Abstract:
Semiconductor wafers are processed in conjunction with a manufacturing execution system using a run-to-run controller and a fault detection system. A recipe is received from the manufacturing execution system by the run-to-run controller for controlling a tool. The recipe includes a setpoint for obtaining one or more target wafer properties. Processing of the wafers is monitored by measuring processing attributes including fault conditions and wafer properties using the fault detection system and one or more sensors. Setpoints of the recipe may be modified at the run-to-run controller according to the processing attributes to maintain the target wafer properties, except in cases when a fault condition is detected by the fault detection system. Thus, data acquired in the presence of tool or wafer fault conditions are not used for feedback purposes. In addition, fault detection models may be used to define a range of conditions indicative of a fault condition. In these cases, the fault detection models may be modified to incorporate, as parameters, setpoints of a recipe modified by a run-to-run controller.
Abstract:
Semiconductor wafers are processed in conjunction with a manufacturing execution system using a run-to-run controller and a fault detection system. A recipe is received from the manufacturing execution system by the run-to-run controller for controlling a tool. The recipe includes a setpoint for obtaining one or more target wafer properties. Processing of the wafers is monitored by measuring processing attributes including fault conditions and wafer properties using the fault detection system and one or more sensors. Setpoints of the recipe may be modified at the run-to-run controller according to the processing attributes to maintain the target wafer properties, except in cases when a fault condition is detected by the fault detection system. Thus, data acquired in the presence of tool or wafer fault conditions are not used for feedback purposes. In addition, fault detection models may be used to define a range of conditions indicative of a fault condition. In these cases, the fault detection models may be modified to incorporate, as parameters, setpoints of a recipe modified by a run-to-run controller.
Abstract:
PURPOSE:To eliminate the waste of time when a fault occurs by discontinuing a test in case the voltage level of an output signal sent from a PID controller does not reach the reference value within a prescribed period of time. CONSTITUTION:A test device 3 for dynamic characteristics of PID controller is provided together with a PID controller 4 to be tested. The device 3 is controlled by a program 5. The test is discontinued in case the voltage of an input signal 1 does not reach a level V1 within the 2nd prescribed period of time from a point t=0 shown in the figure. Then another test of the next PID controller is carried out. Thus the test time is limited within a fixed period with each PID controller 4. This avoid the consumption of waste time in case a fault occurs.
Abstract:
PROBLEM TO BE SOLVED: To provide a fluid supply system capable of preventing erroneous detection of open failure of a shutoff valve.SOLUTION: A fluid supply system includes: a hydrogen tank 2; a shutoff valve 3 which is provided with a shared channel and is installed on a ferrule part of the hydrogen tank 2; a fluid filling channel of which one edge is connected to the shared channel and the other edge is connected to a filling port 5; a fluid supply channel of which one edge is connected to the shared channel and the other edge is connected to a fuel cell 1; filling detection means which detects the filling of fluid via the fluid filling channel; a first pressure sensor 10 disposed on the fluid supply channel; and an ECU 13 which outputs a valve closing command to the shutoff valve 3 and executes open failure determination processing of the shutoff valve 3 based on a change of a pressure value inputted from the first pressure sensor 10. Therein, when the filling of the fluid is detected by the filling detection means, the ECU 13 stops the open failure determination processing.
Abstract:
PROBLEM TO BE SOLVED: To implement an appropriate countermeasure at the time of anomaly.SOLUTION: A management system for an industrial control system comprises: a control apparatus; a control network connected to the control apparatus; and multiple devices controlled by the control apparatus via the control network. The management system includes multiple firewall parts provided for each of control zones each controlling one part of the industrial control system, the firewall parts relaying communication between devices in the control zones and the control network; an event analyzing part collecting events from each of the multiple firewall parts and analyzing the events to detect an anomaly of each of the control zones; and a communication managing part changing a communication operation performed via the firewall part provided for the control zone where an anomaly has been detected.