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1.发明申请公开(公告)号：US20170299969A1
公开(公告)日：2017-10-19
申请号：US15513108
申请日：2015-10-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Johannes Hubertus Antonius VAN DE RIJDT
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/70341 , G03F7/70783 , G03F7/70858 , G03F7/70891 , G03F7/709
Abstract: A component for a lithography tool, the component including a member having a primary surface; a conduit defined within the member and configured to receive a fluid under pressure; a compressible region within the member and located between the conduit and the primary surface; and a deformable region between the compressible region and the conduit, wherein the compressible region and the deformable region are configured to accommodate local deformation of the member resulting from the pressure of the fluid.
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Patent Agency Ranking
公开(公告)号：US20200373118A1
公开(公告)日：2020-11-26
申请号：US16992058
申请日：2020-08-12
Applicant: ASML Netherlands B.V.
Inventor： Marcel Koenraad Marie BAGGEN , Peter Paul HEMPENIUS , Maarten Frans Janus KREMERS , Robertus Jacobus Theodorus VAN KEMPEN , Sven Antoin Johan HOL , Henricus Martinus Johannes VAN DE GROES , Johannes Hubertus Antonius VAN DE RIJDT , Niels Johannes Maria BOSCH , Maarten Hartger KIMMAN
Abstract: An electron beam apparatus is provided. The apparatus comprises an e-beam source configured to generate an electron beam, a first part configured to support a substrate, the first part comprising an object table for supporting the substrate, the first part further comprising a short stroke actuator system for actuating the object table relative to the e-beam source, the short stroke actuator system comprising a short stroke forcer. The apparatus further comprises a second part configured to movably support the first part and a long stroke actuator system configured to actuate movement of the first part with respect to the second part, the long stroke actuator system comprising a long stroke forcer, wherein the short stroke forcer and/or the long stroke forcer is configured to be switched off while the electron beam is projected onto the substrate.
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公开(公告)号：US20170363964A1
公开(公告)日：2017-12-21
申请号：US15694519
申请日：2017-09-01
Applicant: ASML Netherlands B.V.
Inventor： Thibault Simon Mathieu LAURENT , Johannes Henricus Wilhelmus JACOBS , Haico Victor KOK , Yuri Johannes Gabriël VAN DE VIJVER , Johannes Antonius Maria VAN DE WAL , Bastiaan Andreas Wilhelmus Hubertus KNARREN , Robbert-Jan VOOGD , Jan Steven Christiaan WESTERLAKEN , Johannes Hubertus Antonius VAN DE RIJDT , Allard Eelco KOOIKER , Wilhelmina Margareta Jozef HURKENS-MERTENS , Yohann Bruno Yvon TEILLET
IPC: G03F7/20
CPC classification number: G03F7/7085 , G03F7/70341 , G03F7/70666 , G03F7/70858 , G03F7/70891
Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.
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公开(公告)号：US20220100107A1
公开(公告)日：2022-03-31
申请号：US17435115
申请日：2020-02-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Henricus Martinus Johannes VAN DE GROES , Johannes Hubertus Antonius VAN DE RIJDT , Marcel Pieter Jacobus PEETERS , Chien-Hung TSENG , Henricus Petrus Maria PELLEMANS
IPC: G03F9/00
Abstract: A method of aligning a substrate within an apparatus. The method includes determining a substrate grid based on measurements of a plurality of targets, each at different locations on a substrate. The determining includes repetitions of updating the substrate grid after each measurement of a target, and using the updated grid to align a measurement of a subsequent target.
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公开(公告)号：US20190107786A1
公开(公告)日：2019-04-11
申请号：US16144013
申请日：2018-09-27
Applicant: ASML Netherlands B.V.
Inventor： Johan Maria VAN BOXMEER , Marinus Johannes Maria VAN DAM , Koos VAN BERKEL , Sietse Thijmen VAN DER POST , Johannes Hubertus Antonius VAN DE RIJDT
Abstract: Disclosed is a method of optimizing within an inspection apparatus, the position and/or size (and therefore focus) of a measurement illumination spot relative to a target on a substrate. The method comprises detecting scattered radiation from at least the target resultant from illuminating the target, for different sizes and/or positions of said illumination spot relative to the target; and optimizing said position and/or size of the measurement illumination spot relative to the target based on a characteristic of the detected scattered radiation for the different sizes and/or positions of said illumination spot relative to the target.
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公开(公告)号：US20220084781A1
公开(公告)日：2022-03-17
申请号：US17535453
申请日：2021-11-24
Applicant: ASML Netherlands B.V.
Inventor： Mark Henricus Wilhelmus VAN GERVEN , Johannes Hubertus Antonius VAN DE RIJDT , Michaël Johannes Christiaan RONDE , Niels Johannes Maria BOSCH
Abstract: Systems directed to a stage apparatus in an electron beam inspection tool to inspect a sample are disclosed. The stage apparatus comprises a short stroke stage; a long stroke stage; a first sensor configured to measure a position of the short stroke stage with respect to a measurement reference; one or more roller bearings configured to support the long stroke stage; and a controller having circuitry and configured to control a motion of the long stroke stage and a motion of the short stroke stage for following movement of the reference at least partly based on measurement from the first sensor, wherein the controller is operable such that control of the long stroke stage is decoupled from the movement of the reference in at least a part of operation of the stage apparatus for reducing debris generation of the one or more roller bearings.
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