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    PROCESSES FOR PRODUCING FLUORINATED ETHER COMPOUNDS
    1.
    发明申请
    PROCESSES FOR PRODUCING FLUORINATED ETHER COMPOUNDS 有权

    公开(公告)号：US20210301083A1

    公开(公告)日：2021-09-30

    申请号：US17335694

    申请日：2021-06-01

    Applicant: AGC Inc.

    Inventor： Taiki HOSHINO ,  Motoshi AOYAMA ,  Kiyotaka TAKAO

    IPC: C08G65/336 ,  C08G65/337 ,  C08G65/333 ,  C08G65/00 ,  C09D5/00 ,  C09D171/02

    Abstract: Processes for producing a fluorinated ether compound are provided by which fluorinated ether compound capable of imparting excellent water/oil repellency, to a substrate surface or a hard coat layer can be easily produced in high yield. A process comprising reacting Rf(CF2)a—CF2OC(═O)Rf4 or Rf(CF2)a—C(═O)X1 with HN(—R1CH═CH2)2 to obtain Rf(CF2)a—C(═O)N(—R1CH2═CH2)2 and a process comprising obtaining the above product and reacting the product with HSiR2nL3−n to obtain Rf(CF2)a—C(═O)N(—R1CH2CH2SiR2nL3−n)2 wherein Rf is a linear polyfluoroalkyl group having at least two carbon atoms and at least one etheric oxygen atom between carbon atoms, Rf4 is a C1-30 perfluoroalkyl group or the like, X1 is a halogen atom, R1 is an alkylene group, a is an integer of from 1 to 5, R2 is a monovalent hydrocarbon group, L is a hydrolyzable group, and n is an integer of from 0 to 2.

    PROCESSES FOR PRODUCING FLUORINATED ETHER COMPOUNDS
    2.
    发明申请
    PROCESSES FOR PRODUCING FLUORINATED ETHER COMPOUNDS 审中-公开

    公开(公告)号：US20190218339A1

    公开(公告)日：2019-07-18

    申请号：US16282406

    申请日：2019-02-22

    Applicant: AGC Inc.

    Inventor： Taiki HOSHINO ,  Motoshi AOYAMA ,  Kiyotaka TAKAO

    IPC: C08G65/336 ,  C09D171/02 ,  C09D5/00

    CPC classification number: C08G65/336 ,  C08G65/337 ,  C08G2150/00 ,  C09D5/00 ,  C09D171/02

    Abstract: Processes for producing a fluorinated ether compound are provided by which fluorinated ether compound capable of imparting excellent water/oil repellency, to a substrate surface or a hard coat layer can be easily produced in high yield. A process comprising reacting Rf(CF2)a—CF2OC(═O)Rf4 or Rf(CF2)a—C(═O)X1 with HN(—R1CH═CH2)2 to obtain Rf(CF2)a—C(═O)N(—R1CH2═CH2)2 and a process comprising obtaining the above product and reacting the product with HSiR2nL3-n to obtain Rf(CF2)a—C(═O)N(—R1CH2CH2SiR2nL3-n)2 wherein Rf is a linear polyfluoroalkyl group having at least two carbon atoms and at least one etheric oxygen atom between carbon atoms, Rf4 is a C1-30 perfluoroalkyl group or the like, X1 is a halogen atom, R1 is an alkylene group, a is an integer of from 1 to 5, R2 is a monovalent hydrocarbon group, L is a hydrolyzable group, and n is an integer of from 0 to 2.

    COMPOSITION AND ARTICLE
    6.
    发明申请
    COMPOSITION AND ARTICLE 有权

    公开(公告)号：US20210348024A1

    公开(公告)日：2021-11-11

    申请号：US17443038

    申请日：2021-07-20

    Applicant: AGC Inc.

    Inventor： Keigo MATSUURA ,  Taiki HOSHINO ,  Kiyotaka TAKAO ,  Makoto UNO ,  Eiichiro ANRAKU ,  Motoshi AOYAMA ,  Naoki KATSUKI ,  Yusuke TOMIYORI ,  Toyokazu ENTA ,  Hiromasa YAMAMOTO

    IPC: C09D183/10 ,  C09D5/00 ,  C09D7/20

    Abstract: To provide a composition with which a surface layer excellent in abrasion resistance and sliding resistance can be formed, and an article.
    The composition of the present invention comprises a compound represented by the formula (1) and a compound represented by the formula (2), wherein the ratio of the number of moles of the group represented by —CF3 in Rf1 in the formula (1) to the total of the number of moles of the group represented by —CF2— closest to Y1 in Rf2 in the formula (1), the number of moles of the group represented by —CF2— closest to Y2 in Rf3 in the formula (2) and the number of moles of the group represented by —CF2— closest to Y3 in Rf3 in the formula (2), is from 0.001 to 0.1: Rf1—(OX1)m1—O—Rf2—Y1—[Si(R1)n1L13-n1]g1  (1) [L23-n2(R2)n2Si]g2—Y2—Rf3—(OX2)m2—O—Rf4—Y3—[Si(R3)n3L33-n3]g3  (2)

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