公开(公告)号：US20140290503A1

公开(公告)日：2014-10-02

申请号：US14359590

申请日：2012-11-19

申请人： Jeong-Yong Bae

发明人： Jeong-Yong Bae

IPC分类号： A23N1/02

CPC分类号： A23N1/02 ,  A47J19/025 ,  A47J19/027

摘要： A juice extractor includes a filter net which has a plurality of holes that are used to prevent residues of squeezed food from passing therethrough and allow juice of the squeezed food to pass therethrough formed thereon, and cutting blades which adhere to one or more lateral portions of the filter net to cut the food residues stuck in a plurality of the holes. According to the present invention, a user easily cleans the filter net after using the juice extractor.

摘要翻译： 果汁提取器包括一个过滤网，该过滤网具有多个孔，用于防止挤压食品的残留物从其中通过，并允许挤压的食物的汁液通过其中形成;以及切割刀片，其粘附到一个或多个侧面部分 过滤网将食物残渣切割成多个孔。 根据本发明，用户在使用榨汁机之后容易地清洁过滤网。

公开(公告)号：US08714169B2

公开(公告)日：2014-05-06

申请号：US12623582

申请日：2009-11-23

申请人： Taek Youb Lee ,  Jeong Yong Bae ,  Choon Sik Kim

发明人： Taek Youb Lee ,  Jeong Yong Bae ,  Choon Sik Kim

IPC分类号： B08B3/00

CPC分类号： H01L21/68728 ,  H01L21/67051 ,  H01L21/68785

摘要： Provided is a spin head supporting a substrate and rotating the substrate. The spin head includes a body, chuck pins installed on the body and moving between supporting positions where a substrate is supported and waiting positions providing space for loading/unloading of the substrate, and a chuck pin moving unit configured to move the chuck pins. The chuck pin moving unit includes a rotation rod coupled with each of the chuck pins, a pivot pin fixing the rotation rod to the body, and a driving member rotating the rotation rod about the pivot pin as a rotation shaft to move the chuck pin from the supporting position to the waiting position. When the body rotates, the rotation rod uses reverse centrifugal force to apply force to the chuck pin from the waiting position to the supporting position. The chuck pins include first pins and second pins that alternately chuck a substrate during a process.

摘要翻译： 提供了支撑衬底并旋转衬底的旋转头。 旋转头包括主体，安装在主体上的卡盘销，并且在支撑基板的支撑位置和在提供用于装载/卸载基板的空间的等待位置之间移动的卡盘销以及配置成移动卡盘销的卡盘销移动单元。 卡盘销移动单元包括与每个卡盘销连接的旋转杆，将旋转杆固定到主体上的枢轴销和驱动构件，该旋转杆将旋转杆围绕枢转销旋转，以将卡盘销从 支持位置到等待位置。 当主体旋转时，旋转杆使用反向离心力将卡盘销从等待位置向支撑位置施加力。 卡盘销包括在过程中交替地卡住基板的第一销和第二销。

公开(公告)号：US20130081658A1

公开(公告)日：2013-04-04

申请号：US13609986

申请日：2012-09-11

申请人： Gil Hun SONG ,  Jeong Yong BAE ,  Kyo Woog KOO

发明人： Gil Hun SONG ,  Jeong Yong BAE ,  Kyo Woog KOO

IPC分类号： B08B3/00

CPC分类号： H01L21/67051 ,  H01L21/67034 ,  H01L21/6715

摘要： Provided are an apparatus and method for treating a substrate through a supercritical process. The apparatus includes a housing providing a space for performing a process, and a plurality of support members vertically arranged in the housing at predetermined intervals to support edges of substrates, respectively.

摘要翻译： 提供了一种通过超临界方法处理衬底的装置和方法。 该装置包括一个提供进行处理的空间的壳体，以及以预定的间隔垂直地布置在壳体中的多个支撑构件，以分别支撑基板的边缘。

公开(公告)号：US08257549B2

公开(公告)日：2012-09-04

申请号：US12222149

申请日：2008-08-04

申请人： Woo-Seok Lee ,  Woo-Young Kim ,  Jeong-Yong Bae

发明人： Woo-Seok Lee ,  Woo-Young Kim ,  Jeong-Yong Bae

IPC分类号： H01L21/306

CPC分类号： H01L21/6715 ,  H01L21/67051 ,  H01L21/6708

摘要： Provided is a spin head for supporting a substrate. The spin head includes a rotatable body, and chuck pins protruding upward from the body and configured to support an edge of a substrate placed at the body when the body is rotated. Each of the chuck pins includes a vertical rod vertically disposed at the body, and a support rod extending from a side of the vertical rod and configured to make contact with the edge of the substrate placed at the body when the body is rotated. When the substrate is rotated, the vertical rod is spaced apart from the edge of the substrate. The contact portion includes a streamlined side surface. The support rod includes a contact portion. The contact portion tapers toward the end of the support rod when viewed from the top of the support rod.

