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    Straight line scan continuous crosswise coagulation for thin film
    1.
    发明专利
    Straight line scan continuous crosswise coagulation for thin film 有权
    直线扫描连续薄膜凝结薄膜

    公开(公告)号：JP2014123763A

    公开(公告)日：2014-07-03

    申请号：JP2014032128

    申请日：2014-02-21

    申请人： Trustees Of Columbia Univ In The City Of New York ,  ザ トラスティーズ オブ コロンビア ユニヴァーシティ イン ザ シティ オブ ニューヨーク

    发明人： JAMES S IM ,  PAUL C VAN DER WILT

    IPC分类号： H01L21/20 ,  H01L21/336 ,  H01L29/786

    CPC分类号： H01L21/2026 ,  B23K26/0738 ,  C30B13/00 ,  C30B13/24 ,  C30B29/06 ,  H01L27/1285 ,  H01L27/1296 ,  Y10T117/10 ,  Y10T117/1004 ,  Y10T117/1008

    摘要： PROBLEM TO BE SOLVED: To provide a film characterized in more uniformed shift from an adjoining crystallized area with less sudden changes, which can be used for LCD and OLED displays.SOLUTION: A polycrystalline film is prepared in the following steps of: (a) allowing a thin film to provide a base plate subject to laser guided melting; (b) generating a continuous laser pulse having a fluence that could sufficiently melt the film within the radiation range over entire thickness; (c) defining the maximum width (W) and minimum width (W) for irradiating a first region of the film with a first laser pulse, while a first melting bandwidth indicates a fluctuation of width along the length; (d) moving the film in the cross growth direction for longer than about a half of the Wbut shorter than the W; and (e) irradiating a second region of the film with a second laser pulse to form a second melting band width having substantially the same configuration as that of the first melting bandwidth.

    摘要翻译： 要解决的问题：提供一种膜，其特征在于具有较少突然变化的邻接结晶区域的更均匀的位移，其可用于LCD和OLED显示器。解决方案：多晶膜以以下步骤制备：（a） 允许薄膜提供受激光引导熔化的基板; （b）产生具有能够在整个厚度的辐射范围内充分熔融该膜的能量密度的连续激光脉冲; （c）限定用第一激光脉冲照射薄膜的第一区域的最大宽度（W）和最小宽度（W），而第一熔融带宽表示沿长度的宽度的波动; （d）将薄膜沿交叉生长方向移动长于比W短的W的大约一半; 以及（e）用第二激光脉冲照射所述膜的第二区域，以形成具有与所述第一熔融带宽基本相同的构造的第二熔融带宽度。

    Apparatus and method for high dynamic range imaging using spatially varying exposures
    5.
    发明专利
    Apparatus and method for high dynamic range imaging using spatially varying exposures 有权
    使用空间变化的暴露进行高动态范围成像的装置和方法

    公开(公告)号：JP2010110004A

    公开(公告)日：2010-05-13

    申请号：JP2009297250

    申请日：2009-12-28

    申请人： Trustees Of Columbia Univ In The City Of New York ,  ザ トラスティーズ オブ コロンビア ユニヴァーシティ イン ザ シティ オブ ニューヨーク

    发明人： NAYAR SHREE ,  MITSUNAGA TOMOO

    IPC分类号： H01L27/14 ,  H04N5/238 ,  G06T1/00 ,  G06T3/00 ,  H04N1/407 ,  H04N5/235 ,  H04N5/243

    CPC分类号： H04N5/2355 ,  H04N5/235

    摘要： PROBLEM TO BE SOLVED: To provide an apparatus and method for obtaining high dynamic range images using a low dynamic range image sensor. SOLUTION: A captured image is normalized with respect to an exposure function after calibration to compensate for nonlinear response of an image sensor. When the exposure function is implemented using a controllable attenuation cell array, the exposure function is adjusted to minimize the number of saturated or blackened pixels within an area of pixel array exposed through a cell, to maximize the signal-to-noise ratio of the average pixel value, and to maximize the spatial smoothness of the exposure function. A dynamic range compression technique on a low dynamic range display device entails applying a smoothing filter to the exposure function used to provide the high dynamic range image and then reapplying the smoothed exposure function. Also a method is provided for providing high dynamic range images by exposing a photographic film using a spatially varying exposure function. Thus, an electronic image provided by the same process as images captured using a fixed exposure function. COPYRIGHT: (C)2010,JPO&INPIT

