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42 条记录 (耗时 0.028 秒)

    Atmosphere exchange method
    1.
    发明授权
    Atmosphere exchange method 有权
    大气交换法

    公开(公告)号：US08216386B2

    公开(公告)日：2012-07-10

    申请号：US12062649

    申请日：2008-04-04

    申请人： Shinya Mochizuki

    发明人： Shinya Mochizuki

    IPC分类号： B08B17/00

    CPC分类号： H01L21/67017 ,  H01L21/67248

    摘要： There is provided a method for exchanging an atmosphere of a vacuum chamber of a processing apparatus configured to process a substrate under a vacuum environment. The method includes the steps of holding the substrate using a holding unit provided in the vacuum chamber, and exchanging the atmosphere of the vacuum chamber through exhaustion or air supply, wherein the exchanging step maintains a pressure of the vacuum chamber in a range between 10 Pa and 10000 Pa for a period between 10 seconds and 600 seconds while controlling a temperature of a dust collection unit provided in the vacuum chamber lower than a temperature of the substrate.

    摘要翻译： 提供了一种用于交换在真空环境下处理基板的处理装置的真空室的气氛的方法。 该方法包括以下步骤：使用设置在真空室中的保持单元来保持基板，并且通过排气或空气供给来更换真空室的气氛，其中，所述交换步骤将真空室的压力保持在10Pa 并且在10秒至600秒之间的时间内，10000Pa，同时控制设置在真空室中的灰尘收集单元的温度低于基板的温度。

    Method of object transfer for a heat treatment system
    2.
    发明授权
    Method of object transfer for a heat treatment system 有权
    热处理系统物体转移方法

    公开(公告)号：US08147241B2

    公开(公告)日：2012-04-03

    申请号：US12849317

    申请日：2010-08-03

    申请人： Shinya Mochizuki ,  Motoki Akimoto

    发明人： Shinya Mochizuki ,  Motoki Akimoto

    IPC分类号： F27D3/00

    CPC分类号： H01L21/67373 ,  F27B5/04 ,  F27B17/0025 ,  F27D3/0084 ,  F27D5/0037 ,  H01L21/67017 ,  H01L21/67109 ,  H01L21/67379 ,  H01L21/67389 ,  H01L21/67393 ,  H01L21/67739 ,  H01L21/67769 ,  H01L21/67772 ,  H01L21/67775 ,  H01L21/67778 ,  H01L21/68707 ,  Y10S269/903 ,  Y10S414/135 ,  Y10S414/137

    摘要： Disclosed herein is method for use in a vertical heat treatment system which has an opening which is formed in a partition wall separating a housing-box transfer area from a treating-object transfer area (a wafer transfer area), and and through which an object to be treated is carried in the vertical heat treatment system to carry out a predetermined treatment. When the object to be treated is carried in via the opening of the partition wall, which separates the housing-box transfer area from the treating-object transfer area (wafer transfer area), to carry out a predetermined treatment, the structure of various mechanisms in the vicinity of the opening is simplified, and the space is saved.

    摘要翻译： 本文公开了一种在垂直热处理系统中使用的方法，该立式热处理系统具有开口，该开口形成在将收纳箱传送区域与处理对象传送区域（晶片传送区域）分隔开的分隔壁中，并且通过该开口 在立式热处理系统中进行处理，进行规定的处理。 当待处理物体通过将收纳箱传送区域与处理对象传送区域（晶片传送区域）分离的分隔壁的开口进行预定处理时，各种机构的结构 在开口附近被简化，节省空间。

    METHOD OF OBJECT TRANSFER FOR A HEAT TREATMENT SYSTEM
    3.
    发明申请
    METHOD OF OBJECT TRANSFER FOR A HEAT TREATMENT SYSTEM 有权
    热处理系统对象转移方法

    公开(公告)号：US20100316968A1

    公开(公告)日：2010-12-16

    申请号：US12849317

    申请日：2010-08-03

    申请人： Shinya MOCHIZUKI ,  Motoki Akimoto

    发明人： Shinya MOCHIZUKI ,  Motoki Akimoto

    IPC分类号： F27D3/00

    CPC分类号： H01L21/67373 ,  F27B5/04 ,  F27B17/0025 ,  F27D3/0084 ,  F27D5/0037 ,  H01L21/67017 ,  H01L21/67109 ,  H01L21/67379 ,  H01L21/67389 ,  H01L21/67393 ,  H01L21/67739 ,  H01L21/67769 ,  H01L21/67772 ,  H01L21/67775 ,  H01L21/67778 ,  H01L21/68707 ,  Y10S269/903 ,  Y10S414/135 ,  Y10S414/137

    摘要： Disclosed herein is method for use in a vertical heat treatment system which has an opening which is formed in a partition wall separating a housing-box transfer area from a treating-object transfer area (a wafer transfer area), and and through which an object to be treated is carried in the vertical heat treatment system to carry out a predetermined treatment. When the object to be treated is carried in via the opening of the partition wall, which separates the housing-box transfer area from the treating-object transfer area (wafer transfer area), to carry out a predetermined treatment, the structure of various mechanisms in the vicinity of the opening is simplified, and the space is saved.

