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公开(公告)号:US20150220005A1
公开(公告)日:2015-08-06
申请号:US14423082
申请日:2013-08-01
发明人: Christopher Charles Ward , Martinus Hendrikus Antonius Leenders , Mark Josef Schuster , Christiaan Louis Valentin
IPC分类号: G03F7/20
CPC分类号: G03F7/70616 , G03F1/14 , G03F7/24 , G03F7/703 , G03F7/70783 , G03F7/7085 , G03F9/7026
摘要: A system and method that bends a reticle and senses a curvature of a bent reticle in real-time. The system includes movable reticle stage, reticle vacuum clamps, sensor systems, and reticle bender. The reticle bender comprises piezo actuators. The sensor systems comprises measurement targets and corresponding sensors. The sensors are attached to the movable reticle stage and the measurement targets are attached to the reticle clamps, the reticle bender, or on reticle surfaces. The system is configured to determine a width of the reticle or distance between measurement targets at opposing ends of the reticle, measure a first rotational angle at a first end of the reticle, and measure a second local rotational angle at a second end of the reticle that is opposite to the first end. Based on the width or distance and the first and second angles, a field curvature of the reticle is determined.
摘要翻译: 弯曲掩模版并实时感测弯曲掩模版的曲率的系统和方法。 该系统包括可动标线台,光罩真空夹,传感器系统和光罩弯曲机。 光罩弯曲机包括压电致动器。 传感器系统包括测量目标和相应的传感器。 传感器连接到可动标线片台上,并且测量目标附着到标线夹,标线弯曲器或掩模版表面上。 该系统被配置为确定掩模版的宽度或掩模版的相对端处的测量目标之间的距离,测量在光罩的第一端处的第一旋转角度,并且在光罩的第二端处测量第二局部旋转角度 这与第一端相反。 基于宽度或距离以及第一和第二角度,确定掩模版的场曲率。
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公开(公告)号:US09632429B2
公开(公告)日:2017-04-25
申请号:US14423082
申请日:2013-08-01
发明人: Christopher Charles Ward , Martinus Hendrikus Antonius Leenders , Mark Josef Schuster , Christiaan Louis Valentin
CPC分类号: G03F7/70616 , G03F1/14 , G03F7/24 , G03F7/703 , G03F7/70783 , G03F7/7085 , G03F9/7026
摘要: A system and method that bends a reticle and senses a curvature of a bent reticle in real-time. The system includes movable reticle stage, reticle vacuum clamps, sensor systems, and reticle bender. The reticle bender comprises piezo actuators. The sensor systems comprises measurement targets and corresponding sensors. The sensors are attached to the movable reticle stage and the measurement targets are attached to the reticle clamps, the reticle bender, or on reticle surfaces. The system is configured to determine a width of the reticle or distance between measurement targets at opposing ends of the reticle, measure a first rotational angle at a first end of the reticle, and measure a second local rotational angle at a second end of the reticle that is opposite to the first end. Based on the width or distance and the first and second angles, a field curvature of the reticle is determined.
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公开(公告)号:US10705439B2
公开(公告)日:2020-07-07
申请号:US15904946
申请日:2018-02-26
发明人: Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Johannes Petrus Maria Smeulers , Stefan Philip Christiaan Belfroid , Herman Vogel
IPC分类号: G03F7/20
摘要: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
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公开(公告)号:US10656536B2
公开(公告)日:2020-05-19
申请号:US15308598
申请日:2015-04-23
发明人: Martinus Hendrikus Antonius Leenders , Niek Elout De Kruijf , Mircea Dusa , Martijn Houben , Johannes Gerardus Maria Mulder , Thomas Poiesz , Marco Adrianus Peter Van Den Heuvel , Paul Van Dongen , Justin Johannes Hermanus Gerritzen , Antonie Hendrik Verweij , Abraham Alexander Soethoudt
IPC分类号: B25B11/00 , G03F7/20 , H01L21/683
摘要: A substrate support, includes: a substrate support location configured to support a substrate, and a vacuum clamping device configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source to create a reduced pressure, at least one vacuum section connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.
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公开(公告)号:US20180188661A1
公开(公告)日:2018-07-05
申请号:US15904946
申请日:2018-02-26
发明人: Nicolaas Rudolf KEMPER , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Johannes Petrus Maria Smeulers , Stefan Philip Christiaan Belfroid , Herman Vogel
IPC分类号: G03F7/20
摘要: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
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公开(公告)号:US20150168854A1
公开(公告)日:2015-06-18
申请号:US14411870
申请日:2013-06-05
发明人: Jan Steven Christiaan Westerlaken , Ruud Hendrikus Martinus Johannes Bloks , Peter A. Delmastro , Thibault Simon Mathieu Laurent , Martinus Hendrikus Antonius Leenders , Mark Josef Schuster , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Justin Matthew Verdirame , Samir A. Nayfeh
IPC分类号: G03F7/20
CPC分类号: G03F7/70875 , G03F7/70916 , G03F7/70933
摘要: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.
摘要翻译: 光刻设备具有构造成支撑图案形成装置的支撑结构,所述图案形成装置用于根据期望的图案对辐射束进行图案化,并具有辐射束通过的平面主表面; 出口开口,其构造成将气体流引导到图案形成装置上; 以及入口开口,被配置为提取已经离开出口的气体,其中出口开口和入口开口面向面向图案形成装置的平面主表面的面对表面。
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公开(公告)号:US10185231B2
公开(公告)日:2019-01-22
申请号:US15495548
申请日:2017-04-24
发明人: Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Harry Sewell , Louis John Markoya , Marcus Martinus Petrus Adrianus Vermeulen , Diane Elaine Markoya
IPC分类号: G03F7/20
摘要: A new way of drying and/or wetting a surface, such as a top surface of a substrate, is disclosed which is useful in immersion lithography. The surface is placed under a single phase extractor and a priming liquid is delivered between the single phase extractor and the surface. The single phase extractor is only activated after the priming liquid has been provided between the single phase extractor and the surface. Priming liquid is delivered to the single phase extractor during the whole of the drying and/or wetting process.
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公开(公告)号:US09904185B2
公开(公告)日:2018-02-27
申请号:US15333044
申请日:2016-10-24
发明人: Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Johannes Petrus Maria Smeulers , Stefan Philip Christiaan Belfroid , Herman Vogel
CPC分类号: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
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公开(公告)号:US09507278B2
公开(公告)日:2016-11-29
申请号:US14806395
申请日:2015-07-22
发明人: Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik de Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Johannes Petrus Maria Smeulers , Stefan Philip Christiaan Belfroid , Herman Vogel
CPC分类号: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
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公开(公告)号:US10649349B2
公开(公告)日:2020-05-12
申请号:US16226731
申请日:2018-12-20
发明人: Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Harry Sewell , Louis John Markoya , Marcus Martinus Petrus Adrianus Vermeulen , Diane Elaine Markoya
IPC分类号: G03F7/20
摘要: A new way of drying and/or wetting a surface, such as a top surface of a substrate, is disclosed which is useful in immersion lithography. The surface is placed under a single phase extractor and a priming liquid is delivered between the single phase extractor and the surface. The single phase extractor is only activated after the priming liquid has been provided between the single phase extractor and the surface. Priming liquid is delivered to the single phase extractor during the whole of the drying and/or wetting process.
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