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公开(公告)号：JPWO2004074936A1
公开(公告)日：2006-06-01
申请号：JP2005502677
申请日：2004-02-06
IPC: G03F7/038 , G03F7/004 , H01L21/027
CPC classification number: G03F7/0382 , G03F7/0046
Abstract: ライン・アンド・スペースパターンにおいて、高い解像性を示し、矩形なレジストパターンを形成することができ、現像後に橋架け(ブリッジング)などのレジストパターン欠陥を減少させ、感度、現像性、寸法忠実度等にも優れるネガ型感放射線性樹脂組成物に関し、該樹脂組成物は、1つの炭素原子に水酸基とフルオロアルキル基とが結合している側鎖を有する(メタ)アクリル酸系繰り返し単位と、水酸基を側鎖に有する(メタ)アクリル酸系繰り返し単位との共重合樹脂と、感放射線性酸発生剤と、酸架橋剤とを含有する。
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公开(公告)号：JP5024318B2
公开(公告)日：2012-09-12
申请号：JP2009069558
申请日：2009-03-23
Applicant: Jsr株式会社
IPC: G03F7/039 , C08F4/00 , G03F7/004 , H01L21/027
CPC classification number: G03F7/039 , G03F7/0046 , G03F7/0397 , G03F7/2006
Abstract: A radiation-sensitive resin composition comprising an acid-labile group-containing resin obtained by living radical polymerization having a specific structure which is insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid, and a photoacid generator, wherein the ratio of weight average molecular weight to number average molecular weight (weight average molecular weight/number average molecular weight) of the acid-labile group-containing-resin is smaller than 1.5.
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公开(公告)号：JP4240663B2
公开(公告)日：2009-03-18
申请号：JP20745299
申请日：1999-07-22
Applicant: Jsr株式会社
IPC: G03F7/039 , H01L21/027 , G03F7/004
Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition prevented from occurrence of change of the line width of a resist pattern by PED and that of T forms and that of stationary waves even on a substrate high in reflectance and high in resolution and useful as a chemically sensitizable resist. SOLUTION: This radiation sensitive resin composition contains (A) a radiation sensitive acid generator and (B) a copolymer having repeating units represented by the formula in which R1 is an H atom or a methyl group; R2 is an optionally substituted 6-20C aliphatic or such 6-20C aromatic group.
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公开(公告)号：JP4135276B2
公开(公告)日：2008-08-20
申请号：JP28972899
申请日：1999-10-12
Applicant: Jsr株式会社
CPC classification number: G03F7/0045 , G03F7/0392 , Y10S430/115 , Y10S430/122
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Patent Agency Ranking
公开(公告)号：JP3972469B2
公开(公告)日：2007-09-05
申请号：JP16570298
申请日：1998-06-12
Applicant: Jsr株式会社
IPC: C07C317/44 , G03F7/004 , C07C317/28 , C07C327/60 , C07D307/77 , H01L21/027
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公开(公告)号：JP3841107B2
公开(公告)日：2006-11-01
申请号：JP2005502677
申请日：2004-02-06
Applicant: Jsr株式会社
IPC: G03F7/038 , G03F7/004 , H01L21/027
CPC classification number: G03F7/0382 , G03F7/0046
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公开(公告)号：JP4069497B2
公开(公告)日：2008-04-02
申请号：JP16225698
申请日：1998-06-10
Applicant: Jsr株式会社
IPC: G03F7/004 , C08K5/42 , C08L25/18 , G03F7/039 , H01L21/027
Abstract: PROBLEM TO BE SOLVED: To provide a radiosensitive resin composition containing a radiosensitive acid generating agent which has high transmissivity to far ultraviolet ray particularly such as KRF excimer laser, is excellent in sensitivity, resolution performance and pattern shape and low in sublimation, and a resin having a specific acetal group. SOLUTION: The composition contains (A) the radiosensitive acid generating agent expressed by formula (1) (in the formula, X represents an aliphatic, alicyclic or aromatic 2-valent group and R represents a (cyclo) alkyl group or aryl group) and (B) the resin represented by 4-hydroxystyrene/4-(1'-ethoxy ethoxy) styrene copolymer or 4-hydroxystyrene/4-(1'-ethoxyethoxy) styrene/4-t-butoxy styrene copolymer or another resin represented by 4-hydroxystyrene/4-t-butoxy styrene copolymer.
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