公开(公告)号：US20170255105A1

公开(公告)日：2017-09-07

申请号：US15443681

申请日：2017-02-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Johannes Matheus Marie DE WIT ,  Kim Gerard Feijen ,  Anko Jozef Cornelus Sijben ,  Martinus Maassen ,  Henricus Martinus Johannes VAN DE GROES

IPC: G03F7/20 ,  G01N21/88

CPC classification number: G03F7/70191 ,  G01N21/8806 ,  G01N2021/8835 ,  G02B21/082 ,  G02B21/361 ,  G02B21/365 ,  G03F7/70575 ,  G03F7/70616

Abstract: Disclosed is an illumination system for a metrology apparatus and a metrology apparatus comprising such an illumination system. The illumination system comprises an illumination source; and a linear variable filter arrangement configured to filter a radiation beam from said illumination source and comprising one or more linear variable filters. The illumination system is operable to enable selective control of a wavelength characteristic of the radiation beam subsequent to it being filtered by the linear variable filter arrangement.

公开(公告)号：US10416567B2

公开(公告)日：2019-09-17

申请号：US15443681

申请日：2017-02-27

Applicant: ASML Netherlands B.V.

Inventor： Johannes Matheus Marie De Wit ,  Kim Gerard Feijen ,  Anko Jozef Cornelus Sijben ,  Martinus Maassen ,  Henricus Martinus Johannes Van De Groes

IPC: G03F7/20 ,  G01N21/88 ,  G02B21/08 ,  G02B21/36

Abstract: Disclosed is an illumination system for a metrology apparatus and a metrology apparatus comprising such an illumination system. The illumination system comprises an illumination source; and a linear variable filter arrangement configured to filter a radiation beam from said illumination source and comprising one or more linear variable filters. The illumination system is operable to enable selective control of a wavelength characteristic of the radiation beam subsequent to it being filtered by the linear variable filter arrangement.

公开(公告)号：US09494875B2

公开(公告)日：2016-11-15

申请号：US14349900

申请日：2012-09-19

Applicant: ASML Netherlands B.V.

Inventor： Sebastiaan Maria Johannes Cornelissen ,  Noud Jan Gilissen ,  Anko Jozef Cornelus Sijben ,  Roger Wilhelmus Antonius Henricus Schmitz ,  Arnoud Willem Notenboom ,  Ronald Van Der Wilk ,  Manon Elise Will

IPC: G03F7/20 ,  H01L21/683 ,  G10L15/08 ,  G10L15/22

CPC classification number: G03F7/70708 ,  G03F7/707 ,  G03F7/70875 ,  G03F7/70908 ,  G10L15/08 ,  G10L2015/223 ,  H01L21/6831

Abstract: A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed. In an embodiment, there is provided a chuck (43) for use in holding a patterning device (MA) or a substrate (W) onto a supporting table (MT, WT) of a lithography apparatus (100) by electrostatic force, in which the patterning device is for imparting a radiation beam (B) with a pattern in its cross-section to form a patterned radiation beam, and the substrate is for receiving the patterned radiation beam; said chuck comprising: a dielectric member (45); a temperature conditioning fluid channel (48) formed within the chuck; a drive electrode (40, 42) for applying a potential difference between the drive electrode and the patterning device or substrate across the dielectric member in order to electrostatically attract the patterning device or substrate towards the drive electrode; and a first shield electrode (60) for reducing or preventing the development of an electric field across temperature conditioning fluid in the temperature conditioning fluid channel due to a voltage applied to the drive electrode, in order to reduce or prevent electrolysis in the fluid.

Abstract translation: 公开了一种卡盘，卡盘控制系统，光刻设备和使用卡盘的方法。 在一个实施例中，提供了一种用于通过静电力将图案形成装置（MA）或基板（W）保持在光刻设备（100）的支撑台（MT，WT）上的卡盘，其中 图案形成装置用于在其横截面中赋予具有图案的辐射束（B）以形成图案化的辐射束，并且该衬底用于接收图案化的辐射束; 所述卡盘包括：电介质构件（45）; 形成在卡盘内的温度调节流体通道（48） 用于在驱动电极和图案形成装置或基板之间跨越电介质构件施加电位差的驱动电极（40,42），以便静电地将图案形成装置或衬底吸引到驱动电极; 以及第一屏蔽电极（60），用于由于施加到驱动电极的电压而减少或防止温度调节流体通道中温度调节流体的电场的发展，以便减少或防止流体中的电解。

公开(公告)号：US20140253900A1

公开(公告)日：2014-09-11

申请号：US14349900

申请日：2012-09-19

Applicant: ASML Netherlands B.V.

Inventor： Sebastiaan Maria Johannes Cornelissen ,  Noud Jan Gilissen ,  Anko Jozef Cornelus Sijben ,  Roger Wilhelmus Antonius Henricus Schmitz ,  Arnoud Willem Notenboom ,  Ronald Van Der Wilk ,  Manon Elise Will

IPC: G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70708 ,  G03F7/707 ,  G03F7/70875 ,  G03F7/70908 ,  G10L15/08 ,  G10L2015/223 ,  H01L21/6831

Abstract: A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed. In an embodiment, there is provided a chuck (43) for use in holding a patterning device (MA) or a substrate (W) onto a supporting table (MT, WT) of a lithography apparatus (100) by electrostatic force, in which the patterning device is for imparting a radiation beam (B) with a pattern in its cross-section to form a patterned radiation beam, and the substrate is for receiving the patterned radiation beam; said chuck comprising: a dielectric member (45); a temperature conditioning fluid channel (48) formed within the chuck; a drive electrode (40, 42) for applying a potential difference between the drive electrode and the patterning device or substrate across the dielectric member in order to electrostatically attract the patterning device or substrate towards the drive electrode; and a first shield electrode (60) for reducing or preventing the development of an electric field across temperature conditioning fluid in the temperature conditioning fluid channel due to a voltage applied to the drive electrode, in order to reduce or prevent electrolysis in the fluid.

Abstract translation: 公开了一种卡盘，卡盘控制系统，光刻设备和使用卡盘的方法。 在一个实施例中，提供了一种用于通过静电力将图案形成装置（MA）或基板（W）保持在光刻设备（100）的支撑台（MT，WT）上的卡盘，其中 图案形成装置用于在其横截面中赋予具有图案的辐射束（B）以形成图案化的辐射束，并且该衬底用于接收图案化的辐射束; 所述卡盘包括：电介质构件（45）; 形成在卡盘内的温度调节流体通道（48） 用于在驱动电极和图案形成装置或基板之间跨越电介质构件施加电位差的驱动电极（40,42），以便静电地将图案形成装置或衬底吸引到驱动电极; 以及第一屏蔽电极（60），用于由于施加到驱动电极的电压而减少或防止温度调节流体通道中温度调节流体的电场的发展，以便减少或防止流体中的电解。