Sputtering target with ultra-fine, oriented grains and method of making
same
    3.
    发明授权
    Sputtering target with ultra-fine, oriented grains and method of making same 失效
    超细,定向晶粒的溅射靶和制作方法

    公开(公告)号:US5590389A

    公开(公告)日:1996-12-31

    申请号:US363397

    申请日:1994-12-23

    摘要: A sputtering target comprising a body of metal such as aluminum and its alloy with an ultrafine grain size and small second phase. Also described is a method for making an ultra-fine grain sputtering target comprising melting, atomizing, and depositing atomized metal to form a workpiece, and fabricating the workpiece to form a sputtering target. A method is also disclosed that includes the steps of extruding a workpiece through a die having contiguous, transverse inlet and outlet channels of substantially identical cross section, and fabricating the extruded article into a sputtering target. The extrusion may be performed several times, producing grain size of still smaller size and controlled grain texture.

    摘要翻译: 一种溅射靶,其包括诸如铝的金属体及其具有超细晶粒尺寸和小的第二相的合金。 还描述了一种制造超细晶粒溅射靶的方法,包括熔化,雾化和沉积雾化金属以形成工件,以及制造工件以形成溅射靶。 还公开了一种方法,其包括以下步骤:将工件挤压通过具有基本相同横截面的连续的,横向的入口和出口通道的模具,并将挤压制品制造成溅射靶。 挤出可以进行几次,产生更小尺寸的颗粒尺寸和受控的颗粒纹理。