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    Charged particle beam microscope and a charged particle beam microscopic method
    1.
    发明专利
    Charged particle beam microscope and a charged particle beam microscopic method 有权

    公开(公告)号：JP4003423B2

    公开(公告)日：2007-11-07

    申请号：JP2001271167

    申请日：2001-09-07

    Applicant: 株式会社日立製作所

    Inventor： るり子 常田 ,  成人 砂子沢 ,  雅成 高口

    IPC: G01N23/04 ,  H01J37/22 ,  G01N23/225 ,  H01J37/252 ,  H01J37/28

    Abstract: PROBLEM TO BE SOLVED: To resolve a problem that when the images are accumulated on the other side while correcting a sample drift on one side within several kinds of images obtained by charged particle beam irradiation, the image accumulation is continued even if the drift is not corrected and a sample structure may be hard to observe by an image formed by only superposing both of them in image display. SOLUTION: Whether or not the original drift is corrected is determined by the degree of coincidence between images calculated by a displacement analysis using a phase difference image of an Fourier transformation image. In the image display, a line drawing is formed by applying suitable image processing to the one-side or both-side dark and light image(s) and thereafter displayed by superposing them. Thereby, since the images are prevented from being accumulated without complete implementation of the drift correction, the image accumulation can be automatically carried out. Acquisition of intensity distribution information such as a position of maximized image intensity and a position of sharply changed image intensity is facilitated.

    Observation apparatus and observation method using an electron beam
    6.
    发明专利
    Observation apparatus and observation method using an electron beam 有权

    公开(公告)号：JP4337832B2

    公开(公告)日：2009-09-30

    申请号：JP2006058855

    申请日：2006-03-06

    Applicant: 株式会社日立製作所

    Inventor： 邦康 中村 ,  幹雄 市橋 ,  馨 梅村 ,  佳史 谷口 ,  雅成 高口

    IPC: G01N23/20 ,  H01J37/28

    Abstract: PROBLEM TO BE SOLVED: To provide an apparatus, a technique, and a method for two-dimensional distributions and measuring distortions and stress, having nanometer resolution of each type of crystal sample through the use of diffraction images observed by an electronic microscope. SOLUTION: Electron beams are irradiated in minute amount and in parallel to a sample. The distances, between the spots of a diffraction image reflecting a crystal structure acquired by the irradiation, are measured by an image detector or a position detector. A two-dimensional stress distribution is superimposed on the measured positional information and displayed on an enlarged image of an electronic microscope. Distortions and stresses in minute crystals can be displayed at a high resolution and at a high speed in matching structural information of the sample. COPYRIGHT: (C)2006,JPO&NCIPI

    分光素子、およびそれを用いた荷電粒子線装置
    9.
    发明专利
    分光素子、およびそれを用いた荷電粒子線装置 有权
    分光元件，并使用相同的带电粒子束装置

    公开(公告)号：JPWO2014068689A1

    公开(公告)日：2016-09-08

    申请号：JP2014544109

    申请日：2012-10-31

    Applicant: 株式会社日立製作所

    Inventor： 阿南　義弘 ,  義弘 阿南 ,  雅成 高口 ,  雅成 高口

    IPC: G21K1/06 ,  G01N23/207 ,  G01N23/22 ,  G01N23/225 ,  G21K1/00 ,  H01J37/244 ,  H01J37/252

    CPC classification number: H01J37/244 ,  G01N23/2252 ,  G21K1/067 ,  G21K2201/064 ,  H01J37/252 ,  H01J37/28 ,  H01J2237/2442 ,  H01J2237/2445

    Abstract: 電子顕微鏡に波長分散型X線分析装置を備えた電子線分析装置において、評価対象の元素に対して高感度且つ高精度な分析を短期間で行う。各々のX線に対してX線反射率が最大となる複数パターンを形成した1つの回折格子を電子線分析装置に設け、エネルギー基準となるX線および評価対象のX線スペクトルを同時に検出する。回折格子の設置・交換によるX線エネルギーの位置ズレをエネルギー基準のX線スペクトルにより校正し、短期間で高感度且つ高精度な分析が可能となる。

    Abstract translation: 在设置有在电子显微镜下的波长分散型X射线分析装置的电子射线分析装置，在很短的一段时间，以评估在元件高度敏感和准确的分析来进行。 具有衍射光栅的X射线反射率对于每个X射线中的一个形成有多个具有最大电子束分析仪图案设置，检测包括能量基准和所述X射线谱的X射线将被同时进行评价。 通过安装和更换的衍射的X射线能量的位置偏离光栅通过能量基准的X射线谱校准的，所以能够高度敏感和准确的分析在很短的时间周期。

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