摘要翻译： 提供了用于支撑基板的旋转头。 旋转头包括可旋转主体和从主体向上突出的卡盘销，并且构造成当主体旋转时支撑放置在主体上的基板的边缘。 每个卡盘销包括垂直设置在主体上的垂直杆，以及支撑杆，其从竖直杆的一侧延伸并且构造成当主体旋转时与放置在主体上的基板的边缘接触。 当基板旋转时，垂直杆与基板的边缘间隔开。 接触部分包括流线型侧面。 支撑杆包括接触部分。 当从支撑杆的顶部观察时，接触部分朝着支撑杆的端部逐渐变细。

公开(公告)号：US20100326476A1

公开(公告)日：2010-12-30

申请号：US12824364

申请日：2010-06-28

申请人： Eun-Su Rho ,  Jeong-Yong Bae

发明人： Eun-Su Rho ,  Jeong-Yong Bae

IPC分类号： B08B3/00 ,  G03F7/42

CPC分类号： G03F7/422 ,  G03F7/423 ,  H01L21/6708

摘要： An apparatus for processing substrate includes a spin chuck, a first nozzle and a second nozzle. The spin chuck fixes and spins the substrate on which a photoresist layer is formed. The first nozzle is disposed over the spin chuck and provides a treatment liquid on the substrate so as to remove the photoresist layer. The second nozzle is disposed over the spin chuck and provides a mist including deionized water or hydrogen peroxide on the substrate to make contact with the treatment liquid so as to increase a temperature of the treatment liquid. Therefore, efficiency of removing the photoresist layer may be improved.

摘要翻译： 一种处理衬底的设备包括旋转卡盘，第一喷嘴和第二喷嘴。 旋转卡盘固定并旋转其上形成有光致抗蚀剂层的基板。 第一喷嘴设置在旋转卡盘上方，并在基板上提供处理液体，以除去光致抗蚀剂层。 第二喷嘴设置在旋转卡盘上方，并在基板上提供包括去离子水或过氧化氢的雾以与处理液体接触，从而提高处理液的温度。 因此，可以提高除去光致抗蚀剂层的效率。

公开(公告)号：US20100200397A1

公开(公告)日：2010-08-12

申请号：US12656683

申请日：2010-02-12

申请人： Yijung Kim ,  Eun Su Rho ,  Jeong Yong Bae

发明人： Yijung Kim ,  Eun Su Rho ,  Jeong Yong Bae

IPC分类号： C25B9/08 ,  C25B9/06

CPC分类号： C25D7/12 ,  C25D17/001 ,  H01L21/2885 ,  H01L21/76877

摘要： Provided are a substrate plating apparatus and a substrate plating method. In the substrate plating apparatus, a substrate support member supports a substrate to allow a plating surface to look up. A plating solution containing positive ions dissolved from a positive electrode is supplied from a plating solution supply member onto the substrate at an upper side of the substrate support member. A plating bath surrounds the substrate support member. The substrate support member is rotated in a state where it is immersed into the plating solution and an additive. The substrate can be supported by the substrate support member without reversing the substrate. Also, a pattern defect due to bubbles generated during a plating process can be prevented.

摘要翻译： 提供了基板电镀装置和基板电镀方法。 在基板电镀装置中，基板支撑部件支撑基板以允许电镀表面查找。 从正极溶解的含有正离子的电镀溶液从电镀溶液供给部件在基板支撑部件的上侧供给到基板上。 电镀浴围绕衬底支撑构件。 衬底支撑构件在浸入电镀溶液和添加剂的状态下旋转。 衬底可以由衬底支撑构件支撑，而不会反转衬底。 此外，可以防止由于在电镀工艺期间产生的气泡引起的图案缺陷。

公开(公告)号：US20090093123A1

公开(公告)日：2009-04-09

申请号：US12222149

申请日：2008-08-04

申请人： Woo-Seok Lee ,  Woo-Young Kim ,  Jeong-Yong Bae

发明人： Woo-Seok Lee ,  Woo-Young Kim ,  Jeong-Yong Bae

IPC分类号： H01L21/306

CPC分类号： H01L21/6715 ,  H01L21/67051 ,  H01L21/6708

摘要： Provided is a spin head for supporting a substrate. The spin head includes a rotatable body, and chuck pins protruding upward from the body and configured to support an edge of a substrate placed at the body when the body is rotated. Each of the chuck pins includes a vertical rod vertically disposed at the body, and a support rod extending from a side of the vertical rod and configured to make contact with the edge of the substrate placed at the body when the body is rotated. When the substrate is rotated, the vertical rod is spaced apart from the edge of the substrate. The contact portion includes a streamlined side surface. The support rod includes a contact portion. The contact portion tapers toward the end of the support rod when viewed from the top of the support rod.

