公开(公告)号：US09835957B2

公开(公告)日：2017-12-05

申请号：US15021240

申请日：2014-09-02

Applicant: ASML Netherlands B.V.

Inventor： Martijn Houben ,  Alwin De Kock ,  Hendrikus Johannes Marinus Van Abeelen ,  Marco Adrianus Peter Van Den Heuvel

IPC: B23B5/34 ,  B23B31/28 ,  G03B27/52 ,  G03B27/58 ,  G03F7/20 ,  H01L21/687

CPC classification number: G03F7/70716 ,  G03F7/707 ,  G03F7/70875 ,  H01L21/6875

Abstract: A support table to support a surface of a substrate, wherein the support table includes: a base surface substantially parallel to the surface of the substrate, a plurality of burls protruding above the base surface, each of the burls having a respective distal end and a first height above the base surface, the burls arranged such that, when the substrate is supported by the support table, the substrate is supported by the respective distal ends, and a plurality of elongate raised protrusions separated by gaps, each of the elongate raised protrusions having a second height above the base surface, wherein the elongate raised protrusions protrude above the base surface between the burls, and the second height is less than the first height; wherein the protrusions are arranged such that a plurality of the gaps are aligned to form a straight gas flow path towards an edge of the base surface.

公开(公告)号：US11175594B2

公开(公告)日：2021-11-16

申请号：US16617242

申请日：2018-05-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Giovanna De Simone ,  Marco Adrianus Peter Van Den Heuvel ,  Thibault Simon Mathieu Laurent ,  Ruud Hendrikus Martinus Johannes Bloks ,  Niek Jacobus Johannes Roset ,  Justin Johannes Hermanus Gerritzen

IPC: G03F7/20

Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.

公开(公告)号：US11500296B2

公开(公告)日：2022-11-15

申请号：US17519713

申请日：2021-11-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Giovanna De Simone ,  Marco Adrianus Peter Van Den Heuvel ,  Thibault Simon Mathieu Laurent ,  Ruud Hendrikus Martinus Johannes Bloks ,  Niek Jacobus Johannes Roset ,  Justin Johannes Hermanus Gerritzen

IPC: G03F7/20

Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.

公开(公告)号：US11846879B2

公开(公告)日：2023-12-19

申请号：US17982226

申请日：2022-11-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Giovanna De Simone ,  Marco Adrianus Peter Van Den Heuvel ,  Thibault Simon Mathieu Laurent ,  Ruud Hendrikus Martinus Johannes Bloks ,  Niek Jacobus Johannes Roset ,  Justin Johannes Hermanus Gerritzen

IPC: G03F7/00

CPC classification number: G03F7/70725 ,  G03F7/70775

Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.

公开(公告)号：US10656536B2

公开(公告)日：2020-05-19

申请号：US15308598

申请日：2015-04-23

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Martinus Hendrikus Antonius Leenders ,  Niek Elout De Kruijf ,  Mircea Dusa ,  Martijn Houben ,  Johannes Gerardus Maria Mulder ,  Thomas Poiesz ,  Marco Adrianus Peter Van Den Heuvel ,  Paul Van Dongen ,  Justin Johannes Hermanus Gerritzen ,  Antonie Hendrik Verweij ,  Abraham Alexander Soethoudt

IPC: B25B11/00 ,  G03F7/20 ,  H01L21/683

Abstract: A substrate support, includes: a substrate support location configured to support a substrate, and a vacuum clamping device configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source to create a reduced pressure, at least one vacuum section connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.