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    Real-Time Reticle Curvature Sensing
    2.
    发明申请
    Real-Time Reticle Curvature Sensing 有权
    实时光栅曲率感应

    公开(公告)号：US20150220005A1

    公开(公告)日：2015-08-06

    申请号：US14423082

    申请日：2013-08-01

    Applicant: ASML Holding N.V. ,  ASML Netherlands N.V.

    Inventor： Christopher Charles Ward ,  Martinus Hendrikus Antonius Leenders ,  Mark Josef Schuster ,  Christiaan Louis Valentin

    IPC: G03F7/20

    CPC classification number: G03F7/70616 ,  G03F1/14 ,  G03F7/24 ,  G03F7/703 ,  G03F7/70783 ,  G03F7/7085 ,  G03F9/7026

    Abstract: A system and method that bends a reticle and senses a curvature of a bent reticle in real-time. The system includes movable reticle stage, reticle vacuum clamps, sensor systems, and reticle bender. The reticle bender comprises piezo actuators. The sensor systems comprises measurement targets and corresponding sensors. The sensors are attached to the movable reticle stage and the measurement targets are attached to the reticle clamps, the reticle bender, or on reticle surfaces. The system is configured to determine a width of the reticle or distance between measurement targets at opposing ends of the reticle, measure a first rotational angle at a first end of the reticle, and measure a second local rotational angle at a second end of the reticle that is opposite to the first end. Based on the width or distance and the first and second angles, a field curvature of the reticle is determined.

    Abstract translation: 弯曲掩模版并实时感测弯曲掩模版的曲率的系统和方法。 该系统包括可动标线台，光罩真空夹，传感器系统和光罩弯曲机。 光罩弯曲机包括压电致动器。 传感器系统包括测量目标和相应的传感器。 传感器连接到可动标线片台上，并且测量目标附着到标线夹，标线弯曲器或掩模版表面上。 该系统被配置为确定掩模版的宽度或掩模版的相对端处的测量目标之间的距离，测量在光罩的第一端处的第一旋转角度，并且在光罩的第二端处测量第二局部旋转角度 这与第一端相反。 基于宽度或距离以及第一和第二角度，确定掩模版的场曲率。

    Patterning Device Manipulating System and Lithographic Apparatuses
    3.
    发明申请
    Patterning Device Manipulating System and Lithographic Apparatuses 有权
    图案设备操纵系统和平版印刷设备

    公开(公告)号：US20150277241A1

    公开(公告)日：2015-10-01

    申请号：US14437294

    申请日：2013-09-20

    Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

    Inventor： Christiaan Louis Valentin ,  Erik Roelof Loopstra ,  Christopher Charles Ward ,  Daniel Nathan Burbank ,  Mark Josef Schuster ,  Peter James Graffeo

    IPC: G03F7/20

    CPC classification number: G03F7/70783 ,  G03F7/70266 ,  G03F7/70433 ,  G03F7/707 ,  G03F7/70725 ,  G03F7/70758 ,  G03F7/70775 ,  G03F7/70825

    Abstract: A system (300) for supporting an exchangeable object (302) can include a movable structure (304) and an object holder (306) configured to be movable relative to the movable structure. The object holder can be configured to hold the exchangeable object. The system can also include a first actuator assembly (308) and second actuator assembly (316). The first actuator assembly can be configured to apply a force to the object holder to translate the exchangeable object generally along a plane. The second actuator assembly can be configured to apply a bending moment to the object holder. The exchangeable object can be a patterning device of a lithographic apparatus.

    Abstract translation: 用于支撑可更换物体（302）的系统（300）可以包括可移动结构（304）和被配置为相对于可移动结构可移动的物体保持器（306）。 对象保持器可以被配置为保持可更换对象。 系统还可以包括第一致动器组件（308）和第二致动器组件（316）。 第一致动器组件可以被配置成向对象支架施加力，以大致沿着平面平移可交换对象。 第二致动器组件可以被配置为向对象保持器施加弯矩。 可交换对象可以是光刻设备的图案形成装置。

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