-
公开(公告)号：US20150220005A1
公开(公告)日：2015-08-06
申请号：US14423082
申请日：2013-08-01
Applicant: ASML Holding N.V. , ASML Netherlands N.V.
Inventor： Christopher Charles Ward , Martinus Hendrikus Antonius Leenders , Mark Josef Schuster , Christiaan Louis Valentin
IPC: G03F7/20
CPC classification number: G03F7/70616 , G03F1/14 , G03F7/24 , G03F7/703 , G03F7/70783 , G03F7/7085 , G03F9/7026
Abstract: A system and method that bends a reticle and senses a curvature of a bent reticle in real-time. The system includes movable reticle stage, reticle vacuum clamps, sensor systems, and reticle bender. The reticle bender comprises piezo actuators. The sensor systems comprises measurement targets and corresponding sensors. The sensors are attached to the movable reticle stage and the measurement targets are attached to the reticle clamps, the reticle bender, or on reticle surfaces. The system is configured to determine a width of the reticle or distance between measurement targets at opposing ends of the reticle, measure a first rotational angle at a first end of the reticle, and measure a second local rotational angle at a second end of the reticle that is opposite to the first end. Based on the width or distance and the first and second angles, a field curvature of the reticle is determined.
Abstract translation: 弯曲掩模版并实时感测弯曲掩模版的曲率的系统和方法。 该系统包括可动标线台，光罩真空夹，传感器系统和光罩弯曲机。 光罩弯曲机包括压电致动器。 传感器系统包括测量目标和相应的传感器。 传感器连接到可动标线片台上，并且测量目标附着到标线夹，标线弯曲器或掩模版表面上。 该系统被配置为确定掩模版的宽度或掩模版的相对端处的测量目标之间的距离，测量在光罩的第一端处的第一旋转角度，并且在光罩的第二端处测量第二局部旋转角度 这与第一端相反。 基于宽度或距离以及第一和第二角度，确定掩模版的场曲率。
-
2.发明授权Alignment mark deformation estimating method, substrate position predicting method, alignment system and lithographic apparatus 有权对准标记变形估计方法，衬底位置预测方法，对准系统和光刻设备公开(公告)号：US08982347B2
公开(公告)日：2015-03-17
申请号：US13667199
申请日：2012-11-02
Applicant: ASML Netherlands N.V.
Inventor： Xiuhong Wei , Franciscus Godefridus Casper Bijnen , Richard Johannes Franciscus Van Haren , Marcus Adrianus Van De Kerkhof , Everhardus Cornelis Mos , Hubertus Johannes Gertrudus Simons , Remi Daniel Marie Edart , David Deckers , Nicole Schoumans , Irina Lyulina
CPC classification number: G01B11/272 , G01B11/27 , G03F9/7046 , G03F9/7049
Abstract: A method is used to estimate a value representative for a level of alignment mark deformation on a processed substrate using an alignment system. The alignment sensor system is able to emit light at different measuring frequencies to reflect from an alignment mark on the substrate and to detect a diffraction pattern in the reflected light in order to measure an alignment position of the alignment mark. The two or more measuring frequencies are used to measure an alignment position deviation per alignment mark associated with each of the two or more measuring frequencies relative to an expected predetermined alignment position of the alignment mark. A value is determined representative for the spread in the determined alignment position deviations per alignment mark in order to estimate the level of alignment mark deformation.
Abstract translation: 使用方法来估计使用对准系统代表处理的衬底上的对准标记变形水平的值。 对准传感器系统能够发射不同测量频率的光以从基板上的对准标记反射并检测反射光中的衍射图案，以便测量对准标记的对准位置。 两个或更多个测量频率用于测量与相对于对准标记的期望的预定对准位置的两个或多个测量频率中的每一个相关联的对准标记的对准位置偏差。 确定对于每个对准标记确定的对准位置偏差中的扩展的代表性的值，以便估计对准标记变形的水平。
-
3.发明申请Alignment Mark Deformation Estimating Method, Substrate Position Predicting Method, Alignment System and Lithographic Apparatus 有权对准标记变形估计方法，基板位置预测方法，对准系统和平版印刷设备公开(公告)号：US20130141723A1
公开(公告)日：2013-06-06
申请号：US13667199
申请日：2012-11-02
Applicant: ASML Netherlands N.V.
Inventor： Xiuhong WEI , Franciscus Godefridus Casper BIJNEN , Richard Johannes Franciscus VAN HAREN , Marcus Adrianus VAN DE KERKHOF , Everhardus Cornelis MOS , Hubertus Johannes Gertrudus SIMONS , Remi Daniel Marie EDART , David DECKERS , Nicole SCHOUMANS , Irina LYULINA
IPC: G01B11/14
CPC classification number: G01B11/272 , G01B11/27 , G03F9/7046 , G03F9/7049
Abstract: A method is used to estimate a value representative for a level of alignment mark deformation on a processed substrate using an alignment system. The alignment sensor system is able to emit light at different measuring frequencies to reflect from an alignment mark on the substrate and to detect a diffraction pattern in the reflected light in order to measure an alignment position of the alignment mark. The two or more measuring frequencies are used to measure an alignment position deviation per alignment mark associated with each of the two or more measuring frequencies relative to an expected predetermined alignment position of the alignment mark. A value is determined representative for the spread in the determined alignment position deviations per alignment mark in order to estimate the level of alignment mark deformation.
Abstract translation: 使用方法来估计使用对准系统代表处理的衬底上的对准标记变形水平的值。 对准传感器系统能够发射不同测量频率的光以从基板上的对准标记反射并检测反射光中的衍射图案，以便测量对准标记的对准位置。 两个或更多个测量频率用于测量与相对于对准标记的期望的预定对准位置的两个或多个测量频率中的每一个相关联的对准标记的对准位置偏差。 确定对于每个对准标记确定的对准位置偏差中的扩展的代表性的值，以便估计对准标记变形的水平。
-
公开(公告)号：US09632429B2
公开(公告)日：2017-04-25
申请号：US14423082
申请日：2013-08-01
Applicant: ASML Holding N.V. , ASML Netherlands N.V.
Inventor： Christopher Charles Ward , Martinus Hendrikus Antonius Leenders , Mark Josef Schuster , Christiaan Louis Valentin
CPC classification number: G03F7/70616 , G03F1/14 , G03F7/24 , G03F7/703 , G03F7/70783 , G03F7/7085 , G03F9/7026
Abstract: A system and method that bends a reticle and senses a curvature of a bent reticle in real-time. The system includes movable reticle stage, reticle vacuum clamps, sensor systems, and reticle bender. The reticle bender comprises piezo actuators. The sensor systems comprises measurement targets and corresponding sensors. The sensors are attached to the movable reticle stage and the measurement targets are attached to the reticle clamps, the reticle bender, or on reticle surfaces. The system is configured to determine a width of the reticle or distance between measurement targets at opposing ends of the reticle, measure a first rotational angle at a first end of the reticle, and measure a second local rotational angle at a second end of the reticle that is opposite to the first end. Based on the width or distance and the first and second angles, a field curvature of the reticle is determined.
-
-
-
Search Results
4
records
(took 0.012 seconds)