摘要翻译： 提供了用于支撑基板的旋转头。 旋转头包括可旋转主体和从主体向上突出的卡盘销，并且构造成当主体旋转时支撑放置在主体上的基板的边缘。 每个卡盘销包括垂直设置在主体上的垂直杆，以及支撑杆，其从竖直杆的一侧延伸并且构造成当主体旋转时与放置在主体上的基板的边缘接触。 当基板旋转时，垂直杆与基板的边缘间隔开。 接触部分包括流线型侧面。 支撑杆包括接触部分。 当从支撑杆的顶部观察时，接触部分朝着支撑杆的端部逐渐变细。

公开(公告)号：US20060207777A1

公开(公告)日：2006-09-21

申请号：US11377679

申请日：2006-03-17

申请人： Ju-Won Kim ,  Doo-Keun An ,  Kwang-II Choi ,  Pyong-Soon Jung ,  Yong-Nam Choi ,  Jeong-Yong Bae

发明人： Ju-Won Kim ,  Doo-Keun An ,  Kwang-II Choi ,  Pyong-Soon Jung ,  Yong-Nam Choi ,  Jeong-Yong Bae

IPC分类号： B25D15/00

CPC分类号： C02F1/008 ,  C01B5/00 ,  C02F1/685 ,  C02F2103/02 ,  C02F2103/026 ,  Y10T137/0324 ,  Y10T137/0329 ,  Y10T137/2509

摘要： A supply system for supplying a functional water to a process unit which treats a substrate using the functional water is provided. In the system, the functional water generated in the functional water generator is supplied to a distributor through a functional water supply pipe. Thereafter, the functional water is supplied to the process unit while the process unit performs a process, and the functional water is returned to the functional water generator through a functional water returning pipe while the process unit does not perform a process. A buffer tank is installed in the functional water supply pipe and the concentration of the functional water is measured in a circulation line connected with the buffer tank. When the measured concentration of the functional water goes out of a set concentration range, the functional water is returned to the functional water generator through functional water returning pipe.

公开(公告)号：US20140323992A1

公开(公告)日：2014-10-30

申请号：US14359595

申请日：2012-11-19

申请人： Jeong-Yong BAE

发明人： Jeong-Yong Bae

IPC分类号： A61M35/00 ,  B05B12/12 ,  B05B15/12

CPC分类号： A61M35/00 ,  B05B1/14 ,  B05B12/122 ,  B05B12/124 ,  B05B15/656 ,  B05B16/405

摘要： An oil spray device is configured to include a casing unit which has an exit for allowing a user to enter the casing unit, spray units which are mounted on the inner surface of the casing unit to spray oil to skins of the user in the casing unit, and a means for distinguishing between clothes and skins which distinguishes clothes of the user from skins exposed out of the clothes, wherein the oil spray unit uses the means for distinguishing between clothes and skins to distinguish skins of the user from clothes of the user, and then selectively sprays oil to the skins of the user through the spray units.

摘要翻译： 喷油装置构造成包括具有用于允许使用者进入壳体单元的出口的壳体单元，安装在壳体单元的内表面上的喷射单元，以将油喷射到壳体单元中的使用者的皮肤上 以及用于区分使用者的衣服和从衣服露出的皮肤的衣服和皮肤的区别的手段，其中，所述喷油单元使用用于区分衣服和皮肤的装置来区分使用者的皮肤和使用者的衣服， 然后通过喷雾单元选择性地将油喷射到使用者的皮肤上。

公开(公告)号：US08702365B2

公开(公告)日：2014-04-22

申请号：US12544552

申请日：2009-08-20

申请人： Sun Yong Park ,  Choon Sik Kim ,  Jeong Yong Bae

发明人： Sun Yong Park ,  Choon Sik Kim ,  Jeong Yong Bae

IPC分类号： H01L21/677

CPC分类号： H01L21/67769 ,  H01L21/67775

摘要： A substrate processing apparatus includes a main load unit, a buffer load unit, and a transfer unit. Containers each accommodating substrates are placed on the main load unit and the buffer load unit. The buffer load unit is disposed above the main load unit and movable into and outward from a process module. Therefore, more containers can be placed in the substrate processing apparatus without increasing the footprint of the substrate processing apparatus, and thus it is possible to reduce equipment idle time during which standby substrates wait before being processed, thereby improving productivity.

摘要翻译： 衬底处理装置包括主负载单元，缓冲器负载单元和转移单元。 容纳各容纳基板的容器被放置在主负载单元和缓冲装载单元上。 缓冲装载单元设置在主负载单元上方，并可从处理模块移入和移出。 因此，可以在基板处理装置中放置更多的容器，而不会增加基板处理装置的占地面积，从而可以减少备用基板在处理之前等待的设备空闲时间，从而提高生产率。