    摘要翻译： 本文公开了一种在垂直热处理系统中使用的方法，该立式热处理系统具有开口，该开口形成在将收纳箱传送区域与处理对象传送区域（晶片传送区域）分隔开的分隔壁中，并且通过该开口 在立式热处理系统中进行处理，进行规定的处理。 当待处理物体通过将收纳箱传送区域与处理对象传送区域（晶片传送区域）分离的分隔壁的开口进行预定处理时，各种机构的结构 在开口附近被简化，节省空间。

    Apparatus and method for detecting disk write omissions
    8.
    发明授权
    Apparatus and method for detecting disk write omissions 有权
    检测磁盘写入缺失的装置和方法

    公开(公告)号：US07487289B2

    公开(公告)日：2009-02-03

    申请号：US11348320

    申请日：2006-02-07

    申请人： Mikio Ito ,  Hideo Takahashi ,  Shinya Mochizuki ,  Hidejiro Daikokuya ,  Kazuhiko Ikeuchi ,  Hideki Yamanaka ,  Katsuhiko Nagashima ,  Akihito Kobayashi ,  Koji Uchida ,  Shinichi Nishizono

    发明人： Mikio Ito ,  Hideo Takahashi ,  Shinya Mochizuki ,  Hidejiro Daikokuya ,  Kazuhiko Ikeuchi ,  Hideki Yamanaka ,  Katsuhiko Nagashima ,  Akihito Kobayashi ,  Koji Uchida ,  Shinichi Nishizono

    IPC分类号： G06F12/06 ,  G06F11/08 ,  G06F11/18

    CPC分类号： G06F11/1076 ,  G06F2211/104

    摘要： In the present invention, for each set of blocks [#(0) to #(N−1)] storing update data, a history block [#(N)] storing an update state value, for example, a generation, time or check code, showing an update state is provided, constituting a set of management data as a check object. When writing update data on a disk, a new update state value is calculated for the same set of management data and stored in memory as update state confirmation value. The new update state value is also set as write data in the history block in the same set of management data, and the entire of the set of management data including update data and update state value are written onto a disk. The history block is read and disk write omissions are detected by comparing the update state value and the update state confirmation value stored in memory.

    摘要翻译： 在本发明中，对于存储更新数据的每个块[＃（0）〜＃（N-1）]组，存储更新状态值的历史块[＃（N）]，例如生成，时间或 检查代码，显示提供更新状态，构成作为检查对象的一组管理数据。 在磁盘上写入更新数据时，为同一组管理数据计算新的更新状态值，并将其作为更新状态确认值存储在内存中。 新的更新状态值也被设置为同一组管理数据中的历史块中的写入数据，并且包括更新数据和更新状态值的整个管理数据集合被写入盘中。 读取历史块，并通过比较存储在存储器中的更新状态值和更新状态确认值来检测磁盘写入缺失。

    ATMOSPHERE EXCHANGE METHOD
    9.
    发明申请
    ATMOSPHERE EXCHANGE METHOD 有权
    大气交换方法

    公开(公告)号：US20080247846A1

    公开(公告)日：2008-10-09

    申请号：US12062649

    申请日：2008-04-04

    申请人： Shinya Mochizuki

    发明人： Shinya Mochizuki

    IPC分类号： H01L21/677

    CPC分类号： H01L21/67017 ,  H01L21/67248

    摘要： There is provided a method for exchanging an atmosphere of a vacuum chamber of a processing apparatus configured to process a substrate under a vacuum environment. The method includes the steps of holding the substrate using a holding unit provided in the vacuum chamber, and exchanging the atmosphere of the vacuum chamber through exhaustion or air supply, wherein the exchanging step maintains a pressure of the vacuum chamber in a range between 10 Pa and 10000 Pa for a period between 10 seconds and 600 seconds while controlling a temperature of a dust collection unit provided in the vacuum chamber lower than a temperature of the substrate.

    摘要翻译： 提供了一种用于交换在真空环境下处理基板的处理装置的真空室的气氛的方法。 该方法包括以下步骤：使用设置在真空室中的保持单元来保持基板，并且通过排气或空气供给来更换真空室的气氛，其中，所述交换步骤将真空室的压力保持在10Pa 并且在10秒至600秒之间的时间内，10000Pa，同时控制设置在真空室中的灰尘收集单元的温度低于基板的温度。