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    Lithographic apparatus and table for use in such an apparatus
    3.
    发明授权
    Lithographic apparatus and table for use in such an apparatus 有权
    用于这种装置的平版印刷设备和工作台

    公开(公告)号：US09377697B2

    公开(公告)日：2016-06-28

    申请号：US14648620

    申请日：2013-12-20

    Applicant: ASML Netherlands B.V.

    Inventor： Mark Johannes Hermanus Frencken ,  Andre Bernardus Jeunink ,  Frederikus Johannes Maria De Vreede ,  Gijs Kramer

    IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

    CPC classification number: G03F7/70341 ,  G03F7/70733

    Abstract: An immersion lithographic apparatus includes a projection system, a first table with a first planar surface and a second table with a second planar surface, the first and second planar surfaces being substantially coplanar, a liquid confinement system configured to spatially confine an immersion liquid to a volume with a first surface area that is coplanar with the first and second planar surfaces, and is substantially smaller than a second surface area of the top surface of the substrate, and a swap bridge member attached to the first table, the swap bridge member having an upper surface that is substantially coplanar with the first and second planar surfaces, wherein the upper surface of the swap bridge member is configured to serve as part of the liquid confinement system and to deform when the swap bridge member collides with the second table and to remain attached to the first table.

    Abstract translation: 浸没式光刻设备包括投影系统，具有第一平面表面的第一工作台和具有第二平面表面的第二工作台，第一和第二平面表面基本上共面;液体限制系统构造成将浸没液体空间地限制在 体积，其具有与第一和第二平坦表面共面的第一表面区域，并且基本上小于衬底的顶表面的第二表面区域，以及附接到第一工作台的交换桥接构件，交换桥接构件具有 与第一和第二平面基本上共面的上表面，其中交换桥接件的上表面构造成用作液体限制系统的一部分，并且当交换桥件与第二工作台碰撞时变形， 留在第一张桌子上。

    Substrate shape measuring device, substrate handling device, substrate shape measuring unit and method to handle substrates
    4.
    发明授权
    Substrate shape measuring device, substrate handling device, substrate shape measuring unit and method to handle substrates 有权

    公开(公告)号：US11726411B2

    公开(公告)日：2023-08-15

    申请号：US17625467

    申请日：2020-06-08

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Gijs Kramer ,  Ringo Petrus Cornelis Van Dorst

    IPC: G03F7/20 ,  H01L21/67 ,  G03F7/00

    CPC classification number: G03F7/7085 ,  H01L21/67288

    Abstract: A substrate shape measuring device, including: a substrate support to support a substrate having a main surface, the main surface of the substrate when supported by the substrate support substantially extending in a first plane; one or more sensor assemblies, each including a light emitter to emit light along a light axis substantially parallel to the first plane and a light sensor arranged to receive the light; and a processing device arranged to determine a shape of the substrate, wherein the substrate shape measuring device is constructed to measure with the one or more sensor assemblies in at least a first measurement direction with respect to the substrate substantially parallel to the first plane and a second measurement direction with respect to the substrate substantially parallel to the first plane.

    Support apparatus, lithographic apparatus and device manufacturing method
    6.
    发明授权
    Support apparatus, lithographic apparatus and device manufacturing method 有权

    公开(公告)号：US10578959B2

    公开(公告)日：2020-03-03

    申请号：US15567279

    申请日：2016-03-22

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Gijs Kramer ,  Simon Karel Ravensbergen ,  Niek Jacobus Johannes Roset ,  Pieter Renaat Maria Hennus

    IPC: G03B27/42 ,  G03F7/20

    Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body includes a projection configured such that it surrounds the object holder and such that, in use, a layer of immersion liquid is retained on the projection and in contact with an object supported on the object holder.

    Suction clamp, object handler, stage apparatus and lithographic apparatus
    8.
    发明授权
    Suction clamp, object handler, stage apparatus and lithographic apparatus 有权

    公开(公告)号：US12197141B2

    公开(公告)日：2025-01-14

    申请号：US17792335

    申请日：2020-12-18

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Gijs Kramer

    IPC: G03F7/00 ,  B25J11/00 ,  H01L21/683 ,  H01L21/687

    Abstract: A suction clamp for clamping an object. The suction clamp includes a base structure including a base and a connection area, and a first pad for receiving the object. The suction clamp further includes a resilient member connecting the first pad to the connection area of the base structure such that the first pad is moveable relative to the base between a receiving position for receiving the object and a clamping position for clamping the object, wherein the resilient member is adapted to bias the first pad to the receiving position. The suction clamp further includes a suction opening arranged in the base and adapted to be connected to a suction device for providing a suction force for clamping the object on the first pad.

    Stage apparatus and method for calibrating an object loading process
    9.
    发明授权
    Stage apparatus and method for calibrating an object loading process 有权

    公开(公告)号：US11556064B2

    公开(公告)日：2023-01-17

    申请号：US17269328

    申请日：2019-07-22

    Applicant: ASML Netherlands B.V.

    Inventor： Gijs Kramer ,  Theodorus Marcus Nagtegaal ,  André Schreuder ,  Anna Catharina Verkaik

    IPC: G03F7/20

    Abstract: The invention provides a stage apparatus, comprising an object support comprising a ring shaped protrusion having an outer radius in a first plane, and configured to support an object with a radius in the first plane larger than the outer radius of the ring shaped protrusion. The stage apparatus further comprises a sensor module configured to detect the object support, and the object when it is arranged on the object support. The stage apparatus further comprises a processing unit configured to receive one or more signals from the sensor module, and to determine, based on said one or more signals, a position of the object relative to the ring shaped protrusion when the object is arranged on the object support. The processing unit is further configured to determine, based on said position of the object, an offset value representing the position of the object relative to the ring shaped protrusion.

    Stage apparatus, lithographic apparatus, control unit and method
    10.
    发明授权
    Stage apparatus, lithographic apparatus, control unit and method 有权

    公开(公告)号：US11243476B2

    公开(公告)日：2022-02-08

    申请号：US17050149

    申请日：2019-03-27

    Applicant: ASML Netherlands B.V.

    Inventor： Ringo Petrus Cornelis Van Dorst ,  Gijs Kramer ,  Benjamin Cunnegonda Henricus Smeets ,  Mark Johannes Hermanus Frencken

    IPC: G03F7/20 ,  H01L21/67

    Abstract: The invention provides a stage apparatus comprising an object support, a plurality of support members, a gripper and a control unit. The object support comprises a surface for mounting an object on, the surface extending in a plane. The plurality of support members are for supporting the object, and are arranged to receive the object from a gripper and to arrange the object on the surface and/or vice versa. The support members are moveable in at least a first direction which is perpendicular to the plane. The control unit is arranged to receive shape information regarding an out-of-plane-shape of the object, and is arranged to control positions of the support members. The control unit is arranged to tilt the object while supported by the support members by controlling the positions so as to reduce a space consumption of the object in the first direction, based on the shape information.

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