    摘要翻译： 要解决的问题：提供一种使用低动态范围图像传感器获得高动态范围图像的装置和方法。 解决方案：捕获的图像相对于校准后的曝光功能被归一化以补偿图像传感器的非线性响应。 当使用可控衰减单元阵列实现曝光功能时，调整曝光功能以使通过单元曝光的像素阵列的区域内的饱和或黑化像素的数量最小化，以使平均值的信噪比最大化 像素值，并使曝光功能的空间平滑度最大化。 在低动态范围显示装置上的动态范围压缩技术需要对用于提供高动态范围图像的曝光功能应用平滑滤波器，然后重新应用平滑的曝光功能。 还提供了一种通过使用空间变化的曝光功能曝光摄影胶片来提供高动态范围图像的方法。 因此，通过与使用固定曝光功能拍摄的图像相同的处理提供的电子图像。 版权所有（C）2010，JPO＆INPIT

    Method of flattening silicon film surface during and after processing through sequential lateral crystallization method
    9.
    发明专利
    Method of flattening silicon film surface during and after processing through sequential lateral crystallization method 审中-公开
    通过顺序横向结晶方法处理和处理后的硅膜表面的方法

    公开(公告)号：JP2007288159A

    公开(公告)日：2007-11-01

    申请号：JP2007062610

    申请日：2007-03-12

    申请人： Trustees Of Columbia Univ In The City Of New York ,  ザ トラスティーズ オブ コロンビア ユニヴァーシティ イン ザ シティ オブ ニューヨーク

    发明人： JAMES S IM ,  SPOSILI ROBERT S ,  CROWDER MARK A

    IPC分类号： H01L21/20

    摘要： PROBLEM TO BE SOLVED: To provide a system and method for reducing the surface roughness of a polycrystalline or monocrystalline thin film produced by a sequential lateral solidification process.
    SOLUTION: The system comprises: an excimer laser 110 for generating a plurality of excimer laser pulses of a predetermined fluence; an energy density modulator 120 for controllably modulating the fluence of the excimer laser pulses to obtain a fluence required to perfectly melt the thin film in the thickness direction or lower; a beam equalizer 144; a sample stage 170 for melting a portion corresponding to the laser pulses of the thin film; a parallel motion means for controllably moving in parallel the position of the sample stage 170 relative to the laser pulses; and a computer 100 for performing the generation of the excimer pulses and modulation of the fluence in accordance with the relative position of the sample stage 170, and thereby processing the polycrystalline or monocrystalline thin film by sequentially moving the sample stage 170 in parallel with the laser pulses.
    COPYRIGHT: (C)2008,JPO&INPIT

    摘要翻译： 要解决的问题：提供一种用于降低通过顺序横向固化方法生产的多晶或单晶薄膜的表面粗糙度的系统和方法。 解决方案：该系统包括：准分子激光器110，用于产生预定注量的多个准分子激光脉冲; 能量密度调制器120，用于可控制地调制准分子激光脉冲的能量密度，以获得在厚度方向或更低厚度上完美熔化薄膜所需的注量; 光束均衡器144; 用于熔化对应于薄膜的激光脉冲的部分的样品台170; 平行运动装置，用于可控地相对于激光脉冲平行移动样品台170的位置; 以及计算机100，用于根据样品台170的相对位置执行准分子脉冲的产生和注量的调制，从而通过使样品台170与激光平行地依次移动来处理多晶或单晶薄膜 脉冲。 版权所有（C）2008，JPO＆INPIT