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    Image generation method and image generation device
    5.
    发明专利
    Image generation method and image generation device 有权

    公开(公告)号：JP4951496B2

    公开(公告)日：2012-06-13

    申请号：JP2007333426

    申请日：2007-12-26

    Applicant: 株式会社日立ハイテクノロジーズ

    Inventor： 良一 松岡 ,  伸一 篠田 ,  康隆 豊田

    IPC: G06T3/00 ,  G01B15/04 ,  G01N23/225 ,  G06T1/00 ,  H01L21/66

    CPC classification number: G06T11/60 ,  G06T2200/32

    Abstract: The present invention provides a technique to generate an accurate connected image even in a monotonous pattern using design data as constrained conditions. A reference position is roughly determined through matching between the design data and image data, matching between neighboring images is performed using the amount of mismatch from the design data as a searching range and a connected image is generated at high speed and accurately. The image generation method of the present invention is an image generation method for inspecting an electronic device pattern using a scanning electron microscope and is constructed of a design data file that stores design data describing layout information of an electronic device pattern by inputting the data, a plurality of divided pieces of image data obtained by imaging the electronic device pattern at different imaging positions, and image connecting means for connecting the plurality of divided pieces of image data into one image using the plurality of divided pieces of image data and the design data of a file of the design data (see FIG. 1).

    Scanning electron microscope and three-dimensional image display method using the same
    7.
    发明专利
    Scanning electron microscope and three-dimensional image display method using the same 有权

    公开(公告)号：JP4262649B2

    公开(公告)日：2009-05-13

    申请号：JP2004230090

    申请日：2004-08-06

    Applicant: 株式会社日立ハイテクノロジーズ

    Inventor： 敦 宮本 ,  光二 池田 ,  麻紀 田中 ,  秀俊 諸熊 ,  康隆 豊田 ,  高根　　淳

    IPC: H01J37/22 ,  G06T1/00 ,  G06T15/04 ,  H01J37/28

    Abstract: PROBLEM TO BE SOLVED: To provide a scanning electron microscope, allowing an image satisfactory for observing of the irregular shapes of an object of observation to be observed correctly and accurately three-directionally, and to provide a three-dimensional image display method that uses it. SOLUTION: This three-dimensional image display method, using this scanning electron microscope device, is composed by comprising displaying a plurality of three-dimensional stereoscopic images on a display device by repeating, a multiple number of times by changing an angle of beam tilt, processes of extracting the contour data of an SEM image from SEM image data to create a three-dimensional image; producing a three-dimensional shape pattern from SEM image data acquired by tilting a beam; extracting the three-dimensional shape and the three-dimensional shape pattern, by using inclination information as corresponding information; compositing the three-dimensional stereoscopic image, by carrying out texture-mapping of the three-dimensional shape and the three-dimensional shape pattern in the corresponding relationship; and displaying the composited three-dimensional stereoscopic image on the display device. COPYRIGHT: (C)2006,JPO&NCIPI

    Pattern generator and pattern shape evaluation apparatus
    9.
    发明专利
    Pattern generator and pattern shape evaluation apparatus 有权

    公开(公告)号：JP5276854B2

    公开(公告)日：2013-08-28

    申请号：JP2008031314

    申请日：2008-02-13

    Applicant: 株式会社日立ハイテクノロジーズ

    Inventor： 康隆 豊田 ,  英雄 栄井 ,  良一 松岡

    IPC: H01L21/66 ,  G01N23/225

    CPC classification number: G06K9/00 ,  G01R31/31813 ,  G06K9/6255 ,  G06T7/001 ,  G06T2207/30141

    Abstract: Although there has been a method for evaluating pattern shapes of electronic devices by using, as a reference pattern, design data or a non-defective pattern, the conventional method has a problem that the pattern shape cannot be evaluated with high accuracy because of the difficulty in defining an exact shape suitable for the manufacturing conditions of the electronic devices. The present invention provides a shape evaluation method for circuit patterns of electronic devices, the method including a means for generating contour distribution data of at least two circuit patterns from contour data sets on the circuit patterns; a means for generating a reference pattern used for the pattern shape evaluation, from the contour distribution data; and a means for evaluating the pattern shape by comparing each evaluation target pattern with the reference pattern.

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