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    Real-Time Reticle Curvature Sensing
    1.
    发明申请
    Real-Time Reticle Curvature Sensing 有权
    实时光栅曲率感应

    公开(公告)号：US20150220005A1

    公开(公告)日：2015-08-06

    申请号：US14423082

    申请日：2013-08-01

    Applicant: ASML Holding N.V. ,  ASML Netherlands N.V.

    Inventor： Christopher Charles Ward ,  Martinus Hendrikus Antonius Leenders ,  Mark Josef Schuster ,  Christiaan Louis Valentin

    IPC: G03F7/20

    CPC classification number: G03F7/70616 ,  G03F1/14 ,  G03F7/24 ,  G03F7/703 ,  G03F7/70783 ,  G03F7/7085 ,  G03F9/7026

    Abstract: A system and method that bends a reticle and senses a curvature of a bent reticle in real-time. The system includes movable reticle stage, reticle vacuum clamps, sensor systems, and reticle bender. The reticle bender comprises piezo actuators. The sensor systems comprises measurement targets and corresponding sensors. The sensors are attached to the movable reticle stage and the measurement targets are attached to the reticle clamps, the reticle bender, or on reticle surfaces. The system is configured to determine a width of the reticle or distance between measurement targets at opposing ends of the reticle, measure a first rotational angle at a first end of the reticle, and measure a second local rotational angle at a second end of the reticle that is opposite to the first end. Based on the width or distance and the first and second angles, a field curvature of the reticle is determined.

    Abstract translation: 弯曲掩模版并实时感测弯曲掩模版的曲率的系统和方法。 该系统包括可动标线台，光罩真空夹，传感器系统和光罩弯曲机。 光罩弯曲机包括压电致动器。 传感器系统包括测量目标和相应的传感器。 传感器连接到可动标线片台上，并且测量目标附着到标线夹，标线弯曲器或掩模版表面上。 该系统被配置为确定掩模版的宽度或掩模版的相对端处的测量目标之间的距离，测量在光罩的第一端处的第一旋转角度，并且在光罩的第二端处测量第二局部旋转角度 这与第一端相反。 基于宽度或距离以及第一和第二角度，确定掩模版的场曲率。

    DETERMINING POSITION AND CURVATURE INFORMATION DIRECTLY FROM A SURFACE OF A PATTERNING DEVICE
    3.
    发明申请
    DETERMINING POSITION AND CURVATURE INFORMATION DIRECTLY FROM A SURFACE OF A PATTERNING DEVICE 有权
    确定位置和曲线信息直接从图案设备的表面

    公开(公告)号：US20140307246A1

    公开(公告)日：2014-10-16

    申请号：US14357514

    申请日：2013-05-31

    Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

    Inventor： Mark Josef Schuster ,  Santiago E Del Puerto ,  Daniel Nathan Burbank ,  Duncan Walter Bromley ,  Franciscus Godefridus Casper Bijnen

    IPC: G03F7/20

    CPC classification number: G03F7/70775 ,  G03F1/14 ,  G03F1/142 ,  G03F1/38 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70783 ,  G03F7/7085

    Abstract: Position and curvature information of a patterning device may be determined directly from the patterning device and controlled based on the determined information. In an embodiment, a lithographic apparatus includes a position determining system operative to determine a relative position of the patterning device. The patterning device may be configured to create a patterned radiation beam from a radiation beam incident on a major surface of the patterning device. The patterning device may have a side surface having an edge in common with the major surface. The position determining system may include an interferometer operative to transmit light to the side surface and to receive the transmitted light after the transmitted light has been reflected at the side surface. The position determining system is operative to determine a quantity representative of the relative position of the patterning device from the received reflected transmitted light.

    Abstract translation: 图案形成装置的位置和曲率信息可以直接从图案形成装置确定并基于所确定的信息进行控制。 在一个实施例中，光刻设备包括位置确定系统，其可操作以确定图案形成装置的相对位置。 图案形成装置可以被配置为从入射在图案形成装置的主表面上的辐射束产生图案化的辐射束。 图案形成装置可以具有与主表面共同的边缘的侧表面。 位置确定系统可以包括干涉仪，其操作以将光透射到侧表面，并且在透射光已经在侧表面被反射之后接收透射光。 位置确定系统用于确定代表图案形成装置相对于所接收的反射透射光的相对位置的量。

    Patterning Device Support and Lithographic Apparatus
    8.
    发明申请
    Patterning Device Support and Lithographic Apparatus 有权
    图案设备支持和平版印刷设备

    公开(公告)号：US20150277240A1

    公开(公告)日：2015-10-01

    申请号：US14436070

    申请日：2013-09-23

    Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

    Inventor： Arindam Sinharoy ,  Stephen S. Roux ,  Jean-Philippe Xavier Van Damme ,  Daniel Nathan Burbank ,  Mark Josef Schuster ,  Duncan Harris ,  Christopher Charles Ward

    IPC: G03F7/20

    CPC classification number: G03F7/70733 ,  G03F7/707 ,  G03F7/70783

    Abstract: A patterning device support (200), for example, a patterning device (202) or substrate support, can be configured to release internal stresses of a patterning device loaded thereon. The patterning device support can include a positive pressuring generating interface (206a, 206b) or an acoustic vibration generating interface (206a, 206b), or can be configured to oscillate while at least a portion of patterning device is decoupled from the patterning device support. A method of transferring a patterning device between a patterning device handling apparatus and a patterning device support configured to move the patterning device can include positioning the patterning device onto a surface of the patterning device support, and performing a process that releases internal stress of the patterning device.

    Abstract translation: 图案形成装置支撑件（200），例如，图案形成装置（202）或基板支撑件可以构造成释放装载在其上的图案形成装置的内部应力。 图案形成装置支撑件可以包括正压力生成界面（206a，206b）或声振动产生界面（206a，206b），或者可以被配置为在图案形成装置的至少一部分与图案形成装置支撑件分离的同时进行摆动。 在图案形成装置处理装置和被构造成移动图案形成装置的图案形成装置支撑件之间传送图案形成装置的方法可以包括将图案形成装置定位在图案形成装置支撑件的表面上，并且执行释放图案形成装置的内部应力 设备。

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