公开(公告)号：US11580289B2

公开(公告)日：2023-02-14

申请号：US17297801

申请日：2019-10-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Roshni Biswas ,  Rafael C. Howell ,  Cuiping Zhang ,  Ningning Jia ,  Jingjing Liu ,  Quan Zhang

IPC: G06F30/30 ,  G03F7/20 ,  G06F30/398 ,  G06F30/392 ,  G06F119/18

Abstract: A method for determining a patterning device pattern. The method includes obtaining (i) an initial patterning device pattern having at least one feature, and (ii) a desired feature size of the at least one feature, obtaining, based on a patterning process model, the initial patterning device pattern and a target pattern for a substrate, a difference value between a predicted pattern of the substrate image by the initial patterning device and the target pattern for the substrate, determining a penalty value related the manufacturability of the at least one feature, wherein the penalty value varies as a function of the size of the at least one feature, and determining the patterning device pattern based on the initial patterning device pattern and the desired feature size such that a sum of the difference value and the penalty value is reduced.

公开(公告)号：US10386727B2

公开(公告)日：2019-08-20

申请号：US15126234

申请日：2015-03-03

Applicant: ASML Netherlands B.V.

Inventor： Duan-Fu Stephen Hsu ,  Jianjun Jia ,  Xiaofeng Liu ,  Cuiping Zhang

IPC: G03F7/20 ,  G03F1/36

Abstract: A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method including: computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied. The multi-variable cost function may be a function of one or more pattern shift errors. Reconfiguration of the characteristics may be under one or more constraints on the one or more pattern shift errors.

公开(公告)号：US11972194B2

公开(公告)日：2024-04-30

申请号：US18089848

申请日：2022-12-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Roshni Biswas ,  Rafael C. Howell ,  Cuiping Zhang ,  Ningning Jia ,  Jingjing Liu ,  Quan Zhang

IPC: G06F30/30 ,  G03F7/00 ,  G03F7/20 ,  G06F30/392 ,  G06F30/398 ,  G06F119/18

CPC classification number: G06F30/398 ,  G03F7/70441 ,  G03F7/705 ,  G03F7/70625 ,  G06F30/392 ,  G06F2119/18

Abstract: A method for determining a patterning device pattern. The method includes obtaining (i) an initial patterning device pattern having at least one feature, and (ii) a desired feature size of the at least one feature, obtaining, based on a patterning process model, the initial patterning device pattern and a target pattern for a substrate, a difference value between a predicted pattern of the substrate image by the initial patterning device and the target pattern for the substrate, determining a penalty value related the manufacturability of the at least one feature, wherein the penalty value varies as a function of the size of the at least one feature, and determining the patterning device pattern based on the initial patterning device pattern and the desired feature size such that a sum of the difference value and the penalty value is reduced.