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公开(公告)号：US20060228647A1
公开(公告)日：2006-10-12
申请号：US11387215
申请日：2006-03-23
Applicant: James Thackeray , James Cameron , Roger Sinta
Inventor： James Thackeray , James Cameron , Roger Sinta
IPC: G03C1/00
CPC classification number: G03F7/0392 , G03F7/0045 , Y10S430/115 , Y10S430/121 , Y10S430/122 , Y10S430/126 , Y10S522/913
Abstract: Photoresist compositions having a resin binder with an acid labile blocking group with an activation energy in excess of 20 Kcal/mol. for deblocking, a photoacid generator capable of generating a halogenated sulfonic acid upon photolysis and optionally, a base.
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2.发明授权Photoresist composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units 失效具有苯酚单体的主要成分和非芳香环烷醇单体的较小比例的共聚物粘合剂的光催化组合物
公开(公告)号：US5128232A
公开(公告)日：1992-07-07
申请号：US354800
申请日：1989-05-22
Applicant: James Thackeray , George W. Orsula , Roger Sinta
Inventor： James Thackeray , George W. Orsula , Roger Sinta
IPC: G03F7/023 , G03F7/029 , G03F7/038 , H01L21/027
CPC classification number: G03F7/0295 , G03F7/0233 , G03F7/038 , Y10S430/106 , Y10S430/11
Abstract: A photoresist that utilizes a copolymer of a phenol and a cyclic alcohol having increased optical transmission properties relative to photoresists using fully aromatic phenolic resins. Preferred binders are hydrogenated novolak resins and hydrogenated polyvinyl phenol resins.
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公开(公告)号：US20070042289A1
公开(公告)日：2007-02-22
申请号：US11481209
申请日：2006-07-05
Applicant: James Thackeray , Gerald Wayton , Charles Szmanda
Inventor： James Thackeray , Gerald Wayton , Charles Szmanda
IPC: G03C1/00
CPC classification number: G03F7/11 , G03F7/0392 , G03F7/091
Abstract: Underlying coating compositions are provided for use with an overcoated photoresist composition. In one aspect, the coating composition can be crosslinked and comprise one or more components that contain one or more acid-labile groups and/or one or more base-reactive groups that are reactive following crosslinking. In another aspect, underlying coating composition are provided that can be treated to provide a modulated water contact angle. Preferred coating compositions can enhance lithographic performance of an associated photoresist composition.
Abstract translation: 提供底涂层组合物用于外涂光致抗蚀剂组合物。 在一个方面，涂料组合物可以是交联的并且包含一种或多种含有一个或多个酸不稳定基团的组分和/或一个或多个在交联后是反应性的碱反应性基团。 在另一方面，提供了可以处理以提供调制水接触角的下面的涂料组合物。 优选的涂料组合物可以增强相关光致抗蚀剂组合物的平版印刷性能。
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公开(公告)号：US20080206671A1
公开(公告)日：2008-08-28
申请号：US12072790
申请日：2008-02-28
Applicant: James Thackeray , Roger Nassar
Inventor： James Thackeray , Roger Nassar
CPC classification number: G03F7/0397 , G03F7/0045 , G03F7/0382 , G03F7/38 , Y10S430/106 , Y10S430/111
Abstract: The invention relates to new polymers that comprise units that contain one or more photoacid generator groups and photoresists that contain the polymers. Preferred polymers of the invention are suitable for use in photoresists imaged at short wavelengths such as sub-250 nm or sub-200 nm, particularly 248 nm and 193 nm.
Abstract translation: 本发明涉及包含含有一种或多种光酸产生剂基团的单元的新聚合物和含有聚合物的光致抗蚀剂。 本发明优选的聚合物适用于在短波长（例如亚250nm或亚-200nm，特别是248nm和193nm）成像的光刻胶中。
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Patent Agency Ranking
公开(公告)号：US20060051706A1
公开(公告)日：2006-03-09
申请号：US11249813
申请日：2005-10-12
Applicant: James Thackeray , Angelo Lamola
Inventor： James Thackeray , Angelo Lamola
IPC: G03C1/76
CPC classification number: G03F7/0382 , G03F7/004 , G03F7/0045 , G03F7/0226 , G03F7/038 , G03F7/039 , G03F7/0392 , G03F7/40
Abstract: The present invention provides radiation sensitive compositions and methods that comprise novel means for providing relief images of enhanced resolution. In one aspect the invention provides a method for controlling diffusion of photogenerated acid comprising adding a polar compound to a radiation sensitive composition and applying a layer of the composition to a substrate; exposing the composition layer to activating radiation whereby a latent image is generated comprising a distribution of acid moieties complexed with the polar compound; and treating the exposed composition layer to provide an activating amount of acid.
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6.发明授权Photoresist and method for forming a relief image utilizing composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units 失效光致抗蚀剂和利用具有主要比例的酚单元的共聚物粘合剂和少量非芳族环状醇单元的组合物形成浮雕图像的方法
公开(公告)号：US5210000A
公开(公告)日：1993-05-11
申请号：US832004
申请日：1992-02-06
Applicant: James Thackeray , George W. Orsula , Roger Sinta
Inventor： James Thackeray , George W. Orsula , Roger Sinta
CPC classification number: G03F7/0295 , G03F7/0233 , G03F7/038 , Y10S430/106 , Y10S430/11
Abstract: A photoresist that utilizes a copolymer of a phenol and a cyclic alcohol having increased optical transmission properties relative to photoresists using fully aromatic phenolic resins. Preferred binders are hydrogenated novolak resins and hydrogenated polyvinyl phenol resins.
Abstract translation: 相对于使用完全芳族酚醛树脂的光致抗蚀剂，利用苯酚和环状醇的共聚物的光致抗蚀剂具有增强的光学透射性能。 优选的粘合剂是氢化酚醛清漆树脂和氢化聚乙烯基苯酚树脂。
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公开(公告)号：US20060204892A1
公开(公告)日：2006-09-14
申请号：US11418520
申请日：2006-05-03
Applicant: James Mori , James Thackeray , Roger Sinta , Rosemary Bell , Robin Miller-Fahey , Timothy Adams , Thomas Zydowsky , Edward Pavelchek , Manuel doCanto
Inventor： James Mori , James Thackeray , Roger Sinta , Rosemary Bell , Robin Miller-Fahey , Timothy Adams , Thomas Zydowsky , Edward Pavelchek , Manuel doCanto
IPC: G03C1/76
CPC classification number: G03F7/091 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/111 , Y10S430/127
Abstract: The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.
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公开(公告)号：US20060110682A1
公开(公告)日：2006-05-25
申请号：US11328928
申请日：2006-01-09
Applicant: James Thackeray , George Orsula
Inventor： James Thackeray , George Orsula
IPC: G03C1/76
Abstract: Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.
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公开(公告)号：US20050019705A1
公开(公告)日：2005-01-27
申请号：US10924351
申请日：2004-08-23
Applicant: James Thackeray , James Mori , Gary Teng
Inventor： James Thackeray , James Mori , Gary Teng
CPC classification number: G03F7/0392 , G03F7/168 , G03F7/38
Abstract: New methods and compositions are provided that enable application and processing of photoresist as thick coating layers, e.g. at dried layer (post soft-bake) thicknesses of in excess of 2 microns. Resists can be imaged at short wavelengths in accordance with the invention, including 248 nm.
Abstract translation: 提供了新的方法和组合物，其使得能够应用和加工光致抗蚀剂作为厚涂层。 在干燥层（软后烘烤）上的厚度超过2微米。 根据本发明，抗蚀剂可以以短波长成像，包括248nm。
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