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    Data analyzer
    4.
    发明专利
    Data analyzer 有权
    空值

    公开(公告)号：JP5203787B2

    公开(公告)日：2013-06-05

    申请号：JP2008107536

    申请日：2008-04-17

    Applicant: 株式会社日立ハイテクノロジーズ

    Inventor： 敦子 山口 ,  洋揮 川田

    IPC: G01B15/04 ,  G01B21/20 ,  G01Q30/02 ,  G01Q30/04

    CPC classification number: G06T11/206 ,  G06T7/0006 ,  G06T7/13 ,  G06T2207/10061 ,  G06T2207/30148

    Abstract: Edge points are extracted by specifying a height (values indicating a distance from a substrate) on a pattern when edges of the pattern are extracted from a CD-SEM image. Further, LER values obtained by the extraction of a Fourier spectrum of the LER are obtained. When the same sample is previously observed with the AFM and the CD-SEM, a size of the LER obtained by specifying a height, an auto-correlation distance of the LER, or an index called the spectrum is obtained from results of the AFM observation. Further, theses indices obtained by specifying image processing conditions for detecting the edge points from the CD-SEM observation result are obtained. Also, it is determined that heights providing values when the values are matched correspond to the image processing conditions and then, the edge points are extracted from the CD-SEM IMAGE instead of the AFM observation by using the image processing conditions.

    Abstract translation: 通过在从CD-SEM图像提取图案的边缘时，通过指定图案上的高度（表示与基板的距离的值）来提取边缘点。 此外，获得通过提取LER的傅里叶谱获得的LER值。 当先前用AFM和CD-SEM观察到相同的样品时，通过AFM观察结果获得通过指定高度，LER的自相关距离或称为光谱的指数获得的LER的大小 。 此外，获得通过从CD-SEM观察结果指定用于检测边缘点的图像处理条件而获得的索引。 此外，确定当值匹配时提供值的高度对应于图像处理条件，然后通过使用图像处理条件从CD-SEM图像而不是AFM观察提取边缘点。

    Pattern shape evaluation apparatus
    5.
    发明专利
    Pattern shape evaluation apparatus 有权

    公开(公告)号：JP4961500B2

    公开(公告)日：2012-06-27

    申请号：JP2011140088

    申请日：2011-06-24

    Applicant: 株式会社日立ハイテクノロジーズ

    Inventor： 修 小室 ,  敦子 山口 ,  洋揮 川田 ,  宏 福田

    IPC: G01B15/04 ,  G01B15/08 ,  H01L21/66

    Abstract: PROBLEM TO BE SOLVED: To provide a method and an apparatus of calculating and evaluating the level of roughness actually present in a pattern, for precisely and quickly evaluating the level of edge roughness from a SEM observation image of a fine line pattern having many noises, by calculating contribution of random noise of the apparatus on the basis of image data of one image and subtracting the roughness originated in the apparatus from a measurement value of an edge roughness index, from among the measured edge roughness indexes. SOLUTION: A quantity (or dispersion value) of fluctuation of edge position due to random noise is expected to be reduced statistically to 1/N when N edge position data items are averaged. Using this property, the single page image is averaged in a vertical direction with various values of parameter S, and then the edge roughness index is calculated. The S-dependence of the edge roughness index is analyzed and a term of a dispersion value directly proportional to 1/S is determined to be due to noise. COPYRIGHT: (C)2011,JPO&INPIT

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