公开(公告)号：KR100849179B1

公开(公告)日：2008-07-30

申请号：KR1020070002959

申请日：2007-01-10

申请人： 삼성전자주식회사

发明人： 박의진 ,  최윤호 ,  박인영 ,  정환일 ,  최성석

IPC分类号： H01L21/3065

CPC分类号： H01L21/67126 ,  H01J37/32495 ,  H01L21/68735

摘要： 본 발명은 갭 발생방지구조를 갖는 플라즈마 처리설비를 제공한다. 상기 플라즈마 처리설비는 그 내부에 플라즈마 분위기가 형성되는 챔버와, 상기 챔버의 상단에 설치되는 상부전극과, 상기 챔버의 하단에 설치되며 하부전극을 갖고 그 상면에 웨이퍼가 안착되는 정전척과, 상기 정전척의 외측부에 배치되는 링과, 상기 척과 상기 링과의 사이 공간을 외부로부터 격리시키는 갭방지부를 구비한다.
포커스링, 정전척

公开(公告)号：KR1020080075609A

公开(公告)日：2008-08-19

申请号：KR1020070014719

申请日：2007-02-13

申请人： 삼성전자주식회사

发明人： 박의진 ,  박인영

IPC分类号： H01L21/67 ,  H01L21/68

CPC分类号： H01L21/6833 ,  H01L21/67011

摘要： A wafer lift assembly of a semiconductor manufacturing apparatus is provided to generate reliably generate plasma discharges by preventing an electrostatic chuck from being contaminated due to a friction between a lift plate and a guide shaft. Plural lift pins(10) penetrate an electrostatic chuck in a vertical direction and are arranged to elevate in the vertical direction. A lift plate(20) fixes lower ends of the lift pins at a lower portion of the electrostatic chuck and is elevated along an elevation groove, which is formed to be upwardly engraved at a bottom of the electrostatic chuck. A guide shaft(30) is screw-coupled with the electrostatic chuck on the elevation groove and penetrates a center portion of the lift plate to prevent a downward derailment of the lift plate. The guide shaft supports the lift plate. An elevation driver(40) is connected to a lower end of the lift plate and elevates the lift plate at a constant height. A spring(50) is elastically arranged outside a guide shaft between the electrostatic chuck and the lift plate inside the elevation groove. A protective cap(60) is arranged to surround an outer portion of the spring and prevents an upper portion of the electrostatic chuck from being contaminated by the particles due to a friction between the electrostatic chuck and the guide shaft, while the lift plate is elevated.

摘要翻译： 提供半导体制造装置的晶片提升组件，以通过防止静电卡盘由于升降板和引导轴之间的摩擦而被污染而可靠地产生等离子体放电。 多个提升销（10）在垂直方向上穿过静电卡盘并且被布置成在垂直方向上升高。 升降板（20）在静电卡盘的下部固定提升销的下端，并且沿着升降槽升高，该升降槽形成为在静电卡盘的底部向上雕刻。 引导轴（30）与静电卡盘螺纹连接在升降槽上，并穿过提升板的中心部分，以防止升降板向下脱轨。 导向轴支撑升降板。 升降驱动器（40）连接到提升板的下端，并将升降板以恒定的高度升高。 弹簧（50）弹性地布置在垂直槽内的静电卡盘和提升板之间的引导轴外侧。 保护盖（60）布置成围绕弹簧的外部部分，并且防止静电卡盘的上部由于静电卡盘和引导轴之间的摩擦而被颗粒污染，同时升降板升高 。

公开(公告)号：KR1020080065828A

公开(公告)日：2008-07-15

申请号：KR1020070002959

申请日：2007-01-10

申请人： 삼성전자주식회사

发明人： 박의진 ,  최윤호 ,  박인영 ,  정환일 ,  최성석

IPC分类号： H01L21/3065

CPC分类号： H01L21/67126 ,  H01J37/32495 ,  H01L21/68735

摘要： A structure for preventing generation of a gap is provided to easily prevent reactive ions and polymer formed in a chamber from being deposited in a space between an electrostatic chuck and a focus ring by forming a multiple sealing point in the space. A ring(300) is disposed in the outer part of a chuck. A space between the chuck and the ring is isolated from the outside by a gap preventing part(400). A step part(210) made of first and second step surfaces(211,212) can be formed in the outer circumference of the chuck. The ring can be disposed in the step part. The space between the chuck and the ring can include a first space between the inner surface of the ring and the first step surface and a second space between the bottom surface of the ring and the second step surface.

摘要翻译： 提供了一种用于防止产生间隙的结构，以便通过在该空间中形成多个密封点来容易地防止在室内形成的活性离子和聚合物沉积在静电卡盘和聚焦环之间的空间中。 环（300）设置在卡盘的外部。 通过间隙防止部件（400）将卡盘和环之间的空间与外部隔离。 可以在卡盘的外周形成由第一和第二台阶面（211,212）构成的台阶部（210）。 环可以设置在台阶部分。 卡盘和环之间的空间可以包括环的内表面和第一台阶表面之间的第一空间和环的底表面与第二台阶表面之间的第二空间。