公开(公告)号：US20060207777A1

公开(公告)日：2006-09-21

申请号：US11377679

申请日：2006-03-17

申请人： Ju-Won Kim ,  Doo-Keun An ,  Kwang-II Choi ,  Pyong-Soon Jung ,  Yong-Nam Choi ,  Jeong-Yong Bae

发明人： Ju-Won Kim ,  Doo-Keun An ,  Kwang-II Choi ,  Pyong-Soon Jung ,  Yong-Nam Choi ,  Jeong-Yong Bae

IPC分类号： B25D15/00

CPC分类号： C02F1/008 ,  C01B5/00 ,  C02F1/685 ,  C02F2103/02 ,  C02F2103/026 ,  Y10T137/0324 ,  Y10T137/0329 ,  Y10T137/2509

摘要： A supply system for supplying a functional water to a process unit which treats a substrate using the functional water is provided. In the system, the functional water generated in the functional water generator is supplied to a distributor through a functional water supply pipe. Thereafter, the functional water is supplied to the process unit while the process unit performs a process, and the functional water is returned to the functional water generator through a functional water returning pipe while the process unit does not perform a process. A buffer tank is installed in the functional water supply pipe and the concentration of the functional water is measured in a circulation line connected with the buffer tank. When the measured concentration of the functional water goes out of a set concentration range, the functional water is returned to the functional water generator through functional water returning pipe.

公开(公告)号：US07617836B2

公开(公告)日：2009-11-17

申请号：US11377679

申请日：2006-03-17

申请人： Ju-Won Kim ,  Doo-Keun An ,  Kwang-Il Choi ,  Pyong-Soon Jung ,  Yong-Nam Choi ,  Jeong-Yong Bae

发明人： Ju-Won Kim ,  Doo-Keun An ,  Kwang-Il Choi ,  Pyong-Soon Jung ,  Yong-Nam Choi ,  Jeong-Yong Bae

IPC分类号： G05D11/08

CPC分类号： C02F1/008 ,  C01B5/00 ,  C02F1/685 ,  C02F2103/02 ,  C02F2103/026 ,  Y10T137/0324 ,  Y10T137/0329 ,  Y10T137/2509

摘要： A supply system for supplying a functional water to a process unit which treats a substrate using the functional water is provided. In the system, the functional water generated in the functional water generator is supplied to a distributor through a functional water supply pipe. Thereafter, the functional water is supplied to the process unit while the process unit performs a process, and the functional water is returned to the functional water generator through a functional water returning pipe while the process unit does not perform a process. A buffer tank is installed in the functional water supply pipe and the concentration of the functional water is measured in a circulation line connected with the buffer tank. When the measured concentration of the functional water goes out of a set concentration range, the functional water is returned to the functional water generator through functional water returning pipe.

摘要翻译： 提供了一种用于向功能水处理基板的处理单元供给功能水的供给系统。 在该系统中，功能水发生器中产生的功能水通过功能性供水管道供给到分配器。 此后，在处理单元执行处理时，将功能水供给处理单元，并且在处理单元不执行处理时，功能水通过功能回水管返回到功能水生成器。 在功能性供水管中安装缓冲罐，在与缓冲罐连接的循环管线中测量功能水的浓度。 当功能水的测量浓度超出设定浓度范围时，功能水通过功能回水管返回到功能水发生器。

公开(公告)号：US20080185459A1

公开(公告)日：2008-08-07

申请号：US11792065

申请日：2004-12-31

申请人： Doo-Keun An ,  Pyeng-Jae Park

发明人： Doo-Keun An ,  Pyeng-Jae Park

IPC分类号： B05B1/00

CPC分类号： B01J4/02 ,  B01J4/002 ,  B01J2219/00164

摘要： The present invention is directed to a system for supplying chemicals to a plurality of nozzles to fabricate integrated circuits. The system includes a supply line, a return line, and a selecting part for supplying a constant amount of chemicals to the return line or one of nozzles. According to the invention, a constant amount of chemicals are supplied from a chemical storage irrespective of the number of nozzles requiring a supply of chemicals. This enables a pump to avoid overworking and suppresses the conventional problem that a determined time is required for enabling chemicals to reach a fixed temperature.

摘要翻译： 本发明涉及一种用于向多个喷嘴提供化学品以制造集成电路的系统。 该系统包括供应管线，返回管线和用于向返回管线或喷嘴中的一个供应恒定量的化学品的选择部件。 根据本发明，不管需要供应化学品的喷嘴的数量如何，从化学品存储器供应恒定量的化学品。 这使得泵避免过度劳累并且抑制了使化学品达到固定温度所需的确定时间的常规问题。