accuracy of the current or the voltage to be applied; an electromagnetic field calculation means for carrying out electromagnetic field calculation in the vicinity of a charged particle beam path; a charged particle beam track calculation means for calculating the track of the charged particle beam in the calculated electromagnetic field; a storage means for storing the result of the track calculation; and a control part for controlling the charged particle optical system based on the calculation result. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide a charged particle beam device having a little degradation of resolution even in image shifting beyond ±75 μm and a defect inspection device having a CAD navigation function interlocking with image shifting function, in a defect inspection device combining a plurality of probes measuring electrical property of samples including minute circuit wiring patterns with a charged particle ray device. SOLUTION: In order to communicate between an image processing means which performs image processing of charged particle beam images and a memory means which stored information about circuit wiring patterns, a means using a coordinates transforming image shift movement into sample stage movement is introduced into CAD navigation function. Thus, device user's usability is improved remarkably. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide an X-ray CT apparatus in which a photon energy distribution of emitted X-rays is flattened.SOLUTION: The X-ray CT apparatus includes an X-ray tube, a detector, a data collection part, a tube voltage generation part and a grid control part. The X-ray tube emits X-rays so as to irradiate a subject with the X-rays. The detector has a plurality of detection elements detecting photons which constitute the X-rays. The data collection part counts the number of the detected photons and collects projection data based on the result of the count. The tube voltage generation part applies a tube voltage to the X-ray tube while changing it within a prescribed cycle. The grid control part controls the grid voltage to reduce tube current when the tube voltage is increased, and controls the grid voltage to increase the tube current when the tube voltage is reduced. The X-ray CT apparatus flattens photon energy distribution of X-rays emitted from the X-ray tube.
Abstract:
A system and method for determining a cross sectional feature of a measured structural element having a sub-micron cross section, the cross section is defined by an intermediate section that is located between a first and a second traverse sections. The method starts by a first step of scanning, at a first tilt state, a first portion of a reference structural element and at least the first traverse section of the measured structural element, to determine a first relationship between the reference structural element and the first traverse section. The first step is followed by a second step of scanning, at a second tilt state, a second portion of a reference structural element and at least the second traverse section of the measured structural element, to determine a second relationship between the reference structural element and the second traverse section. The method ends by a third step of determining a cross sectional feature of the measured structural element in response to the first and second relationships.
Abstract:
In a defect inspection apparatus which combines a plurality of probes for measuring electric properties of a specimen including a fine circuit line pattern with a charged particle beam apparatus, the charged particle beam apparatus reduces a degradation in resolution even with an image-shift of ±75 μm or more. The defect inspection apparatus has a CAD navigation function associated with an image-shift function. The CAD navigation function uses coordinates for converting an image-shift moving amount to a DUT stage moving amount in communications between an image processing unit for processing charged particle beam images and a memory for storing information on circuit line patterns. The defect inspection provides the user with significantly improved usability.
Abstract:
An object of the invention is to be able to select easily and quickly inspection recipes which are appropriate to samples from any number of inspection recipes. A calculating device displays a plurality of inspection recipes on the GUI. An inspection recipe includes settings for controlling charged particle columns which irradiate charged particles on samples with a plurality of characteristics. Plural inspection recipes are arranged and displayed on a coordinate system which is specified by a plurality of axes having characteristic values (robustness variable of charge up, throughput of defect inspection, and accuracy of defect inspection) which have mutually trade-off relationships.
Abstract:
A pattern inspection system for inspecting a substrate surface on which a predetermined pattern is formed with radiation of an electron beam and an optical beam. the pattern inspection system includes a radiation and which radiates an electron beam to the substrate, a detection unit which detects a secondarily generated signal attributable to the radiation of the electron beam, a retrieval unit which retrieves an image from the signal detected by the detection unit, and an image processing unit which classifies the retrieved image depending on a type of the image.