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公开(公告)号：JP5267632B2
公开(公告)日：2013-08-21
申请号：JP2011221502
申请日：2011-10-06
申请人： ダイキン工業株式会社
IPC分类号： C07C51/58 , C07B61/00 , C07C59/135
CPC分类号： C07C51/58 , C07C59/135
摘要： The present invention efficiently produces a fluorinated (poly)ether-containing carbonyl fluoride. In the presence of a bis(dialkylamino)methane represented by general formula (I) (wherein each of R1, R2, R3 and R4 is independently selected from the group consisting of a methyl group, an ethyl group, an n-propyl group and an n-butyl group), at least one compound selected from the group consisting of fluorine-containing carbonyl compounds, 2,2,3,3-tetrafluorooxethane and tetrafluoroethane sultone, said compound serving as a first starting material, and hexafluoropropylene oxide that serves as a second starting material are reacted with each other in an aprotic polar solvent, thereby obtaining a fluorinated (poly)ether-containing carbonyl fluoride.
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公开(公告)号：JP5040005B2
公开(公告)日：2012-10-03
申请号：JP2008172180
申请日：2008-07-01
申请人： ダイキン工業株式会社
IPC分类号： C08F232/08 , C07C33/44 , C07C43/313 , C07C45/45 , C07C49/567 , C07C61/28 , C07C69/96 , G03F7/004 , G03F7/038 , G03F7/039
CPC分类号： G03F7/0395 , C07C33/44 , C07C43/313 , C07C45/45 , C07C49/567 , C07C61/28 , C07C69/96 , C07C2602/42 , C07C2603/86 , G03F7/0046 , G03F7/0382
摘要： There are provided a novel norbornene derivative which is a material for a chemically amplifying type photoresist for F2 laser, possesses excellent transparency and improved dry etching resistivity and has a fluorine-containing ketone unit or fluorine-containing tertiary alcohol unit directly bonded to the norbornene backbone; a fluorine-containing polymer obtained by using the norbornene derivative as a copolymerizable monomer; and a chemically amplifying type photoresist composition comprising the fluorine-containing polymer, a photoacid generator and a solvent.
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3.发明专利
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公开(公告)号：JP4186819B2
公开(公告)日：2008-11-26
申请号：JP2003512187
申请日：2002-07-12
申请人： ダイキン工業株式会社
IPC分类号： C07C33/44 , C07C29/38 , C07C43/172 , C07C43/313 , C07C45/45 , C07C49/567 , C07C61/28 , C07C69/96 , C08F32/08 , G03F7/004 , G03F7/038 , G03F7/039
CPC分类号： G03F7/0395 , C07C33/44 , C07C43/313 , C07C45/45 , C07C49/567 , C07C61/28 , C07C69/96 , C07C2602/42 , C07C2603/86 , G03F7/0046 , G03F7/0382
摘要： There are provided a novel norbornene derivative which is a material for a chemically amplifying type photoresist for F2 laser, possesses excellent transparency and improved dry etching resistivity and has a fluorine-containing ketone unit or fluorine-containing tertiary alcohol unit directly bonded to the norbornene backbone; a fluorine-containing polymer obtained by using the norbornene derivative as a copolymerizable monomer; and a chemically amplifying type photoresist composition comprising the fluorine-containing polymer, a photoacid generator and a solvent.
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公开(公告)号：JP5315610B2
公开(公告)日：2013-10-16
申请号：JP2006512785
申请日：2005-04-26
申请人： ダイキン工業株式会社
IPC分类号： C01B31/00
摘要： The present invention relates to a method for producing carbonyl difluoride comprising a step of reacting trifluoromethane with oxygen or an oxygen-containing gas while heating.
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公开(公告)号：JP4415656B2
公开(公告)日：2010-02-17
申请号：JP2003396082
申请日：2003-11-26
申请人： ダイキン工業株式会社
CPC分类号： B01D53/228 , B01D53/22 , B01D2257/504 , C01B32/80 , Y02C10/10 , Y02P20/152
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公开(公告)号：JPWO2003006413A1
公开(公告)日：2004-11-04
申请号：JP2003512187
申请日：2002-07-12
申请人： ダイキン工業株式会社
IPC分类号： C07C49/567 , C07C29/36 , C07C29/40 , C07C33/44 , C07C41/01 , C07C43/172 , C07C43/313 , C07C45/00 , C07C45/45 , C07C61/28 , C07C68/06 , C07C69/96 , C08F232/08 , G03F7/004 , G03F7/038 , G03F7/039
CPC分类号： G03F7/0395 , C07C33/44 , C07C43/313 , C07C45/45 , C07C49/567 , C07C61/28 , C07C69/96 , C07C2602/42 , C07C2603/86 , G03F7/0046 , G03F7/0382
摘要： 透明性に優れ、かつ耐ドライエッチング性が改善されており、F2レーザー用の化学増幅型フォトレジスト用の材料であって、ノルボルネン骨格に直接含フッ素ケトン部位または含フッ素第3級アルコール部位が結合した新規ノルボルネン誘導体、それを共重合モノマーとして得られる含フッ素重合体、該含フッ素重合体と光酸発生剤と溶剤とからなる化学増幅型フォトレジスト組成物を提供する。
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