公开(公告)号：US20170255105A1

公开(公告)日：2017-09-07

申请号：US15443681

申请日：2017-02-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Johannes Matheus Marie DE WIT ,  Kim Gerard Feijen ,  Anko Jozef Cornelus Sijben ,  Martinus Maassen ,  Henricus Martinus Johannes VAN DE GROES

IPC: G03F7/20 ,  G01N21/88

CPC classification number: G03F7/70191 ,  G01N21/8806 ,  G01N2021/8835 ,  G02B21/082 ,  G02B21/361 ,  G02B21/365 ,  G03F7/70575 ,  G03F7/70616

Abstract: Disclosed is an illumination system for a metrology apparatus and a metrology apparatus comprising such an illumination system. The illumination system comprises an illumination source; and a linear variable filter arrangement configured to filter a radiation beam from said illumination source and comprising one or more linear variable filters. The illumination system is operable to enable selective control of a wavelength characteristic of the radiation beam subsequent to it being filtered by the linear variable filter arrangement.

公开(公告)号：US10416567B2

公开(公告)日：2019-09-17

申请号：US15443681

申请日：2017-02-27

Applicant: ASML Netherlands B.V.

Inventor： Johannes Matheus Marie De Wit ,  Kim Gerard Feijen ,  Anko Jozef Cornelus Sijben ,  Martinus Maassen ,  Henricus Martinus Johannes Van De Groes

IPC: G03F7/20 ,  G01N21/88 ,  G02B21/08 ,  G02B21/36

Abstract: Disclosed is an illumination system for a metrology apparatus and a metrology apparatus comprising such an illumination system. The illumination system comprises an illumination source; and a linear variable filter arrangement configured to filter a radiation beam from said illumination source and comprising one or more linear variable filters. The illumination system is operable to enable selective control of a wavelength characteristic of the radiation beam subsequent to it being filtered by the linear variable filter arrangement.

公开(公告)号：US10101677B2

公开(公告)日：2018-10-16

申请号：US15087299

申请日：2016-03-31

Applicant: ASML Netherlands B.V.

Inventor： Kim Gerard Feijen ,  Henricus Wilhelmus Maria Van Buel ,  Martinus Joseph Kok

IPC: G03F7/20 ,  G03F9/00 ,  G01B11/06 ,  G01B11/14 ,  G01B11/27 ,  G02B3/14 ,  G02B26/00 ,  G02B27/00 ,  G01N21/956

Abstract: An inspection apparatus (for example a scatterometer) comprises: a substrate support for supporting a substrate and an optical system. An illumination system illuminates a target (T) with radiation. A positioning system (518) moves one or both of the optical system and the substrate support so as to position an individual target (T) relative to the optical system so that the imaging optics can use a portion of the diffracted radiation to form an image of the target structure on an image sensor (23). A liquid lens (722) is controlled (902) by feed-forward control to maintain said image stationary against vibration and/or scanning movement between the optical system and the target structure. In a second aspect, a liquid lens (1324, 1363) to correct chromatic aberration during measurements made at different wavelengths. This may improve focusing of the illumination on the target (T), and/or focusing of an image on the image sensor (23).