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    32.
    发明专利
    失效

    公开(公告)号：JP3815588B2

    公开(公告)日：2006-08-30

    申请号：JP11767298

    申请日：1998-04-28

    IPC: C12N9/88 ,  C07D307/83 ,  C07D311/30 ,  C07D311/32 ,  C12P7/46 ,  C12P17/04 ,  C12P17/06 ,  C12R1/69

    Abstract: Disclosed in this invention are a novel enzyme producing tartaric acid ether compound which catalyzes a reaction of producing a tartaric acid ether compound in which the phenolic hydroxyl group(s) of a flavonoid or its analogous compound having at least one phenolic hydroxyl group is (are) acted to the epoxy ring of an epoxysuccinic acid to form ether linkage of one or more tartaric acid residues, a process for producing a tartaric acid ether compound by acting the enzyme in the presence of an epoxy-succinic acid and a flavonoid or its analogous compound having at least one phenolic hydroxyl group, and novel tartaric acid ether compounds in which the epoxy ring of an epoxysuccinic acid is bound to the phenolic hydroxyl group(s) of a flavonoid or its analogous compound to form ether linkage of one or more tartaric acid residues. These compounds are useful as a component material of pharmaceuticals and functional foods.

    Cyclic structure-bearing fluorine-containing monomer, method for producing the same, polymer, photoresist composition and method for forming pattern
    33.
    发明专利
    Cyclic structure-bearing fluorine-containing monomer, method for producing the same, polymer, photoresist composition and method for forming pattern 有权
    环状结构承载含荧光体的单体，其制造方法，聚合物，光电组合物和形成图案的方法

    公开(公告)号：JP2006152255A

    公开(公告)日：2006-06-15

    申请号：JP2005308044

    申请日：2005-10-24

    Applicant: Shin Etsu Chem Co Ltd ,  信越化学工業株式会社

    Inventor： KANOU TAKESHI ,  WATANABE TAKESHI ,  OHASHI MASAKI ,  HASEGAWA KOJI ,  TACHIBANA SEIICHIRO

    IPC: C08F20/28 ,  C07D307/20 ,  C07D307/83 ,  C07D309/12 ,  C07D319/06 ,  C08F32/00 ,  G03F7/039 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To obtain a new cyclic structure-bearing fluorine-containing monomer that is useful as a raw material for a functional material, a medicine/agrochemical, etc., has excellent transparency to radiation with a wavelength of above all ≤500 nm, especially ≤300 nm and is exceedingly useful as a monomer for producing a base resin of a radiation-sensitive resist composition having improved development properties due to having a phenol-like acidic hydroxy group, to use the polymer of the monomer as a base resin for a radiation-sensitive resist composition and to effectively utilize a hydroxy group having proper acidity so as to reduce, for example, swelling, prevent pattern degradation, suppress T-top shape development and improve dimensional uniformity. SOLUTION: The cyclic structure-bearing fluorine-containing monomer is represented by general formula (1) (Z is a polymerizable unsaturated group-containing bifunctional organic group). COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题为了获得可用作功能材料原料，药物/农用化学品等的新的带有环状结构的含氟单体，具有优异的透光度，其波长高于 全部≤500nm，特别是≤300nm，作为用于制造具有酚类酸性羟基的具有改善的显影性能的辐射敏感性抗蚀剂组合物的基础树脂的单体，使用单体的聚合物是非常有用的 作为辐射敏感性抗蚀剂组合物的基础树脂，并且有效地利用具有适当酸度的羟基以减少例如溶胀，防止图案退化，抑制T形顶部形状显影并提高尺寸均匀性。 <1>解决方案：含环状结构的含氟单体由通式（1）表示（Z是含可聚合不饱和基团的双官能团的有机基团）。 版权所有（C）2006，JPO＆NCIPI

    Compound effective for optical switch and its manufacturing method
    34.
    发明专利
    Compound effective for optical switch and its manufacturing method 有权
    光电开关的有效方法及其制造方法

    公开(公告)号：JP2005145828A

    公开(公告)日：2005-06-09

    申请号：JP2003381313

    申请日：2003-11-11

    Applicant: Fuji Xerox Co Ltd ,  富士ゼロックス株式会社

    Inventor： DEN TAMINORI ,  TATSUURA SATOSHI ,  FURUKI MAKOTO ,  IWASA IZUMI ,  SATO YASUHIRO ,  MITSU HIROYUKI ,  MATSUBARA TAKASHI

    IPC: G02F1/01 ,  C07D307/83 ,  C09B55/00 ,  G02F1/361

    Abstract: PROBLEM TO BE SOLVED: To provide a new compound having ≥1 μm maximum absorption wavelength, good solubility, and high thermal resistance, and its manufacturing method. SOLUTION: The compound is represented by formula (I) (wherein X 1 to X 10 and Y 1 to Y 10 may be the same or different and each is any one of hydrogen, a straight chain alkyl group, a branched chain alkyl group, an alkoxy group, a cyano group, a nitro group, a halogen, a di-substituted amino group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted aryloxy group, and a substituted or unsubstituted aralkyloxy group). COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题：提供具有≥1μm最大吸收波长，良好溶解性和高耐热性的新化合物及其制造方法。 解决方案：化合物由式（I）表示（其中X 1 至X 10 和Y 1 至Y 10可以相同或不同，各自为氢，直链烷基，支链烷基，烷氧基，氰基，硝基，卤素，二取代的 氨基，取代或未取代的芳基，取代或未取代的芳烷基，取代或未取代的芳氧基，取代或未取代的芳烷氧基）。 版权所有（C）2005，JPO＆NCIPI

    Method for producing lactone or carboxylic acid
    38.
    发明专利
    Method for producing lactone or carboxylic acid 审中-公开
    生产乳酸或羧酸的方法

    公开(公告)号：JP2003277312A

    公开(公告)日：2003-10-02

    申请号：JP2002244975

    申请日：2002-08-26

    Applicant: Sumitomo Chem Co Ltd ,  住友化学工業株式会社

    Inventor： HIROTA SHOJI ,  HAGITANI KOJU

    IPC: C07D307/83 ,  B01J23/28 ,  B01J23/30 ,  C07B61/00 ,  C07C51/09 ,  C07C51/245 ,  C07C59/185 ,  C07D307/33 ,  C07D309/30 ,  C07D311/76

    CPC classification number: Y02P20/52

    Abstract: PROBLEM TO BE SOLVED: To provide a method for industrially producing a lactone or a carboxylic acid advantageous in economical and operational aspects. SOLUTION: The method for producing the lactone or the carboxylic acid is to react a cyclic ether with hydrogen peroxide in the presence of a metal oxide catalyst which is obtained by reacting at least one species selected from a group comprising metal W, metal Mo, a tungsten compound comprising W and an element of IIIb, IVb, Vb or VIb group and a Mo compound comprising Mo and an element of IIIb, IVb, Vb or VIb group with hydrogen peroxide. COPYRIGHT: (C)2004,JPO

    Abstract translation: 待解决的问题：提供在经济和操作方面有利的工业生产内酯或羧酸的方法。 解决方案：制备内酯或羧酸的方法是在金属氧化物催化剂存在下使环醚与过氧化氢反应，所述金属氧化物催化剂通过使至少一种选自金属W，金属 Mo，包含W和IIIb，IVb，Vb或VIb族元素的钨化合物和包含Mo的Mo化合物和IIIb，IVb，Vb或VIb族元素与过氧化氢的Mo化合物。 版权所有（C）2004，JPO

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