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公开(公告)号：US06957608B1
公开(公告)日：2005-10-25
申请号：US10288357
申请日：2002-11-04
Applicant: Brian Hubert , Colin Bulthaup , Chris Gudeman , Chris Spindt , Scott Haubrich , Mao Takashima , Joerg Rockenberger , Klaus Kunze , Fabio Zurcher
Inventor： Brian Hubert , Colin Bulthaup , Chris Gudeman , Chris Spindt , Scott Haubrich , Mao Takashima , Joerg Rockenberger , Klaus Kunze , Fabio Zurcher
CPC classification number: H01L51/0021 , H01L51/0022 , H01L51/0023 , H05K3/12
Abstract: A method of and device for controlled printing using liquid embossing techniques is disclosed. In accordance with the embodiments of the invention a stamp comprises a differentiated embossing surface with protruding and recessed surfaces to enhance the ability of the stamp to selectively displace liquid ink from a print surface and/or remove solvent from the liquid in a soft curing process. A stamp with differentiated surfaces is fabricated by selectively coating, or otherwise treating the protruding features, the recessed features, or a combination thereof, such that the surface energies and/or wettability of the protruding surfaces and the recessed surfaces are differentiated.
Abstract translation: 公开了一种使用液体压花技术进行控制印刷的方法和装置。 根据本发明的实施例，印模包括具有突出和凹陷表面的差异化压花表面，以增强印模在软化固化过程中从印刷表面选择性地移出液体油墨和/或从液体中除去溶剂的能力。 通过选择性地涂覆或以其它方式处理突出特征，凹陷特征或其组合来制造具有不同表面的印模，使得突出表面和凹陷表面的表面能量和/或润湿性不同。
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公开(公告)号：US20110297084A1
公开(公告)日：2011-12-08
申请号：US13210318
申请日：2011-08-15
Applicant: Brian Hubert , Joseph Jacobson , Aggelos Bletsas
Inventor： Brian Hubert , Joseph Jacobson , Aggelos Bletsas
CPC classification number: B82B3/00 , G03F7/0002 , Y10S977/849 , Y10S977/85 , Y10S977/851 , Y10S977/855 , Y10S977/86
Abstract: An all-additive apparatus for direct fabrication of nanometer-scale planar and multilayer structures that performs “pick-and-place” retrieval and deposition of materials comprises a tip and a controller and transport mechanism configured for causing the tip to acquire a transferable material and deposit at least a portion of the acquired transferable material at a predetermined location onto a substrate, without the use of a bridging medium, in order to directly assemble a structure. The tip may be submillimeter-scale, may comprise a plurality of sub-tips disposed in a predetermined arrangement, and/or may mechanically vibrate. Mechanical vibration of the tip may be monitored. The tip may acquire the transferable material from a reservoir. The assembled structure may be cured on the substrate.
Abstract translation: 用于直接制造纳米级平面和多层结构的全添加装置，其执行材料的“拾取和放置”取出和沉积，包括尖端和配置用于使尖端获得可转移材料的控制器和输送机构， 将所获得的可转移材料的至少一部分在预定位置沉积到基板上，而不使用桥接介质，以便直接组装结构。 尖端可以是亚毫米级的，可以包括以预定布置设置的多个子尖端和/或可以机械振动。 可以监测尖端的机械振动。 尖端可以从储存器获取可转移材料。 组装的结构可以在基底上固化。
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公开(公告)号：US07998528B2
公开(公告)日：2011-08-16
申请号：US10367616
申请日：2003-02-14
Applicant: Brian Hubert , Joseph Jacobson , Aggelos Bletsas
Inventor： Brian Hubert , Joseph Jacobson , Aggelos Bletsas
CPC classification number: B82B3/00 , G03F7/0002 , Y10S977/849 , Y10S977/85 , Y10S977/851 , Y10S977/855 , Y10S977/86
Abstract: An all-additive method for direct fabrication of nanometer-scale planar and multilayer structures comprises the steps of acquiring a transferable material with a submillimeter-scale tip, depositing at least a portion of the acquired first transferable material at a predetermined location onto a substrate without a bridging medium, and repeating to create a structure using the transferable material.
Abstract translation: 用于直接制造纳米尺度平面和多层结构的全加法方法包括以下步骤：用亚毫米级尖端获取可转移材料，将获取的第一可转移材料的至少一部分在预定位置沉积到基底上，而无需 桥接介质，并重复使用可转移材料产生结构。
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4.发明授权Radiation patternable functional materials, methods of their use, and structures formed therefrom 失效可辐射图案化功能材料，其使用方法和由其形成的结构公开(公告)号：US07294449B1
公开(公告)日：2007-11-13
申请号：US10749876
申请日：2003-12-31
Applicant: Christopher Gudeman , Joerg Rockenberger , Brian Hubert , Criswell Choi , Alfred Renaldo
Inventor： Christopher Gudeman , Joerg Rockenberger , Brian Hubert , Criswell Choi , Alfred Renaldo
CPC classification number: G03F7/0047 , C23C18/06 , C23C18/14 , H05K3/02 , H05K2201/0257 , H05K2203/0514 , H05K2203/121
Abstract: Materials, compounds and compositions for radiation patternable functional thin films, methods of synthesizing such materials and compounds, and methods for forming an electronically functional thin film and structures including such a film. The compounds and compositions generally include (a) nanoparticles of an electronically functional material or substance and (b) ligands containing a (photo)reactive group. The method generally includes the steps of (1) irradiating the compound and/or composition, and (2) curing the irradiated compound and/or composition, generally to form an electronically functional film. The functional thin film includes a sintered mixture of nanoparticles. The thin film exhibits improved morphology and/or resolution relative to an otherwise identical structure made by an identical process, but without the (photo)functional group on the ligand, and/or relative to an otherwise identical material patterned by a conventional graphics art-based printing process. The present process also exhibits improved throughput relative to conventional photolithographic processing, by eliminating a metal deposition step. The present invention advantageously provides functional thin film structures having qualities suitable for use in electronics applications, such as display devices or RF ID tags, while enabling elimination of a number of conventional photolithographic processing steps (e.g., functional material sputtering, PECVD, etc.).
Abstract translation: 用于辐射可图形功能薄膜的材料，化合物和组合物，合成这种材料和化合物的方法，以及形成电子功能薄膜的方法和包括这种膜的结构。 化合物和组合物通常包括（a）电子功能材料或物质的纳米颗粒和（b）含有（光）反应性基团的配体。 该方法通常包括以下步骤：（1）照射化合物和/或组合物，和（2）固化照射的化合物和/或组合物，通常形成电子功能膜。 功能性薄膜包括纳米颗粒的烧结混合物。 相对于通过相同方法制备的其它相同的结构，但是没有配体上的（光）官能团，和/或相对于通过常规图形艺术图案化的其它相同材料，薄膜表现出改善的形态和/或分辨率。 基于打印过程。 通过消除金属沉积步骤，本方法还显示相对于常规光刻处理的改善的生产量。 本发明有利地提供具有适合用于电子应用（例如显示装置或RF ID标签）的质量的功能薄膜结构，同时能够消除许多常规光刻处理步骤（例如，功能材料溅射，PECVD等） 。
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