公开(公告)号：US11719529B2

公开(公告)日：2023-08-08

申请号：US17613124

申请日：2020-05-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Maarten Jozef Jansen ,  Manoj Kumar Mridha ,  Engelbertus Antonius Fransiscus Van der Pasch

IPC: G01B9/02002 ,  G01B9/02055 ,  G01J9/02 ,  G03F7/20 ,  G03F7/00

CPC classification number: G01B9/02002 ,  G01B9/0207 ,  G01J9/02 ,  G03F7/70775 ,  G01B2290/60

Abstract: An interferometer system including: an optical system arranged to split a radiation beam from a laser source into a first beam along a first optical path and a second beam along a second optical path, and recombine the first beam and the second beam to a recombined beam, a detector to receive the recombined beam and to provide a detector signal based on the received recombined beam, and a processing unit, wherein a first optical path length of the first optical path and a second optical path length of the second optical path have an optical path length difference, and wherein the processing unit is arranged to determine a mode hop of the laser source on the basis of a phase shift in the detector signal.

公开(公告)号：US11287242B2

公开(公告)日：2022-03-29

申请号：US16311193

申请日：2017-06-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Maarten Jozef Jansen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Suzanne Johanna Antonetta Geertruda Cosijns

IPC: G01B9/02 ,  G01B9/02056 ,  G01B9/02001 ,  G03F7/20 ,  G01B9/02055 ,  G01B9/02003

Abstract: An interferometer system, including a heterodyne interferometer and a processing system. The heterodyne interferometer is arranged to provide a reference signal and a measurement signal. The reference signal has a reference phase. The measurement signal has a measurement phase and an amplitude. The processing system is arranged to determine a cyclic error of the heterodyne interferometer based on the reference phase, the measurement phase and the amplitude.

公开(公告)号：US10883816B2

公开(公告)日：2021-01-05

申请号：US16489439

申请日：2018-02-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Maarten Jozef Jansen

IPC: G03F7/20 ,  G01B9/02

Abstract: A position measurement system configured to measure a position of an object, the system including: a displacement interferometer having a first capture range; a time-of-flight sensor having a second capture range that is larger than the first capture range and having an inaccuracy that is smaller than the first capture range; and a processing unit, wherein the position measurement system has a zeroing mode in which the processing unit is configured to determine a coarse position of the object within the second capture range based on an output from the time-of-flight sensor, and in which the processing unit is configured to determine a fine position of the object based on the determined coarse position and an output from the displacement interferometer.

公开(公告)号：US11556066B2

公开(公告)日：2023-01-17

申请号：US17434309

申请日：2020-01-30

Applicant: ASML Netherlands B.V.

Inventor： Maarten Jozef Jansen ,  Frank Auer

IPC: G03F7/20

Abstract: The invention provides a stage system comprising a stage (ST) which is movable in respect of a reference structure. One of the stage and the reference structure comprises a reflective surface (REFS). An optical position sensor (IF1) is arranged at the other one of the stage and the reference structure and is configured to determine a position of the reflective surface relative to the optical position sensor. An optical shape sensor (IF2) is configured to determine a shape of the reflective surface. The stage system further comprises a position measurement controller configured to derive a stage position of the stage from the position of the reflective surface relative to the optical position sensor and from the shape of the reflective surface as determined by the optical shape sensor.

公开(公告)号：US11525737B2

公开(公告)日：2022-12-13

申请号：US16965753

申请日：2019-01-15

Applicant: ASML Netherlands B.V.

Inventor： Maarten Jozef Jansen

IPC: G01B9/02002 ,  G01J9/02 ,  G01B11/00 ,  G03F7/00 ,  G03F7/20 ,  G01B9/02001 ,  G01B9/02015

Abstract: The invention provides a wavelength tracking system comprising a wavelength tracking unit and an interferometer system. The wavelength tracking unit has reflection surfaces at stabile positions providing a first reflection path with a first path length and a second reflection path with a second path length. The first path length is substantially larger than the second path length. The interferometer system comprises: a beam splitter to split a light beam in a first measurement beam and a second measurement beam; at least one optic element to guide the first measurement beam, at least partially, along the first reflection path and the second measurement beam, at least partially, along the second reflection path; a first light sensor arranged at an end of the first reflection path to receive the first measurement beam and to provide a first sensor signal on the basis of the first measurement beam; a second light sensor arranged at an end of the second reflection path to receive the second measurement beam and to provide a second sensor signal on the basis of the second measurement beam; and a processing unit to determine a wavelength or change in wavelength on the basis of the first sensor signal and the second sensor signal.